公开(公告)号：US09343265B2

公开(公告)日：2016-05-17

申请号：US14370763

申请日：2012-12-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Asako Kaneko ,  Hisayuki Takasu ,  Hirobumi Mutou

IPC: C23C14/35 ,  H01J37/305 ,  C23C14/50 ,  C23C16/458 ,  C23C8/40 ,  H01J37/20 ,  H01J37/16 ,  H01J37/18

CPC classification number: H01J37/3053 ,  C23C8/40 ,  C23C14/505 ,  C23C16/4586 ,  H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/28 ,  H01J2237/3151 ,  H01J2237/31749

Abstract: The purpose of the present invention is to provide a charged particle beam irradiation apparatus of a relatively simple structure which performs cooling on a sample or a sample stage. An aspect of the present invention comprises: a charged particle source; a sample stage; and a driving mechanism that comprises a transmission mechanism which transmits a driving force to move the sample stage. The charged particle beam irradiation apparatus comprises a container capable of accommodating an ionic liquid (12), wherein the container is disposed in a vacuum chamber. When the ionic liquid (12) is accommodated in the container, at least a portion of the transmission mechanism is provided at a position submerged in the ionic liquid (12).

Abstract translation: 本发明的目的是提供一种对样品或样品台进行冷却的相对简单结构的带电粒子束照射装置。 本发明的一个方面包括：带电粒子源; 样品台 以及包括传递驱动力以移动样品台的传动机构的驱动机构。 带电粒子束照射装置包括能够容纳离子液体（12）的容器，其中容器设置在真空室中。 当离子液体（12）容纳在容器中时，传播机构的至少一部分设置在浸没在离子液体（12）中的位置。

公开(公告)号：US11621141B2

公开(公告)日：2023-04-04

申请号：US16077782

申请日：2016-02-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Toru Iwaya ,  Hisayuki Takasu ,  Sakae Koubori

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/08 ,  H01J37/26 ,  H01J37/304 ,  H01J37/30

Abstract: Provided is a machining technology to obtain a desired machining content while suppressing a possibility of causing a redeposition in a machining surface. The invention is directed to provide an ion milling device which includes an ion source which emits an ion beam, a sample holder which holds a sample, and a sample sliding mechanism which slides the sample holder in a direction including a normal direction of an axis of the ion beam.

公开(公告)号：US11257654B2

公开(公告)日：2022-02-22

申请号：US16316289

申请日：2016-07-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kengo Asai ,  Hiroyasu Shichi ,  Toru Iwaya ,  Hisayuki Takasu

IPC: H01J37/08 ,  H01J37/305 ,  H01J37/09

Abstract: To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.

公开(公告)号：US10269534B2

公开(公告)日：2019-04-23

申请号：US15547315

申请日：2015-01-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Toru Iwaya ,  Hisayuki Takasu ,  Sakae Koubori ,  Atsushi Kamino ,  Kento Horinouchi

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/31 ,  H01J37/305

Abstract: The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.

公开(公告)号：US10192710B2

公开(公告)日：2019-01-29

申请号：US15574873

申请日：2015-05-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuki Tani ,  Hisayuki Takasu ,  Shuichi Takeuchi

IPC: H01J37/305 ,  H01J37/08 ,  H01J27/04 ,  H01J37/30 ,  H01J37/24 ,  H01J37/302

Abstract: An object of the present invention is to provide an ion milling apparatus capable of processing deposits attached to an ion gun and an ion milling method capable of processing deposits attached to an ion gun. The ion milling apparatus includes gas injection means for injecting a gas toward the ion gun, and the gas injection means included in the ion milling apparatus moves the deposits attached to the ion gun by injecting the gas toward the inside of the ion gun.

公开(公告)号：US11226273B2

公开(公告)日：2022-01-18

申请号：US16070468

申请日：2016-02-03

Applicant: Hitachi High-Technologies Corporation

Inventor： Atsushi Kamino ,  Hisayuki Takasu

IPC: G01N1/32 ,  H01J37/20 ,  H01J37/305

Abstract: The present invention is directed to a side entry type sample holder which enables observation with an observation apparatus without removing the sample to be analyzed from the sample holder after processing the sample to be analyzed by a processing apparatus. The sample holder includes a grip, a sample holder main body extending from the grip, a tip portion which is connected to the sample holder main body and provided with a sample table for fixing a sample, and a mechanism which changes a relative positional relationship between a processing surface of the sample fixed to the sample table and an irradiation direction of an ion beam, and causes the tip portion to avoid irradiation with the ion beam during sample processing.

公开(公告)号：US11133153B2

公开(公告)日：2021-09-28

申请号：US16012423

申请日：2018-06-19

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toru Iwaya ,  Hirobumi Muto ,  Hisayuki Takasu ,  Atsushi Kamino ,  Asako Kaneko

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/20 ,  H01J37/304

Abstract: An ion milling device of the present invention is provided with a tilt stage (8) which is disposed in a vacuum chamber (15) and has a tilt axis parallel to a first axis orthogonal to an ion beam, a drive mechanism (9, 51) which has a rotation axis and a tilt axis parallel to a second axis orthogonal to the first axis and rotates or tilts a sample (3), and a switching unit which enables switching between a state in which the ion beam is applied while the sample is rotated or swung while the tilt stage is tilted, and a state in which the ion beams is applied while the tilt stage is brought into an untilted state and the sample is swung. Consequently, the ion milling device capable of performing cross-section processing and flat processing of the sample in the same vacuum chamber is implemented.

公开(公告)号：US11004652B2

公开(公告)日：2021-05-11

申请号：US16642231

申请日：2017-09-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Asako Kaneko ,  Hisayuki Takasu

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/08 ,  H01J37/09 ,  H01J37/31

Abstract: An object of the present invention is to provide a technique for reducing a phenomenon in which fine particles derived from a sample and bounced off by ion beam irradiation are reattached to an ion milling surface. An ion milling device of the invention includes an ion source which emits an ion beam, a chamber, a sample table in which a sample is placed in the chamber, and a shielding plate placed on the sample, and by having a magnet disposed in the chamber, reattachment of fine particles derived from the sample can be reduced.

公开(公告)号：US09761412B2

公开(公告)日：2017-09-12

申请号：US15306510

申请日：2014-05-09

Applicant: Hitachi High-Technologies Corporation

Inventor： Kento Horinouchi ,  Atsushi Kamino ,  Toru Iwaya ,  Hisayuki Takasu

IPC: H01J37/305 ,  H01J37/30 ,  G01N1/32 ,  H01J37/20 ,  H01J37/09

CPC classification number: H01J37/305 ,  G01N1/32 ,  H01J37/09 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/045 ,  H01J2237/3151

Abstract: Provided is a technology for suppressing a heat rise in a sample, the heat rise being generated due to ion beam irradiation at a low acceleration voltage. A blocking plate, which is different from a mask, is disposed in front of a sample. The blocking plate has an opening that overlaps a processing surface, and ion beams pass only through the opening of the blocking plate, and in the areas excluding the opening, the ion beams are blocked by the blocking plate, and the sample is not irradiated thereby. Furthermore, the heat rise in the sample is further suppressed by cooling the blocking plate.