SEMICONDUCTOR DEVICE
    111.
    发明申请

    公开(公告)号:US20190206789A1

    公开(公告)日:2019-07-04

    申请号:US16192521

    申请日:2018-11-15

    Abstract: A semiconductor device has a coil and wirings under the coil. In addition, a distance between the upper face of the wirings and the bottom face of the cod is 7 μm or larger, and the wirings have a plurality of linear wiring parts each wiring width of which is 1 μm or smaller. In addition, the linear wiring parts do not configure a loop wiring, and the coil and the linear wiring parts are overlapped with each other in planar view. Even if such wirings (linear wiring parts) are arranged under the coil, the characteristics (for example, RF characteristics) of the semiconductor device are not deteriorated. In addition, the area of the semiconductor device can be reduced or high integration of elements can be realized by laminating elements (for example, MOM capacitance elements and the like) having the coil and the linear wiring parts.

    SEMICONDUCTOR DEVICE
    113.
    发明申请

    公开(公告)号:US20180294222A1

    公开(公告)日:2018-10-11

    申请号:US16009429

    申请日:2018-06-15

    Abstract: A SOP has a semiconductor chip. The chip includes a pair of a lower layer coil and an upper layer coil laminated through an interlayer insulating film formed therebetween, a first circuit unit electrically coupled to the upper layer coil, and a plurality of electrode pads. Further, it has a wire for electrically coupling the upper layer coil and the first circuit unit, a plurality of inner leads and outer leads arranged around the semiconductor chip, a plurality of wires for electrically coupling the electrode pads of the semiconductor chip and the inner leads, and a resin made sealing member for covering the semiconductor chip. The wire extends along the extending direction of the wires.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20180246276A1

    公开(公告)日:2018-08-30

    申请号:US15961435

    申请日:2018-04-24

    Abstract: A semiconductor device including an optical waveguide and a p-type semiconductor portion is configured as follows. The optical waveguide includes: a first semiconductor layer formed on an insulating layer; an insulating layer formed on the first semiconductor layer; and a second semiconductor layer formed on the insulating layer. The p-type semiconductor portion includes the first semiconductor layer. The film thickness of the p-type semiconductor portion is smaller than that of the optical waveguide. By forming the insulating layer between the first semiconductor layer and the second semiconductor layer, control of the film thicknesses of the optical waveguide and the p-type semiconductor portion is facilitated. Specifically, when the unnecessary second semiconductor layer is removed by etching in a step of forming the p-type semiconductor portion, the insulating layer which is the lower layer functions as an etching stopper, and the film thickness of the p-type semiconductor portion can be easily adjusted.

    IMAGING DEVICE
    117.
    发明申请
    IMAGING DEVICE 审中-公开

    公开(公告)号:US20180007298A1

    公开(公告)日:2018-01-04

    申请号:US15639231

    申请日:2017-06-30

    CPC classification number: H04N5/378 H04N5/341 H04N5/3745 H04N5/3765

    Abstract: To provide an imaging device capable of reducing the amount of data with a simple method. An imaging device includes: a plurality of sensor elements which is arranged in a matrix shape and each of which generates a photoelectric conversion voltage in accordance with an input light level; and a read circuit which is coupled to bit lines provided while being associated with respective columns of the sensor elements, and amplifies and reads the photoelectric conversion voltages generated in the sensor elements by being exposed at predetermined timing. The read circuit outputs differential data of the read photoelectric conversion voltages generated in the respective sensor elements that are adjacent to each other in the same row or column.

    SOLID-STATE IMAGE SENSING DEVICE
    118.
    发明申请

    公开(公告)号:US20170229510A1

    公开(公告)日:2017-08-10

    申请号:US15372775

    申请日:2016-12-08

    Abstract: A solid-state image sensing device capable of suppressing a dark current and transfer failure during a global shutter operation is provided. The solid-state image sensing device according to one embodiment includes: a semiconductor substrate having a main surface and a back surface being on the opposite side of the main surface; a well region arranged in contact with the main surface in the semiconductor substrate; a photoelectric conversion region arranged in contact with the main surface in the well region; a charge holding region arranged in contact with the main surface in the well region; a floating diffusion region arranged in contact with the main surface in the well region; a first transfer gate so formed as to face the well region and the charge holding region; and a second transfer gate so formed as to face the well region.

    SEMICONDUCTOR DEVICE
    120.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20170062332A1

    公开(公告)日:2017-03-02

    申请号:US15186734

    申请日:2016-06-20

    Abstract: A SOP has a semiconductor chip. The chip includes a pair of a lower layer coil and an upper layer coil laminated through an interlayer insulating film formed therebetween, a first circuit unit electrically coupled to the upper layer coil, and a plurality of electrode pads. Further, it has a wire for electrically coupling the upper layer coil and the first circuit unit, a plurality of inner leads and outer leads arranged around the semiconductor chip, a plurality of wires for electrically coupling the electrode pads of the semiconductor chip and the inner leads, and a resin made sealing member for covering the semiconductor chip. The wire extends along the extending direction of the wires.

    Abstract translation: SOP具有半导体芯片。 芯片包括一对下层线圈和层叠在其间形成的层间绝缘膜的上层线圈,电耦合到上层线圈的第一电路单元和多个电极焊盘。 此外,它具有用于电耦合上层线圈和第一电路单元的导线,布置在半导体芯片周围的多个内部引线和外部引线,用于电连接半导体芯片的电极焊盘和内部 引线和用于覆盖半导体芯片的树脂制密封构件。 电线沿电线的延伸方向延伸。

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