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    Continuous-Wave Laser-Sustained Plasma Illumination Source
    12.
    发明申请
    Continuous-Wave Laser-Sustained Plasma Illumination Source 审中-公开
    连续波激光持续等离子体照明源

    公开(公告)号：US20160268120A1

    公开(公告)日：2016-09-15

    申请号：US15064294

    申请日：2016-03-08

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Panzer

    IPC: H01J65/04 ,  H05H1/48 ,  H05H1/46 ,  H01J37/32

    CPC classification number: H01J65/04 ,  H05G2/008

    Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.

    Abstract translation: 用于通过光持续等离子体形成产生宽带光的光学系统包括腔室，照明源，一组聚焦光学器件和一组收集光学器件。 室被配置为在第一相中包含缓冲材料和第二相中的等离子体形成材料。 照明源产生连续波泵照明。 该组聚焦光学器件将连续波泵浦照明通过缓冲材料聚焦到缓冲材料和等离子体形成材料之间的界面上，以便通过激发至少等离子体形成材料产生等离子体。 该组收集光学器件接收从等离子体发出的宽带辐射。

    Open Plasma Lamp for Forming a Light-Sustained Plasma
    13.
    发明申请
    Open Plasma Lamp for Forming a Light-Sustained Plasma 有权
    开放式等离子灯形成轻维持等离子体

    公开(公告)号：US20150279628A1

    公开(公告)日：2015-10-01

    申请号：US14670210

    申请日：2015-03-26

    Applicant: KLA-Tencor Corporation

    Inventor： Lauren Wilson ,  Anant Chimmalgi ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Matthew Derstine ,  Gildardo Delgado

    IPC: H01J37/32

    CPC classification number: H01J37/32339 ,  H01J37/32449 ,  H01J65/04

    Abstract: An open plasma lamp includes a cavity section. A gas input and gas output of the cavity section are arranged to flow gas through the cavity section. The plasma lamp also includes a gas supply assembly fluidically coupled to the gas input of the cavity section and configured to supply gas to an internal volume of the cavity section. The plasma lamp also includes a nozzle assembly fluidically coupled to the gas output of the cavity section. The nozzle assembly and cavity section are arranged such that a volume of the gas receives pumping illumination from a pump source, where a sustained plasma emits broadband radiation. The nozzle assembly is configured to establish a convective gas flow from within the cavity section to a region external to the cavity section such that a portion of the sustained plasma is removed from the cavity section by the gas flow.

    Abstract translation: 开放式等离子体灯包括空腔部分。 空腔部分的气体输入和气体输出被布置成使气体流过空腔部分。 等离子体灯还包括气体供应组件，其流体地耦合到空腔部分的气体输入并且被配置为将气体供应到空腔部分的内部容积。 等离子体灯还包括流体耦合到空腔部分的气体输出的喷嘴组件。 喷嘴组件和空腔部分布置成使得一定体积的气体从泵浦源接收泵送照明，其中持续等离子体发射宽带辐射。 喷嘴组件被配置成建立从空腔部分内到空腔部分外部的区域的对流气流，使得通过气流将一部分持续等离子体从空腔部分移除。

    Laser sustained plasma bulb including water
    15.
    发明授权
    Laser sustained plasma bulb including water 有权
    激光持续等离子体灯泡包括水

    公开(公告)号：US08796652B2

    公开(公告)日：2014-08-05

    申请号：US13790084

    申请日：2013-03-08

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Matthew Alan Panzer

    IPC: H05G2/00

    CPC classification number: H01J61/02 ,  H01J61/12 ,  H01J61/125 ,  H01J61/14 ,  H01J61/16 ,  H01J61/28 ,  H01J61/302 ,  H01J61/52 ,  H01J61/54 ,  H01J65/04 ,  H01J65/042

    Abstract: A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.

    Abstract translation: 晶片检查系统包括激光持续等离子体（LSP）光源，其产生具有足够辐射度的光以实现明场检查。 通过将一定量的水引入到含有产生等离子体的气体混合物的灯泡中来提高LSP光源的可靠性。 由等离子体产生的辐射包括在低于约190纳米的波长范围内的实质辐射，这导致用于构建灯泡的材料的损坏。 水蒸汽作为在等离子体产生的辐射的吸收体，在波长范围内引起损伤。 在一些实例中，将预定量的水引入灯泡以提供足够的吸收。 在一些其它实施例中，调节包含一定量冷凝水的灯泡的一部分的温度以产生灯泡中期望的水分压。

    Method and Apparatus to Reduce Thermal Stress by Regulation and Control of Lamp Operating Temperatures
    16.
    发明申请
    Method and Apparatus to Reduce Thermal Stress by Regulation and Control of Lamp Operating Temperatures 有权
    通过调节和控制灯泡工作温度来减少热应力的方法和装置

    公开(公告)号：US20140060792A1

    公开(公告)日：2014-03-06

    申请号：US13975945

    申请日：2013-08-26

    Applicant: KLA-Tencor Corporation

    Inventor： Jincheng Wang ,  Anant Chimmalgi ,  Rajeev Patil ,  Erik Kim ,  Rudolf Brunner ,  Quang Giang ,  Lauren Wilson ,  Ken Gross ,  Ilya Bezel ,  Dan Scott ,  Younus Vora ,  Matthew Derstine ,  Cedric Lasfargues

    IPC: F28C3/04

    CPC classification number: F28C3/04 ,  F21V19/00 ,  F21V29/02 ,  F21V29/503 ,  F21V29/60

    Abstract: A fluid input manifold distributes injected fluid around the body of a bulb to cool the bulb below a threshold. The injected fluid also distributes heat more evenly along the surface of the bulb to reduce thermal stress. The fluid input manifold may comprise one or more airfoils to direct a substantially laminar fluid flow along the surface of the bulb or it may comprise a plurality of fluid injection nozzles oriented to produce a substantially laminar fluid flow. An output portion may be configured to facilitate fluid flow along the surface of the bulb by allowing injected fluid to easily escape after absorbing heat from the bulb or by applying negative pressure to actively draw injected fluid along the surface of the bulb and away.

    Abstract translation: 流体输入歧管将注入的流体分布在灯泡的主体周围以将灯泡冷却到阈值以下。 喷射的流体还可以沿着灯泡的表面更均匀地分布热量以减少热应力。 流体输入歧管可以包括一个或多个翼型件，以引导基本上层流的流体沿着灯泡的表面，或者其可以包括多个流体喷射喷嘴，其被定向以产生基本上层流的流体流。 输出部分可以被配置为通过允许注入的流体在从灯泡吸收热量之后容易地逸出，或者通过施加负压以沿着灯泡的表面主动地吸取注入的流体并且远离，从而促进沿着灯泡表面的流体流动。

    Laser Sustained Plasma Bulb Including Water
    17.
    发明申请
    Laser Sustained Plasma Bulb Including Water 有权
    激光持续等离子体灯泡包括水

    公开(公告)号：US20140042336A1

    公开(公告)日：2014-02-13

    申请号：US13790084

    申请日：2013-03-08

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Matthew Alan Panzer

    IPC: H01J61/02

    CPC classification number: H01J61/02 ,  H01J61/12 ,  H01J61/125 ,  H01J61/14 ,  H01J61/16 ,  H01J61/28 ,  H01J61/302 ,  H01J61/52 ,  H01J61/54 ,  H01J65/04 ,  H01J65/042

    Abstract: A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.

    Abstract translation: 晶片检查系统包括激光持续等离子体（LSP）光源，其产生具有足够辐射度的光以实现明场检查。 通过将一定量的水引入到含有产生等离子体的气体混合物的灯泡中来提高LSP光源的可靠性。 由等离子体产生的辐射包括在低于约190纳米的波长范围内的实质辐射，这导致用于构建灯泡的材料的损坏。 水蒸汽作为在等离子体产生的辐射的吸收体，在波长范围内引起损伤。 在一些实例中，将预定量的水引入灯泡以提供足够的吸收。 在一些其它实施例中，调节包含一定量冷凝水的灯泡的一部分的温度以产生灯泡中期望的水分压。

    Differential imaging for single-path optical wafer inspection
    18.
    发明授权
    Differential imaging for single-path optical wafer inspection 有权

    公开(公告)号：US11138722B2

    公开(公告)日：2021-10-05

    申请号：US16229816

    申请日：2018-12-21

    Applicant: KLA-Tencor Corporation

    Inventor： Anatoly Shchemelinin ,  Ilya Bezel ,  Eugene Shifrin

    IPC: G06T7/00 ,  G01N21/95 ,  G01N21/88

    Abstract: Methods and systems for enhanced defect detection based on images collected by at least two imaging detectors at different times are described. In some embodiments, the time between image measurements is at least 100 microseconds and no more than 10 milliseconds. In one aspect, one or more defects of interest are identified based on a composite image of a measured area generated based on a difference between collected images. In a further aspect, measurement conditions associated with the each imaged location are adjusted to be different for measurements performed by at least two imaging detectors at different times. In some embodiments, the measurement conditions are adjusted during the time between measurements by different imaging detectors. Exemplary changes of measurement conditions include environmental changes at the wafer under measurement and changes made to the optical configuration of the inspection system.

    Laser sustained plasma light source with forced flow through natural convection
    19.
    发明授权
    Laser sustained plasma light source with forced flow through natural convection 有权

    公开(公告)号：US10690589B2

    公开(公告)日：2020-06-23

    申请号：US16043764

    申请日：2018-07-24

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Kenneth P. Gross ,  John Szilagyi

    IPC: G01N21/21 ,  H01J65/04 ,  H05H1/24 ,  G01N21/25

    Abstract: A broadband radiation source is disclosed. The system may include a plasma containment vessel configured to receive laser radiation from a pump source to sustain a plasma within gas flowed through the plasma containment vessel. The plasma containment vessel may be further configured to transmit at least a portion of broadband radiation emitted by the plasma. The system may also include a recirculation gas loop fluidically coupled to the plasma containment vessel. The recirculation gas loop may be configured to transport heated gas from an outlet of the plasma containment vessel, and further configured to transport cooled gas to an inlet of the plasma containment vessel.

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