Invention Grant
- Patent Title: Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method
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Application No.: US16199472Application Date: 2018-11-26
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Publication No.: US10607812B2Publication Date: 2020-03-31
- Inventor: Hideo Inoue
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2017-248758 20171226
- Main IPC: H01J37/302
- IPC: H01J37/302 ; H01J37/04 ; H01J37/317 ; H01J37/20 ; H01J37/147

Abstract:
A multiple charged particle beam writing apparatus includes a rotatable shaping aperture array substrate, including plural openings, to form/shape multiple beams by letting portions of a charged particle beam individually pass through the plural openings, a data rotation correction circuitry to read writing data from a storage device, and generate pattern data, in which the entire figure pattern has been reversely rotated against a rotational deviation direction of an aperture array image by a rotational deviation amount of the aperture array image, using information on the rotational deviation amount of the aperture array image of the multiple beams on the target object caused by a residual error of rotation adjustment of the shaping aperture array substrate, and a blanking aperture array mechanism, rotatable with the shaping aperture array substrate, to provide individual blanking control of the multiple beams, based on the pattern data of the figure pattern reversely rotated.
Public/Granted literature
- US20190198290A1 MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2019-06-27
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