- 专利标题: DRY CLEANING APPARATUS AND DRY CLEANING METHOD
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申请号: US16371461申请日: 2019-04-01
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公开(公告)号: US20200083063A1公开(公告)日: 2020-03-12
- 发明人: Seung-Min SHIN , Seok-Hoon KIM , Young-Hoo KIM , In-Gi KIM , Tae-Hong KIM , Sung-Hyun PARK , Jin-Woo LEE , Ji-Hoon CHA , Yong-Jun CHOI
- 申请人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2018-0107944 20180910
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; H01L21/02 ; H01J37/32 ; G02B27/09 ; B08B7/00 ; B23K26/352
摘要:
A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.
公开/授权文献
- US11087996B2 Dry cleaning apparatus and dry cleaning method 公开/授权日:2021-08-10
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