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175 条记录 (耗时 0.013 秒)

    Apparatus for tilting a beam system
    92.
    发明授权
    Apparatus for tilting a beam system 有权
    用于倾斜梁系统的装置

    公开(公告)号：US06661009B1

    公开(公告)日：2003-12-09

    申请号：US10159790

    申请日：2002-05-31

    申请人： Alexander Groholski ,  Riccardo Drainoni ,  Michael Tanguay

    发明人： Alexander Groholski ,  Riccardo Drainoni ,  Michael Tanguay

    IPC分类号： H01J3700

    CPC分类号： H01J37/28 ,  H01J37/023 ,  H01J37/16 ,  H01J37/3056 ,  H01J2237/0245

    摘要： The present invention provides a column tilt apparatus and method for providing an off-normal angle of incidence of a beam in a scanned beam system onto a substrate passing through the eucentric point that is electro-mechanically adjustable during operation while maintaining vacuum integrity of the column and work chamber, and without introducing significant vibrations.

    摘要翻译： 本发明提供了一种列倾斜装置和方法，用于将扫描光束系统中的光束的偏离正常入射角提供给通过在操作期间电机械可调节的偏心点的基板，同时保持色谱柱的真空完整性 和工作室，没有引起显着的振动。

    Aperture plate control mechanism for electron microscopes
    93.
    发明授权
    Aperture plate control mechanism for electron microscopes 失效
    电子显微镜的光栅控制机制

    公开(公告)号：US3638015A

    公开(公告)日：1972-01-25

    申请号：US3638015D

    申请日：1970-03-31

    申请人： ASS ELECT IND

    发明人： BROWNING GEORGE WILLIAM ,  WILLIAMS JOHN LEWIS

    IPC分类号： H01J37/02 ,  H01J37/20 ,  H01J37/26

    CPC分类号： H01J37/023 ,  H01J37/20

    摘要： An electron microscope comprising a microscope chamber having an aperture plate control mechanism mounted thereon and including an aperture support arm extending into the microscope chamber and mounted for movement along a longitudinal axis of said arm, and an aperture plate having at least one aperture, or passage, extending therethrough and being pivotably mounted on the support arm. First and second drive means are coupled to the support arm and the aperture plate, respectively, for varying the position of the aperture plate with respect to a beam of electrons.

    摘要翻译： 一种电子显微镜，包括具有安装在其上的孔板控制机构的显微镜室，所述显微镜室包括延伸到所述显微镜室中的孔支撑臂，并且安装成用于沿着所述臂的纵向轴线移动;以及孔板，其具有至少一个孔或通道 延伸穿过并且可枢转地安装在支撑臂上。 第一和第二驱动装置分别联接到支撑臂和孔板，以改变孔板相对于电子束的位置。

    MANAGING BEAM POWER EFFECTS BY VARYING BASE EMISSIVITY
    98.
    发明公开
    MANAGING BEAM POWER EFFECTS BY VARYING BASE EMISSIVITY 审中-公开

    公开(公告)号：US20240087839A1

    公开(公告)日：2024-03-14

    申请号：US17943753

    申请日：2022-09-13

    申请人： Applied Materials, Inc.

    发明人： Dawei Sun ,  Eric D. Hermanson ,  Benjamin E. Heneveld

    IPC分类号： H01J37/20 ,  G02F1/163 ,  H01J37/02 ,  H05B1/02

    CPC分类号： H01J37/20 ,  G02F1/163 ,  H01J37/023 ,  H05B1/0233 ,  H01J37/3171 ,  H01J2237/2007

    摘要： A workpiece mounting system comprising a chuck and a base is disclosed. The emissivity of the base is increased to allow more heat transfer from the chuck to the base. In some embodiments, the emissivity of the base may be controllable so that for ion beams with lower power levels, the emissivity remains low, enabling the chuck to reach the desired temperature quickly. For ion beams with higher power levels, the emissivity may increase to allow more heat transfer to the base, allowing the chuck to maintain the desired temperature. High emissivity coatings may be applied to the top surface of the base. In other embodiments, a set of movable shields may be disposed between the chuck and the base. The position of the shields may be a function of the power level of the incoming ion beam.