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    Alignment and registration targets for multiple-column charged particle beam lithography and inspection
    12.
    发明授权
    Alignment and registration targets for multiple-column charged particle beam lithography and inspection 有权
    多列带电粒子束光刻和检查的对准和配准目标

    公开(公告)号：US09595419B1

    公开(公告)日：2017-03-14

    申请号：US14522563

    申请日：2014-10-23

    Applicant: Multibeam Corporation

    Inventor： Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop ,  David K. Lam

    IPC: H01J37/22 ,  H01J37/26

    CPC classification number: H01J37/3045 ,  G03F1/42 ,  G03F1/86 ,  G03F9/7076 ,  G03F9/7084 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/3005 ,  H01J37/3177 ,  H01J2237/063 ,  H01J2237/2611 ,  H01J2237/2826 ,  H01J2237/30444 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31774

    Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

    Abstract translation: 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现使用Hadamard变换产生的图案作为用于多列带电粒子束光刻和检查工具的对准和对准标记（Hadamard靶）是非常有利的。 此外，除了在内部衬底部分中图案化的Hadamard靶之外，还可以使用在光刻之前通常剥离光刻胶的基板的边缘近端部分图案化的Hadamard靶，从而实现优异的衬底对准和层间图案配准精度 。 高阶Hadamard靶也可以进行图案化和成像，以获得诸如超快速光束校准DOE，色谱柱匹配和色谱柱性能跟踪等应用的卓越色谱柱性能指标。 优异的对齐和注册以及列参数优化，可显着提高收益。

    Alignment and registration targets for multiple-column charged particle beam lithography and inspection
    13.
    发明授权
    Alignment and registration targets for multiple-column charged particle beam lithography and inspection 有权
    多列带电粒子束光刻和检查的对准和配准目标

    公开(公告)号：US09478395B1

    公开(公告)日：2016-10-25

    申请号：US14523909

    申请日：2014-10-26

    Applicant: Multibeam Corporation

    Inventor： Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop ,  David K. Lam

    IPC: G06F17/50 ,  H01J37/317 ,  H01J37/26 ,  H01J37/30

    CPC classification number: H01J37/3045 ,  G03F1/42 ,  G03F1/86 ,  G03F9/7076 ,  G03F9/7084 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/3005 ,  H01J37/3177 ,  H01J2237/063 ,  H01J2237/2611 ,  H01J2237/2826 ,  H01J2237/30444 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31774

    Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

    Abstract translation: 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现使用Hadamard变换产生的图案作为用于多列带电粒子束光刻和检查工具的对准和对准标记（Hadamard靶）是非常有利的。 此外，除了在内部衬底部分中图案化的Hadamard靶之外，还可以使用在光刻之前通常剥离光刻胶的基板的边缘近端部分图案化的Hadamard靶，从而实现优异的衬底对准和层间图案配准精度 。 高阶Hadamard靶也可以进行图案化和成像，以获得诸如超快速光束校准DOE，色谱柱匹配和色谱柱性能跟踪等应用的卓越色谱柱性能指标。 优异的对齐和注册以及列参数优化，可显着提高收益。

    Secure permanent integrated circuit personalization
    15.
    发明授权
    Secure permanent integrated circuit personalization 有权

    公开(公告)号：US10659229B1

    公开(公告)日：2020-05-19

    申请号：US16276047

    申请日：2019-02-14

    Applicant: Multibeam Corporation

    Inventor： Michael C. Smayling ,  David K. Lam ,  Theodore A. Prescop ,  Kevin M. Monahan

    IPC: H04L29/06 ,  H04L9/32 ,  H01L23/00 ,  H01L21/3065 ,  G06F3/06 ,  G06F21/60 ,  H04L9/08 ,  H04L9/14 ,  G06F21/75 ,  G09C1/00 ,  G06F21/73 ,  G06F21/72 ,  H01L21/263 ,  H01L23/544

    Abstract: Methods, systems and devices for using charged particle beams (CPBs) to write different die-specific, non-volatile, electronically readable data to different dies on a substrate. CPBs can fully write die-specific data within the chip interconnect structure during the device fabrication process, at high resolution and within a small area, allowing one or multiple usefully-sized values to be securely written to service device functions. CPBs can write die-specific data in areas readable or unreadable through a (or any) communications bus. Die-specific data can be used for, e.g.: encryption keys; communications addresses; manufacturing information (including die identification numbers); random number generator improvements; or single, nested, or compartmentalized security codes. Die-specific data and locations for writing die-specific data can be kept in encrypted form when not being written to the substrate to conditionally or permanently prevent any knowledge of said data and locations.

    Secure intra-chip hardware micro-segmentation using charged particle beam processing
    17.
    发明授权
    Secure intra-chip hardware micro-segmentation using charged particle beam processing 有权

    公开(公告)号：US10523433B1

    公开(公告)日：2019-12-31

    申请号：US15711891

    申请日：2017-09-21

    Applicant: Multibeam Corporation

    Inventor： Kevin M. Monahan ,  David K. Lam ,  Theodore A. Prescop

    IPC: G06F21/00 ,  H04L9/08 ,  H04L9/30

    Abstract: Methods, systems and devices for using different encryption keys written into interconnects of different functional blocks in different integrated circuits to securely encrypt and authenticate firmware, data, instructions and other messages transmitted among said functional blocks; and methods, systems and devices to obfuscate encryption keys to significantly increase the time and resources required to compromise those keys, ensuring encrypted data is only decrypted by authorized functional blocks, applications or users. Unique keys, small enough not to impact substrate surface area available for other device functions, can be written by charged particle beams such that multiple (or each of) functional blocks has a corresponding key unique within an IC and across a line of ICs and so that access to said keys is as limited (or nonexistent) as desired. Circuits embodying key bits can also be distributed throughout ICs and across layers, uniquely to individual functional blocks in individual ICs, to obfuscate patterns implementing keys and thereby raising time and resource cost to reverse engineer keys to prohibitive levels.

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