公开(公告)号：US09372412B2

公开(公告)日：2016-06-21

申请号：US14839663

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John Van Zwet ,  Pieter Willem Herman De Jager ,  Johannes Onvlee ,  Erik Christiaan Fritz

IPC: G03B27/32 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.