公开(公告)号：US08658994B2

公开(公告)日：2014-02-25

申请号：US13354938

申请日：2012-01-20

Applicant: Michael John Zani ,  Mark Joseph Bennahmias ,  Jeffrey Winfield Scott

Inventor： Michael John Zani ,  Mark Joseph Bennahmias ,  Jeffrey Winfield Scott

IPC: H01L21/265 ,  H01L21/425 ,  H01L29/06 ,  G21K5/10

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/047 ,  H01J2237/30472 ,  H01J2237/31713 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01J2237/3175 ,  H01J2237/31766 ,  H01L21/265 ,  H01L21/26513 ,  H01L21/76267 ,  H01L21/84 ,  H01L27/0629 ,  H01L29/66462 ,  H01L29/66659 ,  Y10T428/24802 ,  Y10T428/24893

Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.

Abstract translation: 用于将工件暴露于带电粒子的室包括用于产生带电粒子流的带电粒子源，准直器，被配置为沿着轴准直和引导带电粒子流从带电粒子源流出，准直器下游的光束数字化器 被配置为通过调整沿着轴的带电粒子之间的纵向间隔来创建包括至少一个带电粒子的组的数字光束，所述光束数字转换器的下游的偏转器包括沿轴线纵向设置以偏转数字光束的一系列偏转级， 以及构造成保持工件的偏转器下游的工件台。

公开(公告)号：US08618496B2

公开(公告)日：2013-12-31

申请号：US13458861

申请日：2012-04-27

Applicant: Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

Inventor： Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

IPC: G03B27/54 ,  H01J3/14

CPC classification number: G03F7/70 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

Abstract: A charged particle system such as a multi beam lithography system. A manipulator device manipulates one or more charged particle beams. The manipulator device includes at least one through opening in the plane of the planar substrate for passing at least one charged particle. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of the through opening and in a second set of multiple second electrodes along a second part of the perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.

Abstract translation: 带电粒子系统，如多光束光刻系统。 操纵器装置操纵一个或多个带电粒子束。 所述操纵器装置包括在所述平面基板的平面中的至少一个通孔，用于使至少一个带电粒子通过。 每个通孔具有沿着通孔的周边的第一部分和沿着周边的第二部分的第二组多个第二电极中布置在第一组多个第一电极中的电极。 电子控制电路被布置用于根据第一和第二电极沿着通孔的周边的位置来提供电极的电压差。

公开(公告)号：US20130078577A1

公开(公告)日：2013-03-28

申请号：US13629994

申请日：2012-09-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Toru Yamazaki

IPC: H01J3/26 ,  G03F7/20 ,  G06F11/00

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31754 ,  H01J2237/31761 ,  H01J2237/31774

Abstract: A drawing apparatus of the present invention is an apparatus that performs drawing on a substrate with a plurality of charged particle beams and includes a blanking deflector array including a plurality of blanking deflectors configured to respectively blank the plurality of charged particle beams; and a controller configured to control the blanking deflector array based on drawing data. The controller is configured to control the blanking deflector array such that a position error of the plurality of charged particle beams on the substrate due to a magnetic field generated by the blanking deflector array is less than that in a case where the controller controls the blanking deflector array in accordance with initial drawing data.

Abstract translation: 本发明的绘图装置是一种利用多个带电粒子束在衬底上进行绘图的装置，并且包括一个消隐偏转器阵列，该消隐偏转器阵列包括多个消隐偏转器，其构造成分别对多个带电粒子束进行空白; 以及控制器，被配置为基于绘图数据来控制消隐偏转器阵列。 控制器被配置为控制消隐偏转器阵列，使得由于消隐偏转器阵列产生的磁场而导致的衬底上的多个带电粒子束的位置误差小于控制器控制消隐偏转器的情况 阵列按照初始绘图数据。

公开(公告)号：US20130026386A1

公开(公告)日：2013-01-31

申请号：US13486196

申请日：2012-06-01

Applicant: Kazushige Utsumi

Inventor： Kazushige Utsumi

IPC: H01J3/26 ,  C25D5/02

CPC classification number: C25D5/022 ,  C25D3/38 ,  C25D5/02 ,  H01J37/045 ,  H01J2237/0435

Abstract: Disclosed is an electrolytic plating method which includes forming plating films 5 and 6 having predetermined thicknesses in a plurality of regions 14 and 15 on a substrate 1. The electrolytic plating method includes arranging a resistive element 4 having ohmic characteristics in at least one of paths through which electrolytic plating currents flow into the plurality of the regions 14 and 15 on the substrate 1, respectively, and simultaneously growing the plating films 5 and 6 in the plurality of the regions 14 and 15 by electrolytic plating. The electrolytic plating method can form the plating films having different or same thicknesses in the plurality of the regions on the substrate.

Abstract translation: 公开了一种电解电镀方法，其包括在基板1上的多个区域14和15中形成具有预定厚度的镀膜5和6.电解镀覆方法包括在至少一个通路中布置具有欧姆特性的电阻元件4 哪个电解电镀电流分别流入基板1上的多个区域14和15，同时通过电解电镀在多个区域14和15中生长镀膜5和6。 电解电镀法可以在基板上的多个区域中形成具有不同或相同厚度的镀膜。

公开(公告)号：US20120273690A1

公开(公告)日：2012-11-01

申请号：US13458861

申请日：2012-04-27

Applicant: Marco Jan Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

Inventor： Marco Jan Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

IPC: G21K5/04 ,  H01J3/26 ,  H01J3/14

CPC classification number: G03F7/70 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

Abstract: The invention relates to a charged particle system such as a multi beam lithography system, comprising a manipulator device for manipulation of one or more charged particle beams, wherein the manipulator device comprises at least one through opening in the plane of the planar substrate for passing at least one charged particle beam there through. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of said through opening and in a second set of multiple second electrodes along a second part of said perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.

Abstract translation: 本发明涉及带电粒子系统，例如多光束光刻系统，其包括用于操纵一个或多个带电粒子束的操纵器装置，其中所述操纵器装置包括在所述平面基板的平面中的至少一个通孔，用于通过 至少一个带电粒子束通过。 每个通孔具有沿着所述通孔的周边的第一部分布置在第一组多个第一电极中的电极和沿着所述周边的第二部分的第二组多个第二电极。 电子控制电路被布置用于根据第一和第二电极沿着通孔的周边的位置来提供电极的电压差。

公开(公告)号：US08278813B2

公开(公告)日：2012-10-02

申请号：US12481995

申请日：2009-06-10

Applicant: Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

Inventor： Yong Woon Park ,  Hyotcherl Ihee ,  Chang Bum Kim ,  In Soo Ko

IPC: H01J29/46

CPC classification number: H01J37/045 ,  H01J3/18 ,  H01J37/063 ,  H01J37/073 ,  H01J37/295 ,  H01J2237/0432 ,  H01J2237/06333

Abstract: An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.

Abstract translation: 公开了一种用于产生飞秒电子束的装置和方法。 通过将通过阴极发射的电子放电到阳极来产生电子束的装置包括设置在阴极的一侧以允许入射激光通过的透射窗口，形成在阳极上的针孔，使得针孔对应于位置 的发射窗产生的电子，以及设置在阴极一侧的聚焦单元，产生电场以加速并同时将电子集中到针孔。 通过由位于阴极处的聚焦单元产生的电场，电子同时集中并加速到针孔，以产生飞秒电子束。

公开(公告)号：US08258484B2

公开(公告)日：2012-09-04

申请号：US12905131

申请日：2010-10-15

Applicant: Marco Jan Jaco Wieland ,  Alexander Hendrik Vincent Van Veen

Inventor： Marco Jan Jaco Wieland ,  Alexander Hendrik Vincent Van Veen

IPC: H01J37/147 ,  H01J37/244 ,  H01J3/26 ,  G01J1/42

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/0437 ,  H01J2237/0492 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/31762

Abstract: The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet projector. The beam generator is configured to generate a plurality of charged particle beamlets. The beamlet blanker is configured to pattern the beamlets. The beamlet projector is configured to project the patterned beamlets onto the target surface. The system further has a deflection device. The deflection device has a plurality of memory cells. Each memory cell is provided with a storage element and is connected to a switching electrode of a deflector.

Abstract translation: 本发明涉及一种用于使用多个子束曝光靶的带电粒子多子束光刻系统。 该系统具有光束发生器，子束遮挡器和小射束投影仪。 束发生器被配置为产生多个带电粒子子束。 子束消除器被配置为对子束进行图案化。 子束投影仪被配置为将图案化的子束投影到目标表面上。 该系统还具有偏转装置。 偏转装置具有多个存储单元。 每个存储单元设置有存储元件，并连接到偏转器的开关电极。

公开(公告)号：US08242470B2

公开(公告)日：2012-08-14

申请号：US11653107

申请日：2007-01-11

Applicant: Marco Jan-Jaco Wieland ,  Johannes Christiaan van 't Spijker ,  Remco Jager ,  Pieter Kruit

Inventor： Marco Jan-Jaco Wieland ,  Johannes Christiaan van 't Spijker ,  Remco Jager ,  Pieter Kruit

IPC: G21K5/10 ,  G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70383 ,  B82Y10/00 ,  B82Y40/00 ,  G03B27/52 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70825 ,  G03F7/70991 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/2482

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract translation: 一种用于将图案转印到目标表面上的无掩模光刻系统。 用于产生多个子束的至少一个光束发生器。 多个调制器调制小波束的幅度，并且控制单元控制调制器。 控制单元生成并将模式数据传送到调制器，以控制每个单独子束的幅度。 控制单元包括用于存储图案数据的至少一个数据存储器，用于从数据存储器读出数据的至少一个读出单元，至少一个数据转换器，用于将从数据存储器读出的数据转换为至少 一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。

公开(公告)号：US08198601B2

公开(公告)日：2012-06-12

申请号：US12692679

申请日：2010-01-25

Applicant: Elmar Platzgummer ,  Heinrich Fragner

Inventor： Elmar Platzgummer ,  Heinrich Fragner

IPC: H01J37/147

CPC classification number: H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J2237/0437

Abstract: The disclosure relates to a method for producing a multi-beam deflector array device with a plurality of openings for use in a particle-beam exposure apparatus, in particular a projection lithography system, said method starting from a CMOS wafer and comprising the steps of generating at least one pair of parallel trenches on the first side of the wafer blank at the edges of an area where the circuitry layer below is non-functional, the trenches reaching into the layer of bulk material; passivating the sidewalls and bottom of the trenches; depositing a conducting filling material into the trenches, thus creating columns of filling material serving as electrodes; attaching metallic contact means to the top of the electrodes; structuring of an opening between the electrodes, said opening stretching across abovementioned area so that the columns are arranged opposite of each other on the sidewalls of the opening.

Abstract translation: 本发明涉及一种用于生产具有多个开口的多光束偏转器阵列器件的方法，所述多光束偏转器阵列器件用于粒子束曝光设备，特别是投影光刻系统，所述方法从CMOS晶片开始，并且包括以下步骤： 至少一对平行的沟槽在晶片坯料的第一侧上，在下面的电路层不起作用的区域的边缘处，沟槽到达散装材料层; 钝化沟槽的侧壁和底部; 将导电填充材料沉积到沟槽中，从而产生用作电极的填充材料柱; 将金属接触装置附接到电极的顶部; 构造电极之间的开口，所述开口延伸穿过上述区域，使得列在开口的侧壁上彼此相对布置。

公开(公告)号：US20110198033A1

公开(公告)日：2011-08-18

申请号：US13027974

申请日：2011-02-15

Applicant: Masashi Tsujiyama

Inventor： Masashi Tsujiyama

IPC: C23F1/02 ,  C23C14/34 ,  B05C11/00

CPC classification number: H01J37/045 ,  H01J37/32495 ,  H01J37/32623 ,  H01J2237/3151

Abstract: A shutter device having two shutter plates, which shield between an IBS and a substrate, is configured such that the two shutter plates are disposed at symmetrical positions across the IBS and can perform an opening/closing operation in synchronization with a rotation of a rotation-link-member which is rotatably disposed surrounding the IBS. With the configuration, the shutter device can reduce an offset of a shield range in the opening/closing operation.

Abstract translation: 具有在IBS和基板之间屏蔽的两个快门板的快门装置被构造成使得两个快门板被布置在跨越IBS的对称位置处，并且可以与旋转轴线旋转同步地执行打开/关闭操作， 连接构件，其围绕IBS可旋转地设置。 利用该构造，快门装置可以减少打开/关闭操作中的屏蔽范围的偏移。