公开(公告)号：US20150179387A1

公开(公告)日：2015-06-25

申请号：US14406909

申请日：2013-05-08

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takashi Onishi ,  Shunichi Watanabe ,  Minoru Kaneda

IPC: H01J29/48 ,  H01J27/02

CPC classification number: H01J37/04 ,  H01J27/024 ,  H01J29/485 ,  H01J37/026 ,  H01J37/067 ,  H01J37/073 ,  H01J37/16 ,  H01J37/241 ,  H01J37/248 ,  H01J2237/16

Abstract: An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

Abstract translation: 根据本发明的产生带电粒子束的仪器具有：带电粒子源; 多个第一电极，其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。 壳体由绝缘固体材料形成，并且包括设置在靠近多个第一电极的位置处的多个第二电极。 所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个，所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

公开(公告)号：US20150097123A1

公开(公告)日：2015-04-09

申请号：US14376901

申请日：2013-01-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasushi Ebizuka ,  Seiichiro Kanno ,  Makoto Nishihara ,  Masashi Fujita

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/20 ,  H02N13/00

CPC classification number: H01J37/226 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/06 ,  H01J2237/2007 ,  H01J2237/2801 ,  H02N13/00

Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.

Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。

公开(公告)号：US09000370B2

公开(公告)日：2015-04-07

申请号：US14512672

申请日：2014-10-13

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

公开(公告)号：US08981323B2

公开(公告)日：2015-03-17

申请号：US13771388

申请日：2013-02-20

Applicant: Canon Kabushiki Kaisha

Inventor： Ichiro Tanaka ,  Akira Miyake

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/02

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/3177 ,  H01J2237/182

Abstract: A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing.

Abstract translation: 用于使用带电粒子束处理物体的带电粒子束装置包括：带电粒子透镜，其中形成通过每个带电粒子束通过的孔阵列; 包含带电粒子透镜的真空容器; 以及被配置为产生电离辐射的辐射源; 其中所述装置被配置为使得所述辐射源在所述真空容器中的压力正在改变的状态下使所述电离辐射通过所述孔阵列。

公开(公告)号：US20140319372A1

公开(公告)日：2014-10-30

申请号：US14257641

申请日：2014-04-21

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Yu ASAMI ,  Michihiro KAWAGUCHI

IPC: H01J37/02 ,  H01J37/30 ,  H01R4/66 ,  H01J37/317

CPC classification number: H01J37/026 ,  H01J37/3002 ,  H01J37/3174 ,  H01J2237/31788

Abstract: A mask cover according to one embodiment of the present invention comprises a frame body having an opening at the center, a conductive earth plate installed on the frame body such that its end protrudes into the opening of the frame body, an earth pin provided on the end of the earth plate and electrically connected to the earth plate, and a conductive cover part surrounding the earth pin such that the tip end of the earth pin protrudes and a gap is present between the cover part and the earth pin.

Abstract translation: 根据本发明的一个实施例的掩模罩包括：在中心具有开口的框架体，安装在框架体上的导电接地板，使其端部突出到框体的开口中， 接地板的端部并且电连接到接地板，以及围绕接地引脚的导电覆盖部分，使得接地引脚的尖端突出并且在盖部分和接地引脚之间存在间隙。

公开(公告)号：US20140264018A1

公开(公告)日：2014-09-18

申请号：US14354917

申请日：2012-10-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Takafumi Miwa ,  Yoichi Ose ,  Eiko Nakazawa ,  Mami Konomi ,  Shunya Watanabe ,  Yoshinobu Kimura ,  Natsuki Tsuno

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/261 ,  G01B15/02 ,  G01N23/00 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  Y10T428/24331 ,  Y10T428/261

Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.

Abstract translation: 一次电子的充电被抑制，从观察样本（即待观察的样本）产生清晰的边缘对比度，从而可以高精度地测量样品的表面形状。 使用其中在样品上以薄膜状或织带膜状形成包含离子液体的液体介质的观察样本。 使用观察样品的电子显微镜包括：测量在样品上包含离子液体的液体介质的厚度的步骤; 基于包含离子液体的液体介质的厚度控制用一次电子照射的条件的步骤; 以及在上述一次电子照射条件下用一次电子照射样品以形成样品形状的步骤。

公开(公告)号：US08803411B2

公开(公告)日：2014-08-12

申请号：US13812700

申请日：2011-06-15

Applicant: Shunichi Watanabe ,  Takashi Onishi ,  Minoru Kaneda ,  Hisaya Murakoshi

Inventor： Shunichi Watanabe ,  Takashi Onishi ,  Minoru Kaneda ,  Hisaya Murakoshi

IPC: H01J29/84 ,  H01J29/48 ,  H01J3/40 ,  H01J3/02 ,  H01J37/02

CPC classification number: H01J29/484 ,  H01J3/02 ,  H01J3/027 ,  H01J3/40 ,  H01J29/488 ,  H01J37/026 ,  H01J37/073 ,  H01J37/248 ,  H01J2237/038 ,  H01J2237/06341 ,  H01J2237/0802

Abstract: In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.

Abstract translation: 在使用导电绝缘体的加速管中，导电绝缘体的表面上的掺杂剂浓度有可能变得不均匀，使得导电绝缘体的表面电阻变得不均匀。 因此，在导电绝缘体加速管的内表面上形成有多个周向槽，并且金属沿着槽的内部被金属化。 当加速管表面上的特定部分的电阻与特定部分周围的区域的电阻不同时，加速管内表面上的金属化区域的电位变为固定值，因此电位分布 在加速管的内表面上，在垂直方向上可以保持基本上相等于圆周方向。

公开(公告)号：US08692197B2

公开(公告)日：2014-04-08

申请号：US13578179

申请日：2011-02-09

Applicant: Zhigang Wang ,  Nobuhiro Okai ,  Ritsuo Fukaya

Inventor： Zhigang Wang ,  Nobuhiro Okai ,  Ritsuo Fukaya

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/244 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A scanning electron microscope and an optical-condition setting method are provided. The optical condition allows the suppression of a lowering in the measurement and inspection accuracy caused by the influence of electrification, even if there are a large number of measurement and inspection points. A pattern on a sample is measured based on the detection of electrons by scanning the sample surface with an electron beam. A change in measurement values relative to the number of measurements is determined from the measurement values at a plurality of measurement points on the sample, and the sample-surface electric field is controlled so that the inclination of the change becomes equal to zero, or becomes close to zero.

Abstract translation: 提供扫描电子显微镜和光学条件设定方法。 即使存在大量的测量点和检查点，光学条件允许抑制由电气化的影响引起的测量和检查精度的降低。 基于通过用电子束扫描样品表面的电子检测来测量样品上的图案。 根据样品上的多个测量点的测量值确定测量值相对于测量次数的变化，并且控制样品表面电场，使得变化的倾斜度等于零，或变为 接近零。

公开(公告)号：US20140057451A1

公开(公告)日：2014-02-27

申请号：US13783466

申请日：2013-03-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Young-geun ROH ,  Un-jeong KIM ,  Chang-won LEE

IPC: H01L21/02

CPC classification number: H01L21/02115 ,  H01J37/026 ,  H01J2237/0041 ,  H01L21/2633 ,  H01L21/28123 ,  H01L21/31105

Abstract: A method of preventing a charge accumulation in the manufacturing process of a semiconductor device is provided. The method includes: forming a material layer on a substrate; patterning (or processing) the material layer; and forming a graphene layer before patterning the material layer, wherein the graphene layer is formed on a surface of the material layer or on a surface of the substrate under the material layer. The substrate may be an insulation substrate. In addition, the substrate may have a stacked structure including a plurality of layers.

Abstract translation: 提供了一种在半导体器件的制造过程中防止电荷累积的方法。 该方法包括：在基板上形成材料层; 图案化（或处理）材料层; 以及在图案化所述材料层之前形成石墨烯层，其中所述石墨烯层形成在所述材料层的表面上或所述材料层下方的所述基板的表面上。 衬底可以是绝缘衬底。 此外，基板可以具有包括多个层的堆叠结构。

公开(公告)号：US20130320854A1

公开(公告)日：2013-12-05

申请号：US13899767

申请日：2013-05-22

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Inventor： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32688 ,  H01J2237/03

Abstract: An inductively coupled radio frequency plasma flood gun having a plasma chamber with one or more apertures, a gas source capable of supplying a gaseous substance to the plasma chamber, a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the gaseous substance in the plasma chamber to generate plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma and an exit aperture to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of an associated ion implantation system. Magnets are disposed on opposite sides of the aperture used to manipulate the electrons of the plasma.

Abstract translation: 一种电感耦合射频等离子体喷射枪，其具有具有一个或多个孔的等离子体室，能够向等离子体室供应气态物质的气体源，设置在等离子体室内的单匝绕组，以及耦合到等离子体室的电源 线圈，用于感应耦合射频电力以激发等离子体室中的气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体和出口孔，以使所得到的等离子体的带负电荷的颗粒接合作为相关离子注入系统的一部分的离子束。 磁体设置在用于操纵等离子体的电子的孔的相对侧上。