公开(公告)号：US20200083063A1

公开(公告)日：2020-03-12

申请号：US16371461

申请日：2019-04-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min SHIN ,  Seok-Hoon KIM ,  Young-Hoo KIM ,  In-Gi KIM ,  Tae-Hong KIM ,  Sung-Hyun PARK ,  Jin-Woo LEE ,  Ji-Hoon CHA ,  Yong-Jun CHOI

IPC: H01L21/67 ,  H01L21/02 ,  H01J37/32 ,  G02B27/09 ,  B08B7/00 ,  B23K26/352

Abstract: A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.

公开(公告)号：US20210343552A1

公开(公告)日：2021-11-04

申请号：US17376369

申请日：2021-07-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min SHIN ,  Seok-Hoon KIM ,  Young-Hoo KIM ,  In-Gi KIM ,  Tae-Hong KIM ,  Sung-Hyun PARK ,  Jin-Woo LEE ,  Ji-Hoon CHA ,  Yong-Jun CHOI

IPC: H01L21/67 ,  H01L21/02 ,  H01J37/32 ,  G02B27/09 ,  B23K26/352 ,  B08B7/00

Abstract: A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.

公开(公告)号：US20160154739A1

公开(公告)日：2016-06-02

申请号：US14955070

申请日：2015-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinyong JUNG ,  Seok-Hoon KIM ,  Euicheol LIM ,  Jinseok HA

IPC: G06F12/08 ,  G09G3/00 ,  G06T1/60 ,  G06F3/06

CPC classification number: G06F12/0875 ,  G06F2212/1016 ,  G06F2212/401 ,  G06F2212/455 ,  G06F2212/60 ,  G06T1/60 ,  G09G3/00 ,  G09G5/395 ,  G09G2340/02 ,  G09G2360/121 ,  G09G2370/10

Abstract: A cache managing method of a display driving apparatus may be provided. The display driving apparatus including an encoder to generate compressed data by compressing raw data, a memory to store the compressed data, and a decoder to restore the compressed data and including a payload cache may be provided. The cache managing method including requesting an access to the compressed data, and managing the payload cache using a linked list according to the access request to the compressed data may be provided.

Abstract translation: 可以提供显示驱动装置的高速缓存管理方法。 显示驱动装置包括通过压缩原始数据产生压缩数据的编码器，用于存储压缩数据的存储器和解码器来恢复压缩数据并包括有效载荷高速缓存。 可以提供缓存管理方法，其包括请求对压缩数据的访问，以及根据对压缩数据的访问请求，使用链表管理有效载荷高速缓存。

公开(公告)号：US20170330770A1

公开(公告)日：2017-11-16

申请号：US15442481

申请日：2017-02-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok-Hoon KIM ,  Kyoung-Seob KIM ,  Dong-Chul KIM ,  Hyo-San LEE

IPC: H01L21/67 ,  B08B3/10 ,  B08B3/02 ,  B08B1/04

CPC classification number: H01L21/67051 ,  B08B1/04 ,  B08B3/02 ,  B08B3/024 ,  B08B3/10 ,  H01L21/67 ,  H01L21/67253

Abstract: In a method of cleaning a substrate, a protecting liquid may be sprayed to a surface of the substrate from a first position in a first spray direction. Cleaning droplets may be injected on to the surface of the substrate. The protecting liquid may be sprayed to the surface of the substrate from a second position different from the first position in a second spray direction. For example, the protecting liquid may be always sprayed from the central portion toward the edge portions in the substrate so that the protecting liquid on the substrate may have a uniform thickness.

公开(公告)号：US20170117406A1

公开(公告)日：2017-04-27

申请号：US15398788

申请日：2017-01-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok-Hoon KIM ,  Bon-Young KOO ,  Nam-Kyu KIM ,  Woo-Bin SONG ,  Byeong-Chan LEE ,  Su-Jin JUNG

IPC: H01L29/78 ,  H01L27/088 ,  H01L29/08 ,  H01L29/66

CPC classification number: H01L29/785 ,  H01L21/823431 ,  H01L27/0886 ,  H01L27/1211 ,  H01L29/0847 ,  H01L29/66545 ,  H01L29/66795 ,  H01L29/6681

Abstract: A semiconductor device may include first and second fins formed side by side on a substrate, a first elevated doped region formed on the first fin and having a first doping concentration of impurities, a second elevated doped region formed on the second fin, and a first bridge connecting the first elevated doped region and the second elevated doped region to each other. Methods of manufacturing such a semiconductor device are also disclosed.

公开(公告)号：US20150162332A1

公开(公告)日：2015-06-11

申请号：US14543140

申请日：2014-11-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-Bum KIM ,  Bon-Young KOO ,  Seok-Hoon KIM ,  Chul KIM ,  Kwan-Heum LEE ,  Byeong-Chan LEE ,  Su-Jin JUNG

IPC: H01L27/088 ,  H01L29/78 ,  H01L29/06 ,  H01L29/161

CPC classification number: H01L27/0886 ,  H01L29/0653 ,  H01L29/161 ,  H01L29/66545 ,  H01L29/785

Abstract: An integrated circuit device includes an electrically conductive pattern on a substrate. This electrically conductive pattern may be a gate pattern of a field effect transistor. A first electrically insulating spacer is provided on a sidewall of the electrically conductive pattern. The first electrically insulating spacer includes a first lower spacer and a first upper spacer, which extends on the first lower spacer and has a side surface vertically aligned with a corresponding side surface of the first lower spacer. The first upper spacer has a greater dielectric constant relative to a dielectric constant of the first lower spacer. A pair of parallel channel regions may also be provided, which protrude from a surface of the substrate. The electrically conductive pattern may surround top and side surfaces of the pair of parallel channel regions.

Abstract translation: 集成电路器件包括在衬底上的导电图案。 该导电图案可以是场效应晶体管的栅极图案。 第一电绝缘垫片设置在导电图案的侧壁上。 第一电绝缘间隔件包括第一下间隔件和第一上间隔件，其在第一下间隔件上延伸并且具有与第一下间隔件的对应侧表面垂直对准的侧表面。 第一上间隔物相对于第一下间隔物的介电常数具有更大的介电常数。 还可以设置一对平行的通道区域，其从衬底的表面突出。 导电图案可以围绕该对平行通道区域的顶表面和侧表面。

公开(公告)号：US20190221663A1

公开(公告)日：2019-07-18

申请号：US16367813

申请日：2019-03-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok-Hoon KIM ,  Bon-Young KOO ,  Nam-Kyu KIM ,  Woo-Bin SONG ,  Byeong-Chan LEE ,  Su-Jin JUNG

IPC: H01L29/78 ,  H01L27/12 ,  H01L29/66 ,  H01L21/8234 ,  H01L27/088 ,  H01L29/08

Abstract: A semiconductor device may include first and second fins formed side by side on a substrate, a first elevated doped region formed on the first fin and having a first doping concentration of impurities, a second elevated doped region formed on the second fin, and a first bridge connecting the first elevated doped region and the second elevated doped region to each other. Methods of manufacturing such a semiconductor device are also disclosed.

公开(公告)号：US20170069513A1

公开(公告)日：2017-03-09

申请号：US15168713

申请日：2016-05-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jung-Min OH ,  Mi-Hyun PARK ,  ln-Gi KIM ,  Ji-Hoon JEONG ,  Seok-Hoon KIM ,  Hyo-San LEE

IPC: H01L21/67 ,  B08B3/08 ,  C11D7/34 ,  C11D11/00 ,  C11D7/32 ,  H01L21/02 ,  B08B3/14

CPC classification number: H01L21/67051 ,  C11D7/265 ,  C11D7/28 ,  C11D7/3209 ,  C11D7/34 ,  C11D7/5004 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67017

Abstract: A semiconductor cleaning process system includes a process chamber configured to hold a semiconductor substrate, a cleaning solution supply unit configured to provide a cleaning solution to the process chamber, the cleaning solution including an organic fluoride, an organic acid and an organic solvent, a recycling unit configured to collect the cleaning solution discharged from the process chamber, a first concentration measuring unit configured to evaluate a fluorine concentration of a collected solution in the recycling unit, and a sub-cleaning solution supply unit configured to provide the organic fluoride to the cleaning solution supply unit based on the fluorine concentration evaluated by the first concentration measuring unit.

Abstract translation: 半导体清洗处理系统包括：配置成保持半导体衬底的处理室，构造成向处理室提供清洁溶液的清洗溶液供应单元，包括有机氟化物，有机酸和有机溶剂的清洗溶液，循环利用 被配置为收集从处理室排出的清洗溶液的单元，被配置为评估回收单元中的收集溶液的氟浓度的第一浓度测量单元和被配置为将有机氟化物提供给清洁的辅助清洁溶液供应单元 溶液供应单元，其基于由第一浓度测量单元评估的氟浓度。

公开(公告)号：US20140299934A1

公开(公告)日：2014-10-09

申请号：US14194837

申请日：2014-03-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok-Hoon KIM ,  Tae-Ouk KWON ,  Su-Jin JUNG ,  Young-Pil KIM ,  Byeong-Chan LEE ,  Bon-Young KOO

IPC: H01L29/78

CPC classification number: H01L29/7848 ,  H01L29/66545 ,  H01L29/785

Abstract: Provided is a semiconductor device. The semiconductor device includes a fin on a substrate; a gate electrode cross the fin on the substrate; a source/drain formed on at least one of both sides of the gate electrode, and including a first film and a second film; and a stress film arranged between an isolation film on the substrate and the source/drain, and formed on a side surface of the fin.

Abstract translation: 提供一种半导体器件。 半导体器件在衬底上包括翅片; 栅电极跨越衬底上的翅片; 源极/漏极，形成在栅电极的两侧中的至少一个上，并且包括第一膜和第二膜; 以及布置在基板上的隔离膜和源极/漏极之间并且形成在鳍的侧表面上的应力膜。