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公开(公告)号：US20240186117A1
公开(公告)日：2024-06-06
申请号：US18409805
申请日：2024-01-11
Applicant: Industrial Technology Research Institute
Inventor： Hsuan-Fu Wang , Fu-Ching Tung , Ching-Chiun Wang
IPC: H01J37/32 , C23C16/455
CPC classification number: H01J37/3244 , C23C16/45536 , C23C16/45548 , C23C16/45565 , H01J37/32899 , H01J37/32082 , H01J2237/332
Abstract: An atomic layer deposition apparatus including a chamber, a platform, a shower head, a bias power supply, a first injection device, and a second injection device is provided. The platform and the shower head are disposed in the chamber, and the platform is configured to carry a substrate having a high aspect ratio structure. The bias power supply is coupled to the platform. The first injection device and the second injection device are connected to the chamber; the first injection device injects a first precursor or a first inert gas into the chamber along a first direction through the shower head, and the second injection device injects a second precursor or a second inert gas into the chamber along a second direction perpendicular to the first direction. When the first precursor or the second precursor is injected into the chamber, the bias power supply is turned on. When the first inert gas or the second inert gas is injected into the chamber, the bias power supply is turned off.
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公开(公告)号：US11850606B2
公开(公告)日：2023-12-26
申请号：US17106222
申请日：2020-11-30
Applicant: Industrial Technology Research Institute
Inventor： Fu-Ching Tung , Hsuan-Fu Wang , Jwu-Sheng Hu , Yung-Jen Cheng , Hung-Cheng Yen , Meng-Chun Chen
CPC classification number: B04C9/00 , B01D47/10 , B04C5/26 , B04C2009/008
Abstract: A particles capturing system includes a venturi filter device, a cyclone filter device, a plurality of first nozzles and air to flow through the system. The venturi filter device has an air intake portion, a neck portion and an air outlet portion. The cyclone filter device, disposed in the air outlet portion, has an entrance and an exit. The plurality of first nozzles, disposed inside the venturi filter device, have a height greater than that of the the neck portion. When the air flows, the air enters the venturi filter device via an air inlet of the air intake portion, then orderly passes through the neck portion and the plurality of first nozzles, then enters the cyclone filter device via the entrance, and finally leaves the cyclone filter device via the exit, such that particles in the flowing air can be captured.
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3.发明申请公开(公告)号：US20150147890A1
公开(公告)日：2015-05-28
申请号：US14138147
申请日：2013-12-23
Applicant: Industrial Technology Research Institute
Inventor： Kung-Liang Lin , Chien-Chih Chen , Fu-Ching Tung , Chih-Yung Chen , Shih-Chin Lin , Kuan-Yu Lin , Chia-Hao Chang , Shieh-Sien Wu
IPC: H01L51/52 , C23C16/505 , C23C16/458 , C23C16/455 , H01L21/02
CPC classification number: C23C16/4583 , C23C16/455 , C23C16/45536 , C23C16/45544 , C23C16/45548 , C23C16/50 , C23C16/505 , H01J37/32091 , H01J37/3244 , H01L21/02274 , H01L21/0228 , H01L51/5253
Abstract: A multi-mode thin film deposition apparatus including a reaction chamber, a carrying seat, a showerhead, an inert gas supplying source, a first gas inflow system and a second gas inflow system is provided. The carrying seat is disposed in the reaction chamber. The showerhead has a gas mixing room and gas holes disposed at a side of the gas mixing room. The gas mixing room is connected to the reaction chamber through the plurality of gas holes which faces the carrying seat. The first gas inflow system is connected to the reaction chamber and supplies a first process gas during a first thin film deposition process mode. The inert gas supplying source is connected to the gas mixing room for supplying an inert gas. The second gas inflow system is connected to the gas mixing room to supply a second process gas during a second thin film deposition process mode.
Abstract translation: 提供一种多模式薄膜沉积设备，包括反应室，承载座，喷头，惰性气体供应源，第一气体流入系统和第二气体流入系统。 承载座设置在反应室中。 喷头具有设在气体混合室一侧的气体混合室和气孔。 气体混合室通过面向承载座的多个气孔连接到反应室。 第一气体流入系统连接到反应室，并在第一薄膜沉积工艺模式期间提供第一工艺气体。 惰性气体供给源连接到用于供给惰性气体的气体混合室。 第二气体流入系统连接到气体混合室，以在第二薄膜沉积工艺模式期间提供第二工艺气体。
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公开(公告)号：US10591216B2
公开(公告)日：2020-03-17
申请号：US15831181
申请日：2017-12-04
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Fu-Ching Tung , Muh-Wang Liang , Jung-Chen Chien , Yi-Jiun Lin
Abstract: A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.
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公开(公告)号：US20190101333A1
公开(公告)日：2019-04-04
申请号：US15831181
申请日：2017-12-04
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Fu-Ching Tung , Muh-Wang Liang , Jung-Chen Chien , Yi-Jiun Lin
CPC classification number: F27D9/00 , F26B17/00 , F27B9/14 , F27B9/3005 , F27B21/06 , F27D11/12 , F27D2009/0081 , F27D2019/0006
Abstract: A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20140059836A1
公开(公告)日：2014-03-06
申请号：US13711631
申请日：2012-12-12
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Pei-Shan Wu , Kuan-Chou Chen , Sheng-Lang Lee , Fu-Ching Tung , Chia-Ming Chen
IPC: H01L21/68
CPC classification number: H01L21/68 , C23C14/505 , H01L21/68764 , H01L21/68771 , Y10T29/49998
Abstract: A rotatable locating apparatus including a fixing base, a rotatable rack, a first driving module, a carrier, and a second driving module is provided. The rotatable rack is pivoted on the fixing base through a first rotation axis. The first driving module is coupled to the rotatable rack to drive the rotatable rack rotating with respect to the fixing base along the first rotation axis. The carrier is provided with accommodating slots on an arc surface of the carrier, and the carrier is pivoted on the rotatable rack through a second rotation axis. The second rotation axis passes through a curvature center of the arc surface and is perpendicular to the first rotation axis. The curvature center is located on the first rotation axis. The second driving module is coupled to the carrier to drive the carrier rotating with respect to the rotatable rack along the second rotation axis.
Abstract translation: 提供一种包括固定基座，可旋转齿条，第一驱动模块，载体和第二驱动模块的可旋转定位装置。 旋转齿条通过第一旋转轴线在固定基座上枢转。 第一驱动模块耦合到可旋转的齿条，以驱动相对于固定基座沿着第一旋转轴线旋转的可旋转齿条。 载体在载体的弧形表面上设置有容纳槽，并且载体通过第二旋转轴线枢转在可旋转的齿条上。 第二旋转轴线穿过弧形表面的曲率中心并且垂直于第一旋转轴线。 曲率中心位于第一旋转轴上。 第二驱动模块联接到载体以驱动相对于可旋转齿条沿着第二旋转轴线旋转的载体。
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公开(公告)号：US11961716B2
公开(公告)日：2024-04-16
申请号：US17546053
申请日：2021-12-09
Applicant: Industrial Technology Research Institute
Inventor： Hsuan-Fu Wang , Fu-Ching Tung , Ching-Chiun Wang
IPC: C23C16/455 , H01J37/32
CPC classification number: H01J37/3244 , C23C16/45536 , C23C16/45548 , C23C16/45565 , H01J37/32899 , H01J37/32082 , H01J2237/332
Abstract: A deposition method including following steps is provided. A first precursor is injected into a chamber along a first direction, and a bias power supply is turned on to attract the first precursor to a substrate. A second precursor is injected into the chamber along a second direction perpendicular to the first direction, and the bias power supply is turned on to attract the second precursor to the substrate. A first inert gas is injected into the chamber along the first direction, and the bias power supply is turned off to purge an unnecessary part of the first precursor or an unnecessary part of the second precursor or a by-product. A second inert gas is injected the chamber along the second direction, and the bias power supply is turned off to purge the unnecessary part of the first precursor or the unnecessary part of the second precursor or the by-products.
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公开(公告)号：US20230187177A1
公开(公告)日：2023-06-15
申请号：US17546053
申请日：2021-12-09
Applicant: Industrial Technology Research Institute
Inventor： Hsuan-Fu Wang , Fu-Ching Tung , Ching-Chiun Wang
IPC: H01J37/32 , C23C16/455
CPC classification number: H01J37/3244 , H01J37/32899 , C23C16/45565 , C23C16/45548 , C23C16/45536 , H01J37/32082 , H01J2237/332
Abstract: A deposition apparatus including a chamber, a platform, a shower head, a bias power supply, a first injection device, and a second injection device is provided. The platform and the shower head are disposed in the chamber, and the platform is configured to carry a substrate having a high aspect ratio structure. The bias power supply is coupled to the platform. The first injection device and the second injection device are connected to the chamber; the first injection device injects a first precursor or a first inert gas into the chamber along a first direction through the shower head, and the second injection device injects a second precursor or a second inert gas into the chamber along a second direction perpendicular to the first direction. When the first precursor or the second precursor is injected into the chamber, the bias power supply is turned on. When the first inert gas or the second inert gas is injected into the chamber, the bias power supply is turned off. A deposition method is also provided.
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9.发明申请公开(公告)号：US20140068923A1
公开(公告)日：2014-03-13
申请号：US14083451
申请日：2013-11-19
Applicant: Industrial Technology Research Institute
Inventor： Kuan-Chou Chen , Pei-Shan Wu , Sheng-Lang Lee , Chia-Ming Chen , Fu-Ching Tung , Jyh-Jone Lee , Wan-Sung Lin , Kuan-Han Chen
IPC: H01L21/68
CPC classification number: H01L21/68 , H01L21/68728 , H01L21/68764 , H01L21/68771 , Y10T29/49998
Abstract: A rotary positioning apparatus includes a fixing base, a rotation mechanism, two driving modules and a carrier. The rotation mechanism is disposed on the fixing base, the first driving module is disposed on the fixing base and coupled to the rotation mechanism to drive the rotation mechanism rotating around a first rotation axis relatively to the fixing base. The carrier has plural accommodating slots on a circular-arc surface thereof and is pivoted to the rotation mechanism through a second rotation axis passing through the curvature center of the circular-arc surface and perpendicular to the first rotation axis, on which the curvature center is located. The second driving module is disposed on the rotation mechanism and coupled to the carrier to drive the carrier rotating around the second rotation axis relatively to the rotation mechanism. An automatic pick-and-place system and an operation method using the rotary positioning apparatus are also provided.
Abstract translation: 旋转定位装置包括固定基座，旋转机构，两个驱动模块和载体。 旋转机构设置在固定基座上，第一驱动模块设置在固定基座上并且联接到旋转机构，以驱动围绕相对于固定基座的第一旋转轴线旋转的旋转机构。 载体在其圆弧表面上具有多个容纳槽，并且通过穿过圆弧表面的弯曲中心并垂直于第一旋转轴线的第二旋转轴线枢转到旋转机构，曲率中心为 位于。 第二驱动模块设置在旋转机构上并且联接到载体上以相对于旋转机构驱动围绕第二旋转轴线旋转的载体。 还提供了一种使用旋转定位装置的自动拾放系统和操作方法。
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公开(公告)号：US09957607B2
公开(公告)日：2018-05-01
申请号：US15432426
申请日：2017-02-14
Applicant: Industrial Technology Research Institute
Inventor： Fu-Ching Tung , Ching-Chiun Wang , Shih-Hsiang Lai
CPC classification number: C23C14/542 , C23C14/24 , C23C14/28
Abstract: An evaporation method in this disclosure is adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, an evaporation source plate is arranged to be heated by a heater so as to evaporate an evaporation material to its gaseous state, and then enable the gaseous evaporation material to travel passing through holes of a shutter device and thus spread toward the surface of the evaporation target substrate for depositing a film. Moreover, the evaporation method uses a transmission device for controlling the opening/closing of the holes, and there is a heating area formed at a position between the shutter device and the evaporation source plate for allowing the evaporation source plate, the plural holes, the heating area, the evaporation material and the heater to be arranged parallel to one another from the top to bottom.
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