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公开(公告)号：US09372412B2
公开(公告)日：2016-06-21
申请号：US14839663
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Erwin John Van Zwet , Pieter Willem Herman De Jager , Johannes Onvlee , Erik Christiaan Fritz
CPC classification number: G03F7/70366 , G03F7/70275 , G03F7/70391 , G03F7/704 , G03F7/70491 , G03F7/70883
Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.
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公开(公告)号：US09335638B2
公开(公告)日：2016-05-10
申请号：US13973703
申请日：2013-08-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC classification number: G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
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13.发明申请公开(公告)号：US20150124231A1
公开(公告)日：2015-05-07
申请号：US14398043
申请日：2013-05-06
Applicant: ASML Netherlands B.V.
Inventor： Heine Melle Mulder , Pieter Willem Herman De Jager
IPC: G03F7/20
CPC classification number: G03F7/70025 , G03F7/70391 , G03F7/704 , H01S3/109 , H01S5/141 , H01S5/183 , H01S5/423
Abstract: An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method.
Abstract translation: 一种用于修改多个辐射束的性质的组件，所述组件包括多个波导，所述多个波导被配置为将所述多个辐射束引导得更靠近在一起;以及倍频装置，被配置为接收由所述多个波导引导的多个辐射束 并且产生具有高于整数倍的频率的对应的多个辐射束。 还描述了相应的光刻设备，修改多个辐射束的性质的方法和器件制造方法。
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公开(公告)号：US10884339B2
公开(公告)日：2021-01-05
申请号：US16435630
申请日：2019-06-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Wouter Joep Engelen , Otger Jan Luiten , Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Erik Roelof Loopstra
IPC: G03B27/42 , H01J31/48 , G03F7/20 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H01S3/09 , H05H7/04 , H01S3/00
Abstract: A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：US09823576B2
公开(公告)日：2017-11-21
申请号：US14165334
申请日：2014-01-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Dries Smeets , Arno Jan Bleeker , Christopher James Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
CPC classification number: G03F7/70191 , G03F7/70291
Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
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Patent Agency Ranking
公开(公告)号：US20150034788A1
公开(公告)日：2015-02-05
申请号：US14382228
申请日：2013-01-30
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan Bleeker , Thomas Josephus Maria Castenmill , Pieter Willem Herman De Jager , Heine Melle Mulder , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beere , Roger Anton Marie Timmermans
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。
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公开(公告)号：US10580545B2
公开(公告)日：2020-03-03
申请号：US14917623
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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公开(公告)号：US10527946B2
公开(公告)日：2020-01-07
申请号：US16064332
申请日：2016-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Robert Albertus Johannes Van Der Werf , Michaël Josephus Evert Van De Moosdijk , Pascale Anne Maury
Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.
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公开(公告)号：US09728931B2
公开(公告)日：2017-08-08
申请号：US15035674
申请日：2014-11-27
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op'T Root
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
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公开(公告)号：US08675175B2
公开(公告)日：2014-03-18
申请号：US13791477
申请日：2013-03-08
Applicant: ASML Netherlands B.V.
Inventor： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC classification number: G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
Abstract translation: 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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