Invention Grant
US08692197B2 Scanning electron microscope optical condition setting method and scanning electron microscope
有权
扫描电子显微镜光学条件设定方法和扫描电子显微镜
- Patent Title: Scanning electron microscope optical condition setting method and scanning electron microscope
- Patent Title (中): 扫描电子显微镜光学条件设定方法和扫描电子显微镜
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Application No.: US13578179Application Date: 2011-02-09
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Publication No.: US08692197B2Publication Date: 2014-04-08
- Inventor: Zhigang Wang , Nobuhiro Okai , Ritsuo Fukaya
- Applicant: Zhigang Wang , Nobuhiro Okai , Ritsuo Fukaya
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-041238 20100226
- International Application: PCT/JP2011/000704 WO 20110209
- International Announcement: WO2011/105015 WO 20110901
- Main IPC: H01J37/26
- IPC: H01J37/26

Abstract:
A scanning electron microscope and an optical-condition setting method are provided. The optical condition allows the suppression of a lowering in the measurement and inspection accuracy caused by the influence of electrification, even if there are a large number of measurement and inspection points. A pattern on a sample is measured based on the detection of electrons by scanning the sample surface with an electron beam. A change in measurement values relative to the number of measurements is determined from the measurement values at a plurality of measurement points on the sample, and the sample-surface electric field is controlled so that the inclination of the change becomes equal to zero, or becomes close to zero.
Public/Granted literature
- US20120318977A1 Scanning Electron Microscope Optical Condition Setting Method and Scanning Electron Microscope Public/Granted day:2012-12-20
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