公开(公告)号：US09852876B2

公开(公告)日：2017-12-26

申请号：US15423013

申请日：2017-02-02

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo Kato ,  Hideo Inoue ,  Hiroshi Matsumoto ,  Ryoh Kawana

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/317 ,  H01J37/20 ,  H01J37/04 ,  H01J37/304

CPC classification number: H01J37/147 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/30461 ,  H01J2237/31769 ,  H01J2237/31774

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes processing circuitry that is programmed to perform the function of a data region determination part determining a data region based on boundaries of pixels obtained by dividing a writing area of a substrate into mesh-shaped regions, an irradiation range of multiple charged particle beams, and boundaries of stripe segments obtained by dividing the writing area into segments having a predetermined width such that the segments are arranged in a predetermined direction, a deflection coordinate adjustment part adjusting deflection coordinates of the multiple charged particle beams such that the boundaries of the pixels are mapped to a boundary of the irradiation range, and a correction part calculating a corrected dose of each beam of the multiple charged particle beams by distributing, based on a positional relationship between the beam and pixels in the data region, a dose of the beam corresponding to a pixel in the data region calculated based on write data to one or more beams, and adding doses distributed to the beam, and a writing mechanism, including a charged particle beam source, a deflector, and a stage on which a target object is placed, and the writing mechanism deflecting the multiple charged particle beams based on the adjusted deflection coordinates and applying the beams each having the corrected dose to write a pattern.

公开(公告)号：US20190304749A1

公开(公告)日：2019-10-03

申请号：US16363487

申请日：2019-03-25

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hideo Inoue

IPC: H01J37/317 ,  H01J37/304

Abstract: A multiple charged particle beam writing apparatus includes a defective pattern data generation circuitry configured to generate defective pattern data of a defective pattern having a shape of the defective region in the writing region; a reverse pattern data generation circuitry configured to generate reverse pattern data by reversing the defective pattern data; a combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding a value defined in a reverse pattern pixel data and a value defined in a writing pattern pixel data; and a writing mechanism configured to perform multiple writing, using multiple charged particle beams, on the target object such that the each pixel is irradiated with a beam of a dose corresponding to a value defined in the combined-value pixel data.

公开(公告)号：US20190198294A1

公开(公告)日：2019-06-27

申请号：US16228830

申请日：2018-12-21

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/04 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/1471 ,  H01J37/3026 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754

Abstract: A multiple charged particle writing method includes performing a tracking operation by shifting the main deflection position of multiple beams using charged particle beams in the direction of stage movement so that the main deflection position of the multiple beams follows the stage movement while a predetermined number of beam shots of the multiple beams are performed, and shifting the sub deflection position of the multiple beams so that each beam of the multiple beams straddles rectangular regions among plural rectangular regions obtained by dividing a writing region of a target object into meshes by the pitch size between beams of the multiple beams, and the each beam is applied to a different position in each of the rectangular regions straddled, and applying a predetermined number of shots per beam using plural beams in the multiple beams to each of the plural rectangular regions, during the tracking operation.

公开(公告)号：US20180350560A1

公开(公告)日：2018-12-06

申请号：US15991520

申请日：2018-05-29

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Kei HASEGAWA ,  Hayato Kimura ,  Hideo Inoue ,  Yoshiaki Onimaru

IPC: H01J37/317 ,  G03F7/20

Abstract: A drawing device according to an embodiment includes: a stage configured to be capable of having a processing target mounted thereon; an aperture member including a plurality of apertures corresponding to a plurality of beams irradiated to the processing target; a data generator configured to generate gradation data indicating irradiation time data with n bits (n is a positive integer) with respect to positions of respective coordinates of the beams; a calculator configured to perform a logical addition operation of the gradation data of the respective positions of the coordinates; and a controller configured to control the aperture member based on the gradation data and a result of the logical addition operation.

公开(公告)号：US20180261421A1

公开(公告)日：2018-09-13

申请号：US15976309

申请日：2018-05-10

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

公开(公告)号：US09715993B2

公开(公告)日：2017-07-25

申请号：US14944671

申请日：2015-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/317 ,  H01J37/304 ,  H01J37/04

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/31761

Abstract: A multi charged particle beam writing apparatus includes a deflector to collectively deflect each beam in an “on” state, by tracking control in such a way as to follow stage movement, an obtaining processing circuitry to obtain a deviation amount of an irradiation position of each beam of multi-beams depending on a tracking amount of the tracking control, a correction coefficient calculation processing circuitry to calculate a correction coefficient for correcting the deviation amount of the irradiation position depending on the tracking amount, for each beam of the multi-beams and for each irradiation position, a shot data generation processing circuitry to generate shot data where deviation of an irradiation position of each beam of multi-beams depending on a tracking amount is to be corrected using a correction coefficient, for each tracking operation, and a deflection control processing circuitry to control plural blankers, based on the shot data.

公开(公告)号：US09679748B2

公开(公告)日：2017-06-13

申请号：US15072894

申请日：2016-03-17

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/3026 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a dividing circuitry to divide first irradiation time data into k pieces of second irradiation time data, where each of the k pieces of second irradiation time data has a different number of bits and the total of different numbers of bits is n-bits, in multi-pass writing of k or more passes by using multi charged particle beams, a data transmission circuitry to transmit, for each of k passes, corresponding second irradiation time data, for a beam concerned in multi charged particle beams, a resolution information transmission circuitry to transmit, for each of k passes, corresponding resolution information, and an irradiation time calculation circuitry to calculate an irradiation time of a corresponding beam in the multi charged particle beams of a pass concerned by using input second irradiation time data and resolution information.

公开(公告)号：US09514914B2

公开(公告)日：2016-12-06

申请号：US14661496

申请日：2015-03-18

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/302 ,  H01J37/317 ,  G11B9/10

CPC classification number: H01J37/3026 ,  G11B9/10 ,  H01J37/3177 ,  H01J2237/30422 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762

Abstract: A shot data generation method includes inputting writing data for writing a pattern on a target object with multi charged particle beams, and generating shot data for each beam of the multi charged particle beams by converting the writing data and using one of a first code indicating a first irradiation time period having been set beforehand, a second code indicating an irradiation time period being zero, and a third code indicating neither the first irradiation time period nor the irradiation time period being zero.

Abstract translation: 射击数据生成方法包括：输入用于将目标对象上的图案写入多个带电粒子束的写入数据，并通过转换写入数据并使用表示第一代码的第一代码中的一个来产生多个带电粒子束的每个波束的镜头数据 预先设定了第一照射时间段，指示照射时间段为零的第二代码，以及不表示第一照射时间段也不表示照射时间段为零的第三代码。

公开(公告)号：US09269532B2

公开(公告)日：2016-02-23

申请号：US14709200

申请日：2015-05-11

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hironori Mizoguchi ,  Hideo Inoue

IPC: G21K5/04 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state where beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.

Abstract translation: 一种带电粒子束写入装置包括：第一限制孔径构件，其中形成有第一开口，以阻挡被消隐控制的带电粒子束以使其“离开”，并且使带电粒子束的一部分具有 被消隐控制为通过第一开口的光束“开”，在重复“光束”和光束“关”的状态下检测照射第一限制光圈部件的第一电子量的第一检测器，第一 积分处理单元，用于通过在被检测以获得第一电子量的第一检测信号中积分足够低于波束“开”的重复周期的波段和波束“截止”的波段的分量的分量来产生第一积分信号，以及 第一不规则检测单元，通过使用第一积分信号来检测带电粒子束的剂量的不均匀性。

公开(公告)号：US10134562B2

公开(公告)日：2018-11-20

申请号：US14969478

申请日：2015-12-15

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo Kato ,  Hideo Inoue ,  Hiroshi Matsumoto ,  Ryoh Kawana

IPC: G01D18/00 ,  H01J37/24 ,  H01J37/304 ,  H01J37/317

Abstract: A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.