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    MECHANICAL AND CHEMICAL TEXTURIZATION OF A SILICON SHEET FOR PHOTOVOLTAIC LIGHT TRAPPING
    1.
    发明申请
    MECHANICAL AND CHEMICAL TEXTURIZATION OF A SILICON SHEET FOR PHOTOVOLTAIC LIGHT TRAPPING 审中-公开
    用于光伏照明的硅片的机械和化学文化

    公开(公告)号：US20130344641A1

    公开(公告)日：2013-12-26

    申请号：US13841109

    申请日：2013-03-15

    Applicant: CORNING INCORPORATED

    Inventor： Glen Bennett Cook ,  Kamal Kishore Soni ,  Christopher Scott Thomas ,  Lili Tian

    IPC: H01L31/18

    CPC classification number: H01L31/1824 ,  H01L31/02363 ,  H01L31/182 ,  Y02E10/546 ,  Y02P70/521

    Abstract: A process for modifying a surface of a cast polycrystalline silicon sheet to decrease the light reflectance of the cast polycrystalline sheet is disclosed. The cast polycrystalline silicon sheet has at least one structural feature resulting from the cast polycrystalline silicon sheet being directly cast to a thickness less than 1000 micrometers. The process comprises grit blasting the surface of the cast polycrystalline silicon sheet to give an abraded surface on the cast polycrystalline silicon sheet. The process further comprises chemically etching the abraded surface of the cast polycrystalline silicon sheet to give a chemically-etched, abraded surface. The light reflectance of the chemically-etched, abraded surface is decreased in comparison to the light reflectance of the surface of the cast polycrystalline silicon sheet before the step of grit blasting.

    Abstract translation: 公开了一种用于改变流延多晶硅片的表面以降低铸塑多晶片的光反射率的方法。 铸造的多晶硅片具有至少一个由铸造的多晶硅片直接铸造成小于1000微米厚度的结构特征。 该方法包括喷砂铸造多晶硅片的表面以在铸造多晶硅片上产生磨损表面。 该方法还包括化学蚀刻流延多晶硅片的磨损表面以产生化学蚀刻的磨损表面。 与喷砂步骤之前的铸造多晶硅片的表面的光反射率相比，化学蚀刻的磨损表面的光反射率降低。

    ARTICLES WITH MONOLITHIC, STRUCTURED SURFACES AND METHODS FOR MAKING AND USING SAME
    3.
    发明申请
    ARTICLES WITH MONOLITHIC, STRUCTURED SURFACES AND METHODS FOR MAKING AND USING SAME 审中-公开
    具有单晶，结构化表面的制品及其制造和使用方法

    公开(公告)号：US20150174625A1

    公开(公告)日：2015-06-25

    申请号：US14625010

    申请日：2015-02-18

    Applicant: CORNING INCORPORATED ,  ICFO (THE INSTITUE OF PHOTONIC SCIENCES) ,  ICREA (INSTITUTE CATALANA DE RECERCA I ESTUDIS AVANCATS)

    Inventor： Shandon Dee Hart ,  Karl William Koch, III ,  Domenico Tulli ,  Prantik Mazumder ,  Valerio Pruneri ,  Paul Arthur Sachenik ,  Lili Tian ,  Johann Osmond ,  Albert Carrilero

    IPC: B08B17/06 ,  G06F3/041

    CPC classification number: B08B17/065 ,  C03C15/00 ,  C03C17/30 ,  C03C2204/08 ,  G06F3/041 ,  G06F2203/04103 ,  Y10S977/773 ,  Y10S977/89 ,  Y10T428/24355

    Abstract: A textured article that includes a transparent substrate having at least one primary surface and a glass, glass-ceramic or ceramic composition; a micro-textured surface on the primary surface of the substrate, the micro-textured surface comprising a plurality of hillocks; and a nano-structured surface on the micro-textured surface, the nano-structured surface comprising a plurality of nano-sized protrusions or a multilayer coating comprising a plurality of layers having a nano-scale thickness. Further, the hillocks have an average height of about 10 to about 1000 nm and an average longest lateral cross-sectional dimension of about 1 to about 100 μm, and the nano-sized protrusions have an average height of about 10 to about 500 nm and an average longest lateral cross-sectional dimension of about 10 to about 500 nm. The substrate may be chemically strengthened with a compressive stress greater than about 500 MPa and a compressive depth-of-layer greater than about 15 μm.

    Abstract translation: 一种纹理制品，其包括具有至少一个主表面的透明基材和玻璃，玻璃陶瓷或陶瓷组合物; 在所述基底的主表面上的微纹理表面，所述微纹理表面包括多个小丘; 以及纳米结构化表面，所述纳米结构化表面包括多个纳米尺寸的突起或包含具有纳米级厚度的多个层的多层涂层。 此外，小丘的平均高度为约10至约1000nm，平均最大横向横截面尺寸为约1至约100μm，并且纳米尺寸的突起具有约10至约500nm的平均高度，以及 约10至约500nm的平均最长横向横截面尺寸。 衬底可以用大于约500MPa的压缩应力和大于约15μm的压缩深度层进行化学强化。

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