METHOD OF MANUFACTURING INERTIAL SENSOR
    13.
    发明申请
    METHOD OF MANUFACTURING INERTIAL SENSOR 审中-公开
    制造传感器的方法

    公开(公告)号:US20120267825A1

    公开(公告)日:2012-10-25

    申请号:US13184564

    申请日:2011-07-17

    Abstract: The method of manufacturing an inertial sensor includes: (A) disposing a first mold 120 and a second mold 125 on both surfaces of a predetermined region R in a plate-shaped membrane 110, (B) forming a mass body 130, a post 140, and an upper cap 150 through a plating process or a filling process, (C) disposing a third mold 160 on an exposed surface of the first mold 120 and the mass body 130, and (D) forming a lower cap 170 through the plating process or the filling process. Since the mass body 130 is made of metal by a plating process or a filling process, the density of the mass body 130 may be increased and the mass body 130 may be formed to have a structure of a high aspect ratio, thereby improving the sensitivity of the inertial sensor 100.

    Abstract translation: 惯性传感器的制造方法包括:(A)在板状膜110中的规定区域R的两面上设置第一模具120和第二模具125,(B)形成质量体130,柱140 ,以及通过电镀处理或填充处理的上盖150,(C)在第一模具120和质量体130的暴露表面上设置第三模具160,以及(D)通过电镀形成下盖170 过程或填充过程。 由于质量体130通过电镀处理或填充处理由金属制成,因此可以增加质量体130的密度,并且可以将质量体130形成为具有高纵横比的结构,从而提高灵敏度 的惯性传感器100。

    Apparatus and method for forming self-assembly arrays
    16.
    发明授权
    Apparatus and method for forming self-assembly arrays 有权
    用于形成自组装阵列的装置和方法

    公开(公告)号:US09255002B2

    公开(公告)日:2016-02-09

    申请号:US12888146

    申请日:2010-09-22

    Abstract: Apparatus and methods for forming self-assembly arrays of substances, such as nanoparticles, on a substrate are disclosed. The apparatus may include a substrate supporting a liquid composition including the substance and a solvent, and a removable micro-mold placed over the substrate and the liquid composition. To form the self assembly arrays of the substance, the solvent may be evaporated through at least one evaporation channel formed between the micro-mold and the substrate. The evaporation channel may be adjustable by subjecting the micro-mold to a positive pressure.

    Abstract translation: 公开了用于在衬底上形成诸如纳米颗粒的物质自组装阵列的装置和方法。 该装置可以包括支撑包括物质和溶剂的液体组合物的基底和放置在基底和液体组合物上的可移除微型模具。 为了形成物质的自组装阵列,溶剂可以通过形成在微模和基底之间的至少一个蒸发通道蒸发。 可以通过使微型模具经受正压力来调节蒸发通道。

    METHOD FOR THE PRODUCTION OF THREE-DIMENSIONAL MICROSTRUCTURES
    17.
    发明申请
    METHOD FOR THE PRODUCTION OF THREE-DIMENSIONAL MICROSTRUCTURES 有权
    用于生产三维微结构的方法

    公开(公告)号:US20120325775A1

    公开(公告)日:2012-12-27

    申请号:US13530569

    申请日:2012-06-22

    Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.

    Abstract translation: 一种用于产生三维微结构的方法,其中源材料施加在基底上,具有通过用电磁辐射曝光而改变的性质。 通过在源材料中的空间分辨曝光来写入三维源结构,除了源结构之外,除去源材料,并且用目标材料模制源结构,由其制造待生产的微结构。 这里,围绕要生产的微观结构提供壳结构,其中源结构被创建为壳结构,或者使用源结构产生壳结构,并且随后将靶材插入壳结构中。

    Apparatus and Method for Forming Self-Assembly Arrays
    19.
    发明申请
    Apparatus and Method for Forming Self-Assembly Arrays 有权
    用于形成自组装阵列的装置和方法

    公开(公告)号:US20110177978A1

    公开(公告)日:2011-07-21

    申请号:US12888146

    申请日:2010-09-22

    Abstract: Apparatus and methods for forming self-assembly arrays of substances, such as nanoparticles, on a substrate are disclosed. The apparatus may include a substrate supporting a liquid composition including the substance and a solvent, and a removable micro-mold placed over the substrate and the liquid composition. To form the self assembly arrays of the substance, the solvent may be evaporated through at least one evaporation channel formed between the micro-mold and the substrate. The evaporation channel may be adjustable by subjecting the micro-mold to a positive pressure.

    Abstract translation: 公开了用于在衬底上形成诸如纳米颗粒的物质自组装阵列的装置和方法。 该装置可以包括支撑包括物质和溶剂的液体组合物的基底和放置在基底和液体组合物上的可移除微型模具。 为了形成物质的自组装阵列,溶剂可以通过形成在微模和基底之间的至少一个蒸发通道蒸发。 可以通过使微型模具经受正压力来调节蒸发通道。

    Shadow mask and method of producing the same
    20.
    发明授权
    Shadow mask and method of producing the same 有权
    阴影面具及其制作方法

    公开(公告)号:US06893976B2

    公开(公告)日:2005-05-17

    申请号:US10235166

    申请日:2002-09-05

    CPC classification number: B81C1/00373 B81C2201/0187 H04Q2213/1301

    Abstract: A method of producing a shadow mask having a set of apertures (the set of apertures including a given aperture with an aperture boundary) uses a wafer having at least a first silicon layer, a second silicon layer, and an insulator layer between the first and second silicon layers. A first portion of the first silicon layer within the aperture boundary is removed. This produces a second portion of the first silicon layer, which remains within the aperture boundary. The second silicon layer within the aperture boundary is removed, as well as the insulator layer within the aperture boundary. The second portion of the first silicon layer remaining within the aperture boundary then is removed.

    Abstract translation: 一种制造具有一组孔径(包括具有孔径边界的给定孔径的一组孔口)的荫罩的方法使用具有至少第一硅层,第二硅层和绝缘体层的晶片,所述第一硅层和第二硅层在第一和第 第二硅层。 去除孔边界内的第一硅层的第一部分。 这产生了保留在孔边界内的第一硅层的第二部分。 孔边界内的第二硅层以及孔边界内的绝缘体层被去除。 剩余在孔边界内的第一硅层的第二部分被去除。

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