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公开(公告)号：US09899226B2
公开(公告)日：2018-02-20
申请号：US14658121
申请日：2015-03-13
Inventor： Ho Kyun Ahn , Hae Cheon Kim , Jong Won Lim , Dong Min Kang , Yong Hwan Kwon , Seong Il Kim , Zin Sig Kim , Eun Soo Nam , Byoung Gue Min , Hyung Sup Yoon , Kyung Ho Lee , Jong Min Lee , Kyu Jun Cho
IPC: H01L29/40 , H01L21/28 , H01L29/423 , H01L29/66 , H01L29/778 , H01L29/51 , H01L29/20 , H01L29/45
CPC classification number: H01L21/28264 , H01L29/2003 , H01L29/407 , H01L29/42316 , H01L29/4236 , H01L29/452 , H01L29/51 , H01L29/513 , H01L29/517 , H01L29/518 , H01L29/66462 , H01L29/7786
Abstract: Provided herein is a semiconductor device including a substrate; an active layer formed on top of the substrate; a protective layer formed on top of the active layer and having a first aperture; a source electrode, driving gate electrode and drain electrode formed on top of the protective layer; and a first additional gate electrode formed on top of the first aperture, wherein an electric field is applied to the active layer, protective layer and driving gate electrode due to a voltage applied to each of the source electrode, drain electrode and driving gate electrode, and the first additional gate electrode is configured to attenuate a size of the electric field applied to at least a portion of the active layer, protective layer and driving gate electrode.
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Patent Agency Ranking
公开(公告)号：US08901608B2
公开(公告)日：2014-12-02
申请号：US13908076
申请日：2013-06-03
Inventor： Jong-Won Lim , Hokyun Ahn , Woojin Chang , Dong Min Kang , Seong-Il Kim , Sang-Heung Lee , Hyung Sup Yoon , Chull Won Ju , Hae Cheon Kim , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L33/00 , H01L29/66 , H01L29/778
CPC classification number: H01L29/778 , H01L29/402 , H01L29/42316 , H01L29/66431
Abstract: A high electron mobility transistor includes a T-type gate electrode disposed on a substrate between source and drain electrodes and insulating layers disposed between the substrate and the T-type gate electrode. The insulating layers include first, second, and third insulating layers. The third insulating layer is disposed between the substrate and a head portion of the T-type gate electrode such that a portion of the third insulating layer is in contact with a foot portion of the T-type gate electrode. The second insulating layer is disposed between the substrate and the head portion of the T-type gate electrode to be in contact with the third insulating layer. The first insulating layer and another portion of the third insulating layer are sequentially stacked between the substrate and the head portion of the T-type gate electrode to be in contact with the second insulating layer.
Abstract translation: 高电子迁移率晶体管包括设置在源极和漏极之间的衬底上的T型栅电极和设置在衬底和T型栅电极之间的绝缘层。 绝缘层包括第一绝缘层，第二绝缘层和第三绝缘层。 第三绝缘层设置在基板和T型栅电极的头部之间，使得第三绝缘层的一部分与T型栅极的脚部接触。 第二绝缘层设置在基板与T型栅电极的头部之间以与第三绝缘层接触。 所述第一绝缘层和所述第三绝缘层的另一部分依次层叠在所述基板与所述T型栅电极的头部之间，以与所述第二绝缘层接触。
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13.发明授权公开(公告)号：US12176306B2
公开(公告)日：2024-12-24
申请号：US17396258
申请日：2021-08-06
Inventor： Sang Heung Lee , Soo Cheol Kang , Seong Il Kim , Hae Cheon Kim , Youn Sub Noh , Ho Kyun Ahn , Jong Won Lim , Sung Jae Chang , Hyun Wook Jung
IPC: H01L23/64 , H01L29/16 , H01L29/20 , H01L29/205
Abstract: An apparatus and method for generating an electrical circuit of semiconductor channel resistor including a first passive element part including a resistor and a capacitor connected in parallel between a first port and a second port, and an ohmic resistor connected in series to the resistor and the capacitor which are connected in parallel are provided. The apparatus includes a substrate selection part configured to receive a selected substrate item; a resistor selection part configured to receive a selected resistor item; a capacitor selection part configured to receive a selected capacitor item; and a circuit generating part configured to generate an electrical circuit from the selected substrate item, the selected resistor item, and the selected capacitor item.
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公开(公告)号：US09837719B2
公开(公告)日：2017-12-05
申请号：US15229891
申请日：2016-08-05
Inventor： Dong-Young Kim , Dong Min Kang , Seong-Il Kim , Hae Cheon Kim , Jae Won Do , Byoung-Gue Min , Ho Kyun Ahn , Hyung Sup Yoon , Sang-Heung Lee , Jong Min Lee , Jong-Won Lim , Yoo Jin Jang , Hyun Wook Jung , Kyu Jun Cho , Chull Won Ju
CPC classification number: H01Q9/0407 , H01Q1/50 , H01Q9/0442
Abstract: Provided herein is a patch antenna including a multilayered substrate on which a plurality of dielectric layers are laminated; at least one metal pattern layer disposed between the plurality of dielectric layers outside a central area of the multilayered substrate; an antenna patch disposed on an upper surface of the multilayered substrate and within the central area; a ground layer disposed on a lower surface of the multilayered substrate; a plurality of connection via patterns penetrating the plurality of dielectric layers to connect the metal pattern layer and the ground layer, and surrounding the central area; a transmission line comprising a first transmission line unit disposed on the upper surface of the multilayered substrate and located outside the central area, and a second transmission line unit disposed on the upper surface of the multilayered substrate and located within the central area; and an impedance transformer located below the second transmission line unit within the central area of the multilayered substrate.
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公开(公告)号：US08937002B2
公开(公告)日：2015-01-20
申请号：US14230031
申请日：2014-03-31
Inventor： Sung Bum Bae , Eun Soo Nam , Jae Kyoung Mun , Sung Bock Kim , Hae Cheon Kim , Chull Won Ju , Sang Choon Ko , Jong-Won Lim , Ho Kyun Ahn , Woo Jin Chang , Young Rak Park
IPC: H01L21/20 , H01L29/66 , H01L21/8252 , H01L27/06 , H01L27/088 , H01L21/02
CPC classification number: H01L29/66446 , H01L21/0242 , H01L21/02458 , H01L21/0254 , H01L21/02647 , H01L21/8252 , H01L27/0605 , H01L27/0883
Abstract: The present disclosure relates to a nitride electronic device and a method for manufacturing the same, and particularly, to a nitride electronic device and a method for manufacturing the same that can implement various types of nitride integrated structures on the same substrate through a regrowth technology (epitaxially lateral over-growth: ELOG) of a semi-insulating gallium nitride (GaN) layer used in a III-nitride semiconductor electronic device including Group III elements such as gallium (Ga), aluminum (Al) and indium (In) and nitrogen.
Abstract translation: 本发明涉及一种氮化物电子器件及其制造方法，特别涉及一种氮化物电子器件及其制造方法，该氮化物电子器件及其制造方法可通过再生技术在同一衬底上实现各种氮化物一体化结构（ 用于包括III族元素如镓（Ga），铝（Al）和铟（In））和氮（III）的III族氮化物半导体电子器件中的半绝缘氮化镓（GaN）层的外延横向过度生长：ELOG） 。
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公开(公告)号：US08697491B2
公开(公告)日：2014-04-15
申请号：US13653068
申请日：2012-10-16
Inventor： Woojin Chang , Soon Il Yeo , Hae Cheon Kim , Eun Soo Nam
IPC: H01L23/053 , H01L21/44
CPC classification number: H01L23/5389 , H01L23/3107 , H01L24/83 , H01L24/90 , H01L25/03 , H01L2224/90 , H01L2924/00011 , H01L2924/01079 , H01L2924/09701 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/1517 , H01L2224/83851 , H01L2924/00
Abstract: A semiconductor package is provided. The semiconductor package includes a package body, a plurality of semiconductor chips, and an external connection terminal. The package body is stacked with a plurality of sheets where conductive patterns and vias are disposed. The plurality of semiconductor chips are inserted into insert slots extending from one surface of the package body. The external connection terminal is provided on other surface opposite to the one surface of the package body. Here, the plurality of semiconductor chips are electrically connected to the external connection terminal.
Abstract translation: 提供半导体封装。 半导体封装包括封装体，多个半导体芯片和外部连接端子。 封装体与设置有导电图案和通孔的多个片层叠。 多个半导体芯片被插入到从封装主体的一个表面延伸的插入槽中。 外部连接端子设置在与封装主体的一个表面相对的另一表面上。 这里，多个半导体芯片电连接到外部连接端子。
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