公开(公告)号：US20240396476A1

公开(公告)日：2024-11-28

申请号：US18670550

申请日：2024-05-21

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michael Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC: H02N13/00 ,  G03F7/00

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20240339290A1

公开(公告)日：2024-10-10

申请号：US18748694

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER

IPC: H01J37/20 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/20228

Abstract: Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area comprising an array of sections having rows of sections and columns of sections. Each row of sections defines an elongate region that is substantially equal to or smaller than a pitch at the sample surface of the sub-beams in the multi-beam. A plurality of the sections are processed.

公开(公告)号：US20240128043A1

公开(公告)日：2024-04-18

申请号：US18530109

申请日：2023-12-05

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Roy Ramon VEENSTRA ,  Erwin Paul SMAKMAN ,  Tom VAN ZUTPHEN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/147 ,  H01J2237/2448

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：US20230017894A1

公开(公告)日：2023-01-19

申请号：US17952129

申请日：2022-09-23

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Gun Sara Mari BERGLUND ,  Robert Wong Joek Meu HUANG FOEN CHUNG ,  Diego MARTINEZ NEGRETE GASQUE ,  Laura DINU GURTLER

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/063

Abstract: A flood column for charged particle flooding of a sample, the flood column comprising a charged particle source configured to emit a charged particle beam along a beam path; a source lens arranged down-beam of the charged particle source; a condenser lens arranged down-beam of the source lens; and an aperture body arranged down-beam of the condenser lens, wherein the aperture body is for passing a portion of the charged particle beam; and wherein the source lens is controllable so as to variably set the beam angle of the charged particle beam down-beam of the source lens.

公开(公告)号：US20200043693A1

公开(公告)日：2020-02-06

申请号：US16600364

申请日：2019-10-11

Applicant: ASML Netherlands B.V.

Inventor： Laura DINU-GURTLER ,  Eric Petrus HOGERVORST ,  Jurgen VAN SOEST

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/10 ,  H01L21/263 ,  H01J37/244 ,  G03F7/20

Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.