公开(公告)号：US11621141B2

公开(公告)日：2023-04-04

申请号：US16077782

申请日：2016-02-26

申请人： Hitachi High-Technologies Corporation

发明人： Toru Iwaya ,  Hisayuki Takasu ,  Sakae Koubori

IPC分类号： H01J37/20 ,  H01J37/305 ,  H01J37/08 ,  H01J37/26 ,  H01J37/304 ,  H01J37/30

摘要： Provided is a machining technology to obtain a desired machining content while suppressing a possibility of causing a redeposition in a machining surface. The invention is directed to provide an ion milling device which includes an ion source which emits an ion beam, a sample holder which holds a sample, and a sample sliding mechanism which slides the sample holder in a direction including a normal direction of an axis of the ion beam.

公开(公告)号：US10269534B2

公开(公告)日：2019-04-23

申请号：US15547315

申请日：2015-01-30

申请人： Hitachi High-Technologies Corporation

发明人： Toru Iwaya ,  Hisayuki Takasu ,  Sakae Koubori ,  Atsushi Kamino ,  Kento Horinouchi

IPC分类号： H01J37/20 ,  H01J37/26 ,  H01J37/31 ,  H01J37/305

摘要： The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.