公开(公告)号：US10978273B2

公开(公告)日：2021-04-13

申请号：US16228830

申请日：2018-12-21

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/04 ,  H01J37/302

Abstract: A multiple charged particle writing method includes performing a tracking operation by shifting the main deflection position of multiple beams using charged particle beams in the direction of stage movement so that the main deflection position of the multiple beams follows the stage movement while a predetermined number of beam shots of the multiple beams are performed, and shifting the sub deflection position of the multiple beams so that each beam of the multiple beams straddles rectangular regions among plural rectangular regions obtained by dividing a writing region of a target object into meshes by the pitch size between beams of the multiple beams, and the each beam is applied to a different position in each of the rectangular regions straddled, and applying a predetermined number of shots per beam using plural beams in the multiple beams to each of the plural rectangular regions, during the tracking operation.

公开(公告)号：US10796882B2

公开(公告)日：2020-10-06

申请号：US16363449

申请日：2019-03-25

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hideo Inoue

IPC: H01J37/31 ,  H01J37/30 ,  H01J37/317 ,  G03F7/20 ,  H01J37/304

Abstract: According to one aspect of the present invention, a charged particle beam writing apparatus includes correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting a figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern; correction figure pattern data conversion circuitry configured to convert the pattern data of the correction figure pattern into correction figure pattern pixel data defining a value corresponding to a dose for the each pixel, based on pixel setting common to that of the writing pattern pixel data; and combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data.

公开(公告)号：USRE47922E1

公开(公告)日：2020-03-31

申请号：US15210240

申请日：2016-07-14

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: G01N23/00 ,  H01J37/317 ,  B82Y40/00 ,  B82Y10/00

Abstract: A charged particle beam writing apparatus includes a division/distribution processing unit to divide and distribute processed data into data groups each having an approximately equal data amount respectively, transmitting units to transmit the processed data of the groups such that processed data is transmitted in descending order with respect to order of writing processing for each data group and the groups are transmitted in parallel, memories to store the processed data of the groups such that each of the memories stores processed data of each different one of the groups, a writing order data output unit to output them, regardless of data group and in order of writing processing, and a writing unit to write a pattern on a target workpiece with a charged particle beam, based on the processed data output in the order of writing processing.

公开(公告)号：US09202673B2

公开(公告)日：2015-12-01

申请号：US14066940

申请日：2013-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi Matsumoto ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20140124684A1

公开(公告)日：2014-05-08

申请号：US14066940

申请日：2013-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US10784080B2

公开(公告)日：2020-09-22

申请号：US16363487

申请日：2019-03-25

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hideo Inoue

IPC: H01J37/304 ,  H01J37/31 ,  H01J37/317

Abstract: A multiple charged particle beam writing apparatus includes a defective pattern data generation circuitry configured to generate defective pattern data of a defective pattern having a shape of the defective region in the writing region; a reverse pattern data generation circuitry configured to generate reverse pattern data by reversing the defective pattern data; a combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding a value defined in a reverse pattern pixel data and a value defined in a writing pattern pixel data; and a writing mechanism configured to perform multiple writing, using multiple charged particle beams, on the target object such that the each pixel is irradiated with a beam of a dose corresponding to a value defined in the combined-value pixel data.

公开(公告)号：US10607812B2

公开(公告)日：2020-03-31

申请号：US16199472

申请日：2018-11-26

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/302 ,  H01J37/04 ,  H01J37/317 ,  H01J37/20 ,  H01J37/147

Abstract: A multiple charged particle beam writing apparatus includes a rotatable shaping aperture array substrate, including plural openings, to form/shape multiple beams by letting portions of a charged particle beam individually pass through the plural openings, a data rotation correction circuitry to read writing data from a storage device, and generate pattern data, in which the entire figure pattern has been reversely rotated against a rotational deviation direction of an aperture array image by a rotational deviation amount of the aperture array image, using information on the rotational deviation amount of the aperture array image of the multiple beams on the target object caused by a residual error of rotation adjustment of the shaping aperture array substrate, and a blanking aperture array mechanism, rotatable with the shaping aperture array substrate, to provide individual blanking control of the multiple beams, based on the pattern data of the figure pattern reversely rotated.

公开(公告)号：US10475621B2

公开(公告)日：2019-11-12

申请号：US15991520

申请日：2018-05-29

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Kei Hasegawa ,  Hayato Kimura ,  Hideo Inoue ,  Yoshiaki Onimaru

IPC: H01J37/317 ,  G03F7/20

Abstract: A drawing device according to an embodiment includes: a stage configured to be capable of having a processing target mounted thereon; an aperture member including a plurality of apertures corresponding to a plurality of beams irradiated to the processing target; a data generator configured to generate gradation data indicating irradiation time data with n bits (n is a positive integer) with respect to positions of respective coordinates of the beams; a calculator configured to perform a logical addition operation of the gradation data of the respective positions of the coordinates; and a controller configured to control the aperture member based on the gradation data and a result of the logical addition operation.

公开(公告)号：US20190304748A1

公开(公告)日：2019-10-03

申请号：US16363449

申请日：2019-03-25

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hideo Inoue

IPC: H01J37/317 ,  H01J37/304 ,  G03F7/20

Abstract: According to one aspect of the present invention, a charged particle beam writing apparatus includes correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting a figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern; correction figure pattern data conversion circuitry configured to convert the pattern data of the correction figure pattern into correction figure pattern pixel data defining a value corresponding to a dose for the each pixel, based on pixel setting common to that of the writing pattern pixel data; and combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data.

公开(公告)号：US10020159B2

公开(公告)日：2018-07-10

申请号：US15384021

申请日：2016-12-19

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi Matsumoto ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: H01J37/317 ,  H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.