Display substrate, display panel and display apparatus

    公开(公告)号:US12032254B2

    公开(公告)日:2024-07-09

    申请号:US17922466

    申请日:2021-02-19

    CPC classification number: G02F1/136286

    Abstract: A display substrate, a display panel and a display apparatus. The display substrate including: a substrate having a display area; a plurality of sub-pixels arranged in an array and located in the display area of the substrate; and a plurality of data lines arranged in the display area of the substrate; the plurality of data lines extend in a column direction of the sub-pixels, and a column of sub-pixels are electrically connected with at least one of the plurality of data lines; and for at least one of the plurality of data lines, a side of an orthographic projection of the at least one of the plurality of data lines on the substrate facing orthographic projections of sub-pixels electrically connected with the at least one of the plurality of data lines has a plurality of first concave-convex structures.

    Photoelectric Sensor and Manufacturing Method Thereof

    公开(公告)号:US20210151615A1

    公开(公告)日:2021-05-20

    申请号:US16819833

    申请日:2020-03-16

    Inventor: Jianhua Du Chao Li

    Abstract: The embodiment of the application discloses a photoelectric sensor and a manufacturing method thereof, wherein the photoelectric sensor comprises: a light absorbing layer for absorbing incident light to generate a photocurrent, the light absorption layer comprises a first absorption layer and a second absorption layer stacked in the direction of incident light, the first absorption layer being an intrinsic semiconductor layer of the photoelectric sensor, the second absorption layer being made of a material having a higher photoelectric conversion efficiency than the first absorption layer, and the second absorption layer has a stripe structure arranged at intervals.

    Method for preparing array substrate

    公开(公告)号:US11251207B2

    公开(公告)日:2022-02-15

    申请号:US16846888

    申请日:2020-04-13

    Abstract: The present disclosure discloses a method for preparing an array substrate, an array substrate and a display panel, wherein the method comprises: forming a buffer layer on a substrate in a first region and a second region, wherein the buffer layer has a groove located in the second region; forming a first indium oxide thin film on the buffer layer in the first region; forming a second indium oxide thin film in the groove; performing a reduction process on the second indium oxide thin film to obtain indium particles; forming an amorphous silicon thin film in the groove, and inducing the amorphous silicon of the amorphous silicon thin film to form microcrystalline silicon at a preset temperature by using the indium particles; and removing the indium particles in the microcrystalline silicon to form a microcrystalline silicon semiconductor layer of the microcrystalline silicon thin film transistor.

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