公开(公告)号：USRE49297E1

公开(公告)日：2022-11-15

申请号：US16656627

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US11385547B2

公开(公告)日：2022-07-12

申请号：US16879961

申请日：2020-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Martijn Houben ,  Nicholas Peter Waterson ,  Thibault Simon Mathieu Laurent ,  Yuri Johannes Gabriël Van De Vijver ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Vincentius Fransiscus Cloosterman ,  Siegfried Alexander Tromp ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Niek Jacobus Johannes Roset

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US11281115B2

公开(公告)日：2022-03-22

申请号：US16734579

申请日：2020-01-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US10591828B2

公开(公告)日：2020-03-17

申请号：US16270958

申请日：2019-02-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC: G03F7/20

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US10520837B2

公开(公告)日：2019-12-31

申请号：US15932215

申请日：2018-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC: G03F7/20

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US09823589B2

公开(公告)日：2017-11-21

申请号：US15078814

申请日：2016-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US20230273533A1

公开(公告)日：2023-08-31

申请号：US18300094

申请日：2023-04-13

Applicant: ASML NETHERLANDS B.V.

Inventor： NICOLAAS TEN KATE ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/00

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US10705426B2

公开(公告)日：2020-07-07

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Martijn Houben ,  Nicholas Peter Waterson ,  Thibault Simon Mathieu Laurent ,  Yuri Johannes Gabriël Van De Vijver ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Vincentius Fransiscus Cloosterman ,  Siegfried Alexander Tromp ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Niek Jacobus Johannes Roset

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US10191377B2

公开(公告)日：2019-01-29

申请号：US15482526

申请日：2017-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Gerardus Adrianus Antonius Maria Kusters ,  Thibault Simon Mathieu Laurent ,  Marcio Alexandre Cano Miranda ,  Ruud Hendricus Martinus Johannes Bloks ,  Peng Feng ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US09971254B2

公开(公告)日：2018-05-15

申请号：US15694519

申请日：2017-09-01

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Haico Victor Kok ,  Yuri Johannes Gabriël Van De Vijver ,  Johannes Antonius Maria Van De Wal ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert-Jan Voogd ,  Jan Steven Christiaan Westerlaken ,  Johannes Hubertus Antonius Van De Rijdt ,  Allard Eelco Kooiker ,  Wilhelmina Margareta Jozef Hurkens-Mertens ,  Yohann Bruno Yvon Teillet

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/74 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.