Display substrate, display panel and display device

    公开(公告)号:US11927853B2

    公开(公告)日:2024-03-12

    申请号:US17259911

    申请日:2020-04-03

    Abstract: The embodiments of the present disclosure relate to the field of display technology, and in particular to a display substrate, a display panel, and a display device. The display substrate includes a first electrode, a first wire, and a second wire; the first electrode is provided with a plurality of slits; the first wire is provided on a side of the first electrode, and a first gap is provided between the first wire and the first electrode, and the first wire being electrically connected to the first electrode; a second wire provided on a side of the first electrode away from the first wire, and a second gap being provided between the second wire and the first electrode; wherein each of the slits is provided with a first end and a second end opposed to each other, and the first end is close to the first wire, and the second end is close to the second wire, and a light-transmitting part of the first end is larger than a light-transmitting part of the second end. The electric field disorder of the first end is better than the electric field disorder of the second, so that the weak zone at the first end is larger than the weak zone at the second end. By increasing the light-transmitting part of the first end, the weak zone at the first end becomes smaller, thereby making the weak zone of the first end is basically the same as the weak zone of the second end.

    Photoelectric sensor and manufacturing method thereof

    公开(公告)号:US11189740B2

    公开(公告)日:2021-11-30

    申请号:US16819833

    申请日:2020-03-16

    Inventor: Jianhua Du Chao Li

    Abstract: The embodiment of the application discloses a photoelectric sensor and a manufacturing method thereof, wherein the photoelectric sensor comprises: a light absorbing layer for absorbing incident light to generate a photocurrent, the light absorption layer comprises a first absorption layer and a second absorption layer stacked in the direction of incident light, the first absorption layer being an intrinsic semiconductor layer of the photoelectric sensor, the second absorption layer being made of a material having a higher photoelectric conversion efficiency than the first absorption layer, and the second absorption layer has a stripe structure arranged at intervals.

    Display panel and display device
    16.
    发明授权

    公开(公告)号:US11561444B2

    公开(公告)日:2023-01-24

    申请号:US17515032

    申请日:2021-10-29

    Abstract: A display panel and a display device are disclosed. The display panel includes a plurality of sub-pixels arranged in an array; gate line light shielding parts extending in a row direction are arranged on horizontal non-display areas between every two adjacent rows of sub-pixels; vertical non-display areas are arranged between every two sub-pixels adjacent in a row direction; at least one of the vertical non-display areas is provided with a vertical light shielding part, and the vertical light shielding part is configured to prevent two sub-pixels on two sides, in the row direction, of the vertical light shielding part from light leakage at a junction; and a gap is formed between the vertical light shielding part and each of two gate line light shielding parts adjacent to the vertical light shielding part.

    Thin film transistor and method for manufacturing a thin film transistor

    公开(公告)号:US11309427B2

    公开(公告)日:2022-04-19

    申请号:US16642638

    申请日:2019-03-04

    Abstract: The present disclosure relates to a thin film transistor and a manufacturing method thereof. The thin film transistor includes a substrate, a first semiconductor layer, a gate dielectric layer, and a gate electrode sequentially stacked on the substrate, the first semiconductor layer has a first portion located in a channel region of the thin film transistor and a second portion in source/drain regions of the thin film transistor and located on both sides of the first portion, the second portion and first sub-portions of the first portion adjacent to the second portion include an amorphous semiconductor material, a second sub-portion of the first portion between the first sub-portions includes a polycrystalline semiconductor material, and a second semiconductor layer located in the source/drain regions and in contact with the second portion, wherein a conductivity of the second semiconductor layer is higher than a conductivity of the amorphous semiconductor material.

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