公开(公告)号：US10534270B2

公开(公告)日：2020-01-14

申请号：US16269745

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van de Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G06F7/20 ,  G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US10520837B2

公开(公告)日：2019-12-31

申请号：US15932215

申请日：2018-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC: G03F7/20

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US11300890B2

公开(公告)日：2022-04-12

申请号：US16722924

申请日：2019-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC: G03F7/20

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US10261422B2

公开(公告)日：2019-04-16

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van Der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.