Abstract:
Disclosed is a manufacturing method of a high electron mobility transistor. The method includes: forming a source electrode and a drain electrode on a substrate; forming a first insulating film having a first opening on an entire surface of the substrate, the first opening exposing a part of the substrate; forming a second insulating film having a second opening within the first opening, the second opening exposing a part of the substrate; forming a third insulating film having a third opening within the second opening, the third opening exposing a part of the substrate; etching a part of the first insulating film, the second insulating film and the third insulating film so as to expose the source electrode and the drain electrode; and forming a T-gate electrode on a support structure including the first insulating film, the second insulating film and the third insulating film.
Abstract:
A manufacturing method for a variable capacitor includes forming a first element of which a capacitance value depends on a voltage applied to both of two terminals of a first area on a substrate, forming a second element having a capacitance value fixed to a second area on the substrate adjacent to the first area, and forming metallic wires for connecting the first element and the second element and connecting the first element and the second element with the outside. The first element maybe a bipolar transistor that may include a diode. The second element maybe a capacitor that includes a dielectric.
Abstract:
Provided is a cascode circuit including first and second transistors connected between a drain terminal and a source terminal in cascode form, a level sifter configured to change a voltage level of a switching control signal applied to a gate terminal and provide the changed switching control signal to a gate of the first transistor, a buffer configured to delay the switching control signal and provide the delayed switching control signal to a gate of the second transistor, and a first resistor connected between the level shifter and the gate of the first transistor.