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公开(公告)号:US20240162295A1
公开(公告)日:2024-05-16
申请号:US18280049
申请日:2022-01-31
申请人: Hitachi Energy Ltd
发明人: Umamaheswara VEMULAPATI , Neophytos LOPHITIS , Jan VOBECKY , Florin UDREA , Thomas STIASNY , Chiara CORVASCE , Marina ANTONIOU
IPC分类号: H01L29/10 , H01L29/74 , H01L29/745 , H01L29/747
CPC分类号: H01L29/102 , H01L29/7416 , H01L29/7432 , H01L29/745 , H01L29/747
摘要: A power semiconductor device (1) comprises a gate-commutated thyristor cell (20) including a cathode electrode (2), a cathode region (9) of a first conductivity type, a base layer (8) of a second conductivity type, a drift layer (7) of the first conductivity type, an anode layer (5) of the second conductivity type, an anode electrode (3) and a gate electrode (4). The base layer (8) comprises a cathode base region (81) located between the cathode region (9) and the drift layer (7) and having a first depth (D1), a gate base region (82) located between the gate electrode (4) and the drift layer (7) and having a second depth (D2), and an intermediate base region (83) located between the cathode base region (81) and the gate base region (82) and having two different values of a third depth (D3) being between the first depth (D1) and the second depth (D2).
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公开(公告)号:US11978787B2
公开(公告)日:2024-05-07
申请号:US17674973
申请日:2022-02-18
申请人: Littelfuse, Inc.
发明人: Koichiro Yoshimoto
IPC分类号: H01L29/74 , H01L23/367 , H01L23/495 , H01L29/66 , H01L29/745 , H01L29/747 , H03K17/60
CPC分类号: H01L29/745 , H01L23/3675 , H01L23/49562 , H01L23/49575 , H01L29/66386 , H01L29/74 , H01L29/747 , H03K17/60
摘要: A power control switch assembly. The assembly may include a thyristor device, where the thyristor device includes a first device terminal, a second device terminal, and a gate terminal> The assembly may include a negative temperature coefficient (NTC) device, electrically coupled to the gate terminal of the thyristor device on a first end, and electrically coupled to the first device terminal of the thyristor device on a second end, wherein the NTC device is thermally coupled to the thyristor device.
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公开(公告)号:US11916138B2
公开(公告)日:2024-02-27
申请号:US17725326
申请日:2022-04-20
IPC分类号: H01L29/745 , H01L29/66 , H01L29/74
CPC分类号: H01L29/7455 , H01L29/66363 , H01L29/7424
摘要: A sacrificial substrate wafer is provided. A low resistivity etch stop layer is formed on or in the top surface of the wafer. The etch stop layer may be a highly doped, p+ type epitaxially grown layer, or an implanted p+ type boron layer, or an epitaxially grown p+ type SiGe layer. Various epitaxial layers, such as an n− type drift layer, and doped regions are then formed over the etch stop layer to form a vertical power device. The starting wafer is then removed by a combination of mechanical grinding/polishing to leave a thinner layer of the starting wafer. A chemical or plasma etch is then used to remove the remainder of the starting wafer, using the etch stop layer to automatically stop the etching. A bottom metal electrode is then formed on the etch stop layer. The etch stop layer injects hole carriers into the drift layer.
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公开(公告)号:US11705510B2
公开(公告)日:2023-07-18
申请号:US17259197
申请日:2019-07-02
发明人: Simin Li
IPC分类号: H01L29/745 , H01L21/225 , H01L21/265 , H01L21/285 , H01L29/66
CPC分类号: H01L29/745 , H01L21/2253 , H01L21/26513 , H01L21/2855 , H01L29/66363
摘要: A gate-turn-off thyristor is provided. The gate-turn-off thyristor includes a plurality of strips formed by repeatedly arranging a plurality of N-type emitter regions with high doping concentration of an upper transistor on an upper surface of an N-type silicon substrate with high resistivity, wherein a periphery of each strip of the plurality of strips is surrounded with a P-type dense base region bus bar of the upper transistor, a cathode metal layer is disposed on an N-type emitter region of the plurality of N-type emitter regions of the upper transistor, and a P-type base region of the upper transistor is disposed below the N-type emitter region of the upper transistor; a side of the P-type base region of the upper transistor is connected to a P-type dense base region of the upper transistor or a P-type dense base region bus bar of the upper transistor.
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公开(公告)号:US20230154986A1
公开(公告)日:2023-05-18
申请号:US18097586
申请日:2023-01-17
发明人: Keiji OKUMURA
IPC分类号: H01L29/10 , H01L29/739 , H01L29/78 , H01L29/08 , H01L29/423 , H01L29/417 , H01L29/66 , H01L29/16 , H01L29/745
CPC分类号: H01L29/1095 , H01L29/7397 , H01L29/7813 , H01L29/7806 , H01L29/0865 , H01L29/7811 , H01L29/4236 , H01L29/417 , H01L29/66068 , H01L29/1608 , H01L29/745 , H01L29/083 , H01L29/66348 , H01L21/049
摘要: An insulated-gate semiconductor device, which has trenches arranged in a chip structure, the trenches defining both sidewalls in a first and second sidewall surface facing each other, includes: a first unit cell including a main-electrode region in contact with a first sidewall surface of a first trench, a base region in contact with a bottom surface of the main-electrode region and the first sidewall surface, a drift layer in contact with a bottom surface of the base region and the first sidewall surface, and a gate protection-region in contact with the second sidewall surface and a bottom surface of the first trench; and a second unit cell including an operation suppression region in contact with a first sidewall surface and a second sidewall surface of a second trench, wherein the second unit cell includes the second trench located at one end of an array of the trenches.
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公开(公告)号:US20220344493A1
公开(公告)日:2022-10-27
申请号:US17725037
申请日:2022-04-20
IPC分类号: H01L29/66 , H01L21/265 , H01L29/745
摘要: After the various regions of a vertical power device are formed in or on the top surface of an n-type wafer, the wafer is thinned, such as by grinding. A drift layer may be n-type, and various n-type regions and p-type regions in the top surface contact a top metal electrode. A blanket dopant implant through the bottom surface of the thinned wafer is performed to form an n− buffer layer and a bottom p+ emitter layer. Energetic particles are injected through the bottom surface to intentionally damage the crystalline structure. A wet etch is performed, which etches the damaged crystal at a much greater rate, so some areas of the n− buffer layer are exposed. The bottom surface is metallized. The areas where the metal contacts the n− buffer layer form cathodes of an anti-parallel diode for conducting reverse voltages, such as voltage spikes from inductive loads.
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公开(公告)号:US11349021B2
公开(公告)日:2022-05-31
申请号:US16827925
申请日:2020-03-24
申请人: Littelfuse, Inc.
发明人: Koichiro Yoshimoto
IPC分类号: H01L29/74 , H01L29/745 , H01L23/495 , H03K17/60 , H01L29/66 , H01L23/367 , H01L29/747
摘要: A power control switch assembly. The assembly may include a thyristor device, where the thyristor device includes a first device terminal, a second device terminal, and a gate terminal> The assembly may include a negative temperature coefficient (NTC) device, electrically coupled to the gate terminal of the thyristor device on a first end, and electrically coupled to the first device terminal of the thyristor device on a second end, wherein the NTC device is thermally coupled to the thyristor device.
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公开(公告)号:US11289619B2
公开(公告)日:2022-03-29
申请号:US16671729
申请日:2019-11-01
申请人: Dell Products L.P.
IPC分类号: H01L29/66 , H05B47/19 , H04W52/02 , G06F1/3206 , H01L31/111 , H01L29/745 , H01L29/417
摘要: Methods, apparatus, and processor-readable storage media for automatically limiting power consumption by devices using infrared or radio communications are provided herein. An example computer-implemented method includes detecting, via at least one photodiode of an emitting sensor, one or more signals output by a user device within a predetermined proximity; automatically transitioning, via utilizing at least one transistor connected to the photodiode, and in response to detecting the one or more signals, the emitting sensor from a first power-consumption state to a second power-consumption state; transmitting one or more signals in response to transitioning from the first power-consumption state to the second power-consumption state; and subsequent to transmitting, automatically transitioning, via utilizing the at least one transistor, the emitting sensor from the second power-consumption state to the first power-consumption state after a predetermined amount of time has elapsed during which no signals were detected.
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公开(公告)号:US11177350B2
公开(公告)日:2021-11-16
申请号:US16844113
申请日:2020-04-09
发明人: Keiji Okumura
IPC分类号: H01L29/78 , H01L29/10 , H01L29/739 , H01L29/08 , H01L29/423 , H01L29/417 , H01L29/66 , H01L29/16 , H01L29/745 , H01L21/04 , H01L29/06 , H01L29/04
摘要: An insulated-gate semiconductor device, which has trenches arranged in a chip structure, the trenches defining both sidewalls in a first and second sidewall surface facing each other, includes: a first unit cell including a main-electrode region in contact with a first sidewall surface of a first trench, a base region in contact with a bottom surface of the main-electrode region and the first sidewall surface, a drift layer in contact with a bottom surface of the base region and the first sidewall surface, and a gate protection-region in contact with the second sidewall surface and a bottom surface of the first trench; and a second unit cell including an operation suppression region in contact with a first sidewall surface and a second sidewall surface of a second trench, wherein the second unit cell includes the second trench located at one end of an array of the trenches.
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公开(公告)号:US20210305415A1
公开(公告)日:2021-09-30
申请号:US16827925
申请日:2020-03-24
申请人: Littelfuse, Inc.
发明人: Koichiro Yoshimoto
IPC分类号: H01L29/745 , H01L23/495 , H01L29/66 , H03K17/60
摘要: A power control switch assembly. The assembly may include a thyristor device, where the thyristor device includes a first device terminal, a second device terminal, and a gate terminal> The assembly may include a negative temperature coefficient (NTC) device, electrically coupled to the gate terminal of the thyristor device on a first end, and electrically coupled to the first device terminal of the thyristor device on a second end, wherein the NTC device is thermally coupled to the thyristor device.
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