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公开(公告)号：US10591216B2
公开(公告)日：2020-03-17
申请号：US15831181
申请日：2017-12-04
发明人： Fu-Ching Tung , Muh-Wang Liang , Jung-Chen Chien , Yi-Jiun Lin
摘要： A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.
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公开(公告)号：US20190101333A1
公开(公告)日：2019-04-04
申请号：US15831181
申请日：2017-12-04
发明人： Fu-Ching Tung , Muh-Wang Liang , Jung-Chen Chien , Yi-Jiun Lin
CPC分类号： F27D9/00 , F26B17/00 , F27B9/14 , F27B9/3005 , F27B21/06 , F27D11/12 , F27D2009/0081 , F27D2019/0006
摘要： A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.
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公开(公告)号：US20220119943A1
公开(公告)日：2022-04-21
申请号：US17117111
申请日：2020-12-10
IPC分类号： C23C16/455 , C23C16/46
摘要： A deposition apparatus including a chamber having a deposition area and a non-deposition area, a gas intake device communicated with the chamber, a gas annulus disposed in the chamber and surrounding the gas intake device, a carrier disposed in the deposition area and a retaining annulus disposed in chamber and surrounding the carrier. The gas intake device is disposed corresponding to the deposition area and configured to draw a process gas into the deposition area. The gas annulus is configured to generate an annular gas curtain in the deposition area. The carrier carries a deposited object, wherein the gas annulus is located between the gas intake device and the carrier. The deposited object is surrounded by the annular gas curtain. The retaining annulus has a plurality of through holes. The retaining annulus is located between the gas annulus and the carrier.
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4.发明授权Plasma generator, surface treatment method using the same and surface treatment method using the same for bio-tissue 有权等离子发生器，表面处理方法使用相同的表面处理方法使用相同的生物组织公开(公告)号：US09204950B2
公开(公告)日：2015-12-08
申请号：US14142598
申请日：2013-12-27
发明人： Chih-Hung Liu , Muh-Wang Liang , Shen-Bin Wu , Tean-Mu Shen
CPC分类号： A61C19/00 , A61B18/042 , A61B2018/00583 , A61C5/00
摘要： A plasma generator, a surface treatment method using the same, and a surface treatment method using the same for bio-tissue are provided. The plasma generator comprises a plasma tube, a reaction source tube, a first electrode and a second electrode. The plasma tube has a plasma outlet. The reaction source tube is disposed within the plasma tube, and has a reaction outlet. The first electrode and the second electrode are disposed on the plasma tube, wherein the second electrode is closer to the plasma outlet than the first electrode is. The plasma outlet of the reaction source is not projected beyond a lower portion of the first electrode.
摘要翻译： 提供了一种等离子体发生器，使用该等离子体发生器的表面处理方法和使用该等离子体生物组织的表面处理方法。 等离子体发生器包括等离子体管，反应源管，第一电极和第二电极。 等离子体管具有等离子体出口。 反应源管设置在等离子体管内，并具有反应出口。 第一电极和第二电极设置在等离子体管上，其中第二电极比第一电极更靠近等离子体出口。 反应源的等离子体出口不会突出超过第一电极的下部。
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公开(公告)号：US20140144377A1
公开(公告)日：2014-05-29
申请号：US13872721
申请日：2013-04-29
发明人： Chen-Chung Du , Muh-Wang Liang , Yuan-Yuan Chiang
IPC分类号： C23C16/458 , F16B2/12
CPC分类号： F16B2/12 , C23C14/042 , C23C16/042 , H01J37/32715 , Y10T24/44624
摘要： A substrate and mask attachment clamp device comprising a push assembly, an upper clamp mechanism and a lower clamp mechanism is disclosed. The upper clamp mechanism comprises a first inclined surface, a swing element, a second inclined surface and a sliding surface. The lower clamp mechanism comprises a lower clamp retainer and a clamp movably. During the push assembly moving along a first direction, the push assembly moves with respect to the first inclined surface to drive the upper clamp mechanism to move along a second direction. The push assembly further drives the second inclined surface to move with respect to the swing element, so that the swing element drives the clamp to move along a third direction opposite to the first direction, and drives the sliding surface to move with respect to the lower clamp mechanism to drive the clamp to move along a fourth direction.
摘要翻译： 公开了一种包括推动组件，上部夹紧机构和下部夹紧机构的基板和面罩附接夹紧装置。 上夹紧机构包括第一倾斜表面，摆动元件，第二倾斜表面和滑动表面。 下夹持机构包括可动的下夹具保持器和夹具。 在推动组件沿着第一方向移动时，推动组件相对于第一倾斜表面移动以驱动上部夹紧机构沿第二方向移动。 推动组件进一步驱动第二倾斜表面相对于摆动元件移动，使得摆动元件驱动夹具沿着与第一方向相反的第三方向移动，并且驱动滑动表面相对于下部的移动 夹紧机构以驱动夹具沿着第四方向移动。
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公开(公告)号：US11680316B2
公开(公告)日：2023-06-20
申请号：US17117111
申请日：2020-12-10
IPC分类号： C23C16/44 , C23C16/455 , C23C16/46
CPC分类号： C23C16/4401 , C23C16/4558 , C23C16/45504 , C23C16/45517 , C23C16/45519 , C23C16/45591 , C23C16/46
摘要： A deposition apparatus including a chamber having a deposition area and a non-deposition area, a gas intake device communicated with the chamber, a gas annulus disposed in the chamber and surrounding the gas intake device, a carrier disposed in the deposition area and a retaining annulus disposed in chamber and surrounding the carrier. The gas intake device is disposed corresponding to the deposition area and configured to draw a process gas into the deposition area. The gas annulus is configured to generate an annular gas curtain in the deposition area. The carrier carries a deposited object, wherein the gas annulus is located between the gas intake device and the carrier. The deposited object is surrounded by the annular gas curtain. The retaining annulus has a plurality of through holes. The retaining annulus is located between the gas annulus and the carrier.
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