公开(公告)号：US20130075624A1

公开(公告)日：2013-03-28

申请号：US13241392

申请日：2011-09-23

Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J3/26

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24405 ,  H01J2237/24528 ,  H01J2237/24542

Abstract: A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in a longitudinal direction and to facilitate rotation of the beam monitoring device about an axis.

Abstract translation: 公开了一种光束监测装置，方法和系统。 示例性束监测装置包括一维（1D）轮廓仪。 1D轮廓仪包括具有绝缘材料和导电材料的法拉第。 光束监测装置还包括二维（2D）轮廓仪。 2D轮廓仪包括具有绝缘材料和导电材料的多个法拉第。 光束监视装置还包括控制臂。 控制臂可操作以便于在纵向方向上使光束监视装置的移动，并且便于光束监视装置围绕轴的旋转。

公开(公告)号：US08212224B2

公开(公告)日：2012-07-03

申请号：US12389838

申请日：2009-02-20

Applicant: Akiko Fujisawa ,  Hiroyuki Kobayashi ,  Eiko Nakazawa

Inventor： Akiko Fujisawa ,  Hiroyuki Kobayashi ,  Eiko Nakazawa

IPC: G21K5/10 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/26 ,  H01J2237/024 ,  H01J2237/065 ,  H01J2237/1501 ,  H01J2237/2802

Abstract: The present invention provides a charged particle beam device which can effectively restrain misalignment of an optical axis even if a position of an anode is changed. The present invention is a charged particle beam device comprising a cathode provided with a charged particle source which emits a charged particle, an anode which applies an electric field to the emitted charged particle, a charged particle beam deflector which deflects an orbit of a charged particle beam having passed the anode, and a charged particle beam detector which detects the charged particle beam from a sample to which the charged particle is irradiated, wherein a distance changing mechanism which changes a distance between the cathode and the anode, corresponding to a charged particle amount emitted from the charged particle source and a deflection amount control mechanism which detects a condition of the deflector under which the charged particle dose detected from the sample scanned by deflecting the charged particle beam in the changed distance becomes a desired size and controls deflection of the deflector at sample measurement on the basis of the condition are provided.

Abstract translation: 本发明提供一种带电粒子束装置，即使改变阳极的位置，也能够有效地抑制光轴的未对准。 本发明是一种带电粒子束装置，它包括一个阴极，该阴极设有带电粒子源，该粒子源发射一个带电粒子，一个向发射的带电粒子施加电场的阳极，一个带电粒子束偏转器，它使带电粒子的轨道偏转 通过阳极的光束和从被照射带电粒子的样品检测带电粒子束的带电粒子束检测器，其中改变对应于带电粒子的阴极和阳极之间的距离的距离改变机构 从所述带电粒子源发射的量;以及偏转量控制机构，其检测所述偏转器的状态，在所述偏转量条件下，通过使所述带电粒子束在变化的距离偏转而被扫描的样本中检测到的带电粒子剂量成为期望的尺寸， 提供了基于条件的样品测量的偏转器。

公开(公告)号：US08092641B1

公开(公告)日：2012-01-10

申请号：US11199898

申请日：2005-08-08

Applicant: Hong Xiao

Inventor： Hong Xiao

IPC: B08B7/00

CPC classification number: H01J37/28 ,  H01J37/02 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/024

Abstract: A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A pump is coupled to the column and is for removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.

Abstract translation: 用于从带电粒子束系统中去除有机残余物的系统和方法包括与柱相连并用于向柱中加入氧的导管。 加热器连接到塔上，用于增加塔中的温度。 泵连接到塔上，用于从室中除去气体，其中气体是有机残余物和氧的化学反应的副产物。

公开(公告)号：US20110012034A1

公开(公告)日：2011-01-20

申请号：US12893687

申请日：2010-09-29

Applicant: Katsunari Nishikawa

Inventor： Katsunari Nishikawa

IPC: H01J37/08 ,  H01J37/317 ,  H01L21/02

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3045 ,  H01J2237/024 ,  H01J2237/0458 ,  H01J2237/057 ,  H01J2237/24528 ,  H01J2237/24564 ,  H01J2237/24578

Abstract: The ion implantation apparatus includes a source head, an extraction electrode having a slit trough which a part of an ion beam outputted from the source head passes, a magnet for curving a trajectory of the ion beam passed through the slit, a target to be irradiated with the ion beam outputted from the magnet, an electric current measuring device facing an ion exit port of the source head through the slit of the extraction electrode, and a control portion for controlling a position of the extraction electrode based on a measured result of the current measuring device in a state that production of a magnetic field from the magnet is stopped.

Abstract translation: 离子注入装置包括源极头，具有从源极头输出的离子束的一部分通过的狭缝槽的引出电极，用于弯曲通过狭缝的离子束的轨迹的磁体，被照射的靶 离子束从磁体输出，电流测量装置通过引出电极的狭缝面对源极头的离子出口，以及控制部分，用于根据测量结果控制引出电极的位置 处于从磁体产生磁场的状态的电流测量装置停止。

公开(公告)号：US20100181470A1

公开(公告)日：2010-07-22

申请号：US12357688

申请日：2009-01-22

Applicant: Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

Inventor： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC: G01D18/00 ,  A61N5/00 ,  H01J5/18

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

Abstract: An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

Abstract translation: 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US20090314951A1

公开(公告)日：2009-12-24

申请号：US12143247

申请日：2008-06-20

Applicant: Costel Biloiu ,  Craig R. Chaney ,  Eric R. Cobb ,  Bon-Woong Koo ,  Wilhelm P. Platow

Inventor： Costel Biloiu ,  Craig R. Chaney ,  Eric R. Cobb ,  Bon-Woong Koo ,  Wilhelm P. Platow

IPC: H01J27/02 ,  B08B6/00

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024 ,  H01J2237/0458 ,  H01J2237/061

Abstract: In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.

Abstract translation: 在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。 当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。 等离子体增强化学反应。 在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。

公开(公告)号：US20090242757A1

公开(公告)日：2009-10-01

申请号：US12310149

申请日：2007-08-03

Applicant: Takashi Ogawa ,  Yo Yamamoto ,  Hiroshi Matsumura

Inventor： Takashi Ogawa ,  Yo Yamamoto ,  Hiroshi Matsumura

IPC: G01N23/00 ,  H01J3/14

CPC classification number: H01J37/09 ,  H01J37/15 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/0458

Abstract: There are provided a charged particle beam apparatus and a method of adjusting an axis of an aperture capable of adjusting a position of a center axis of the aperture easily and accurately in a short period of time.A charged particle beam apparatus 1 includes a charged particle source 9, an aperture 18, an object lens 12, observing means 32, an aperture driving portion 19, and a control portion 30. The control portion 30 includes spot pattern forming means 33 for forming a plurality of spot patterns on a surface N1 of a sample N by irradiating a charged particle beam I, analyzing means for calculating a position of a spot center of the spot pattern and a geometrical center position of a halo, and adjusting position determining means 35 for calculating an adjusting position based on a position of intersecting lines of connecting the positions of the spot centers of the respective spot patterns and the center position of the halo, in which a position of the aperture 18 is adjusted by moving the center axis of the aperture 18 to the adjusting position.

Abstract translation: 提供了一种带电粒子束装置和一种在短时间内容易且准确地调整能够调节孔径的中心轴的位置的孔的轴线的方法。 带电粒子束装置1包括带电粒子源9，孔18，物镜12，观察装置32，孔径驱动部分19和控制部分30.控制部分30包括用于形成的斑点图案形成装置33 通过照射带电粒子束I的样品N的表面N1上的多个斑点图案，用于计算斑点图案的斑点中心的位置和光晕的几何中心位置的分析装置，以及调节位置确定装置35 用于基于连接各个斑点图案的光点中心的位置和光晕的中心位置的相交线的位置来计算调节位置，其中通过移动光圈的中心轴来调节光圈18的位置 孔18到调节位置。

公开(公告)号：US20090121122A1

公开(公告)日：2009-05-14

申请号：US11939173

申请日：2007-11-13

Applicant: Peter L. Kellerman ,  Kenneth Purser ,  Svetlana Radovanov ,  Victor M. Benveniste ,  Frank Sinclair ,  John Slocum

Inventor： Peter L. Kellerman ,  Kenneth Purser ,  Svetlana Radovanov ,  Victor M. Benveniste ,  Frank Sinclair ,  John Slocum

IPC: H01J37/08 ,  G01D18/00

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/30472 ,  H01J2237/31703

Abstract: Techniques for measuring and controlling ion beam angle and density uniformity are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for measuring and controlling ion beam angle and density uniformity. The apparatus may include a measuring assembly having an opening, a cup, and at least one collector at the rear of the cup. The apparatus may further include an actuator to move the measuring assembly along an actuation path to scan an ion beam to measure and control ion beam uniformity.

Abstract translation: 公开了用于测量和控制离子束角度和密度均匀性的技术。 在一个特定的示例性实施例中，技术可以被实现为用于测量和控制离子束角度和密度均匀性的装置。 该装置可以包括具有开口，杯子和在杯后部的至少一个收集器的测量组件。 该装置还可以包括致动器，以沿着致动路径移动测量组件以扫描离子束以测量和控制离子束均匀性。

公开(公告)号：US20080203299A1

公开(公告)日：2008-08-28

申请号：US12037459

申请日：2008-02-26

Applicant: Toshiaki Kozuma ,  Yukio Yoshizawa ,  Megumi Aizawa

Inventor： Toshiaki Kozuma ,  Yukio Yoshizawa ,  Megumi Aizawa

IPC: G01N23/225 ,  G21K5/10

CPC classification number: G01N23/225 ,  H01J37/3045 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/221 ,  H01J2237/31745

Abstract: It is an object of this invention to improve contact precision and probe operability. This invention controls sample stage movement and probe movement on an observation image using a single coordinate system, thereby allowing positioning using a sample stage stop error as a probe control movement amount. This invention also figures out the position of the tip of a probe using the observation image and stores the coordinates of the probe at a reference position on the image. This invention facilitates precise probe contact operation to a sample position of the order of microns.

Abstract translation: 本发明的目的是提高接触精度和探针可操作性。 本发明使用单个坐标系控制观察图像上的样品台移动和探针移动，从而允许使用样品台停止误差定位作为探针控制移动量。 本发明还使用观察图像了解探针的尖端的位置，并将探针的坐标存储在图像上的参考位置。 本发明有助于精确的探针接触操作到微米量级的样品位置。

公开(公告)号：US20070125956A1

公开(公告)日：2007-06-07

申请号：US11700468

申请日：2007-01-31

Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

IPC: H01J3/14 ,  G21K1/08

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

Abstract: In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.

Abstract translation: 在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。 所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。 为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。