MASK COVER, CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD
    1.
    发明申请
    MASK COVER, CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD 有权
    遮蔽罩,充电颗粒光束绘图装置和充电颗粒光束绘图方法

    公开(公告)号:US20140319372A1

    公开(公告)日:2014-10-30

    申请号:US14257641

    申请日:2014-04-21

    CPC classification number: H01J37/026 H01J37/3002 H01J37/3174 H01J2237/31788

    Abstract: A mask cover according to one embodiment of the present invention comprises a frame body having an opening at the center, a conductive earth plate installed on the frame body such that its end protrudes into the opening of the frame body, an earth pin provided on the end of the earth plate and electrically connected to the earth plate, and a conductive cover part surrounding the earth pin such that the tip end of the earth pin protrudes and a gap is present between the cover part and the earth pin.

    Abstract translation: 根据本发明的一个实施例的掩模罩包括:在中心具有开口的框架体,安装在框架体上的导电接地板,使其端部突出到框体的开口中, 接地板的端部并且电连接到接地板,以及围绕接地引脚的导电覆盖部分,使得接地引脚的尖端突出并且在盖部分和接地引脚之间存在间隙。

Patent Agency Ranking