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公开(公告)号：US11315752B2
公开(公告)日：2022-04-26
申请号：US17118456
申请日：2020-12-10
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Sven Antoin Johan Hol , Maarten Frans Janus Kremers , Henricus Martinus Johannes Van De Groes , Niels Johannes Maria Bosch , Marcel Koenraad Marie Baggen
IPC: H01J37/20 , H01J37/09 , H01J37/317
Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
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公开(公告)号：US11621142B2
公开(公告)日：2023-04-04
申请号：US16992058
申请日：2020-08-12
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Peter Paul Hempenius , Maarten Frans Janus Kremers , Robertus Jacobus Theodorus Van Kempen , Sven Antoin Johan Hol , Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Niels Johannes Maria Bosch , Maarten Hartger Kimman
Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
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公开(公告)号：US20140340666A1
公开(公告)日：2014-11-20
申请号：US14357530
申请日：2012-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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Patent Agency Ranking
公开(公告)号：US11302512B2
公开(公告)日：2022-04-12
申请号：US16809519
申请日：2020-03-04
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Antonius Henricus Arends , Lucas Kuindersma , Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Robertus Jacobus Theodorus Van Kempen , Niels Johannes Maria Bosch , Henricus Martinus Johannes Van De Groes , Kuo-Feng Tseng , Hans Butler , Michael Johannes Christiaan Ronde
IPC: H01J37/20
Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
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公开(公告)号：US20200303158A1
公开(公告)日：2020-09-24
申请号：US16870747
申请日：2020-05-08
Applicant: ASML Netherlands B.V.
Inventor： Niels Johannes Maria Bosch , Peter Paul Hempenius , Sven Antoin Johan HOL , Marcel Koenrood Marie Baggen
IPC: H01J37/20 , H01J37/09 , H01J37/304
Abstract: The invention relates to a particle beam apparatus comprising: a particle beam source configured to generate a particle beam; a magnetic coil configured to emit a magnetic field to manipulate the particle beam; an object table configured to hold a substrate; a positioning device comprising ferromagnetic material, the positioning device further comprising at least one motor configured to position the object table with respect to the particle beam; and a controller configured to provide a control signal to the at least one motor to at least partly compensate for a magnetic force induced by the magnetic field acting on the positioning device.
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公开(公告)号：US10649347B2
公开(公告)日：2020-05-12
申请号：US16219449
申请日：2018-12-13
Applicant: ASML Netherlands B.V.
Inventor： Michael Johannes Christiaan Ronde , Lucas Kuindersma , Niels Johannes Maria Bosch , Hans Butler , Cornelius Adrianus Lambertus De Hoon , Marc Wilhelmus Maria Van Der Wijst , Thijs Verhees , Sander Kerssemakers
Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.
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公开(公告)号：US12249481B2
公开(公告)日：2025-03-11
申请号：US17535453
申请日：2021-11-24
Applicant: ASML Netherlands B.V.
Inventor： Mark Henricus Wilhelmus Van Gerven , Johannes Hubertus Antonius Van De Rijdt , Michaël Johannes Christiaan Ronde , Niels Johannes Maria Bosch
Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.
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公开(公告)号：US09494869B2
公开(公告)日：2016-11-15
申请号：US14357530
申请日：2012-12-05
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Maria Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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