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    Optical resonator system, narrowband mid-infrared radiation source
    1.
    发明授权
    Optical resonator system, narrowband mid-infrared radiation source 有权

    公开(公告)号：US12050340B2

    公开(公告)日：2024-07-30

    申请号：US18046231

    申请日：2022-10-13

    Applicant: Infineon Technologies AG

    Inventor： Gerald Puehringer ,  Gerald Stocker ,  Andreas Tortschanoff ,  Reyhaneh Jannesari ,  Clement Fleury ,  Thomas Grille ,  Bernhard Jakoby ,  Cristina Consani

    IPC: G02B6/10 ,  G02B6/122 ,  G02B6/12

    CPC classification number: G02B6/102 ,  G02B6/1223 ,  G02B2006/12104

    Abstract: An optical resonator system includes a multi-strip waveguide structure having spaced semiconductor strips for guiding an IR radiation, a STP resonance structure (STP=slab tamm-plasmon-polariton), wherein the STP resonance structure includes an alternating arrangement of semiconductor strips and interjacent dielectric strips and includes a metal strip adjacent to the semiconductor strip at a boundary region of the STP resonance structure, wherein the metal strip and the adjacent semiconductor strip are arranged to provide a metal-semiconductor interface, and wherein the semiconductor strips of the multi-strip waveguide structure and the semiconductor strips of the STP resonance structure are arranged perpendicular to each other, and an optical coupling structure having a semiconductor layer, wherein the semiconductor layer is arranged between the multi-strip waveguide structure and the STP resonance structure for optically coupling the IR radiation between the multi-strip waveguide structure and the STP resonance structure.

    DEVICE FOR AMPLIFYING LIGHT BY MEANS OF REFLECTIONS IN CONDUITS
    2.
    发明公开
    DEVICE FOR AMPLIFYING LIGHT BY MEANS OF REFLECTIONS IN CONDUITS 审中-公开

    公开(公告)号：US20240248254A1

    公开(公告)日：2024-07-25

    申请号：US18575340

    申请日：2022-06-21

    Applicant: Johann-Marius MILOSIU

    Inventor： Johann-Marius MILOSIU

    IPC: G02B6/10 ,  G02B5/08 ,  G02B5/124 ,  G02B17/00

    CPC classification number: G02B6/102 ,  G02B5/0891 ,  G02B5/124 ,  G02B17/002 ,  G02B17/004

    Abstract: The present invention utilizes a system of primarily metallic pairs of mirrors, at 90° angles to each other and at 45° angles to the conduit axis, which cover only one inner wall of a fluid conduit in a parallel arrangement, while the other walls are simply mirrored. The useful radiation from e.g. UV light-emitting diodes comes through small breakthroughs in the valley bottom between two mirrors of a pair concentrated into the conduit. The double reflection in the pairs of mirrors sends the radiation back to where it came from in each section of the conduit—at least the axial component—while at the same time a lateral offset of the beams causes a chain reflection around the walls of the conduit, although this only in a defined area takes place, which has approximately the same extent as the beam cone of the light source on the opposite wall, which is also slightly concave in order to achieve better bundling of the rays. The radiation level in the delimited section intensifies even more chain reflections can take place.
    This makes it possible to achieve considerably high irradiation values in the conduit even with a relatively weak UV light source and thus ensure very effective disinfection of the fluids contained therein.

    Photonic chip and infrared imaging system using such a photonic chip
    3.
    发明公开
    Photonic chip and infrared imaging system using such a photonic chip 审中-公开

    公开(公告)号：US20240168233A1

    公开(公告)日：2024-05-23

    申请号：US18513082

    申请日：2023-11-17

    Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

    Inventor： Mathieu DUPOY ,  Cyrielle MONPEURT

    IPC: G02B6/34 ,  G02B6/10

    CPC classification number: G02B6/34 ,  G02B6/102

    Abstract: A photonic chip for scene illumination, the photonic chip comprises a substrate comprising a face with an etching, a plurality of waveguides extending parallel to a plane formed by the etched face of the substrate, each waveguide being configured to guide at least one light beam, a plurality of diffraction gratings, respectively formed in a waveguide and each being configured to extract, out of the waveguide in which it is formed and towards the etching of the substrate, the light beam propagating in said waveguide, at least two waveguides being configured to receive light beams of different wavelengths, and wherein the etching of the substrate is configured to extract the light beams out of the substrate, towards the scene to be illuminated, said scene lying against the etched face of the substrate and at the level of the etching of the substrate.

    SELF-SANITIZING WAVEGUIDING SURFACES
    6.
    发明公开
    SELF-SANITIZING WAVEGUIDING SURFACES 审中-公开

    公开(公告)号：US20230414809A1

    公开(公告)日：2023-12-28

    申请号：US18464884

    申请日：2023-09-11

    Applicant: HRL LABORATORIES, LLC

    Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

    IPC: A61L2/10 ,  F21V8/00 ,  G02B5/00 ,  A61L2/26 ,  A61L2/238 ,  G02B6/10

    CPC classification number: A61L2/10 ,  G02B6/0065 ,  G02B5/008 ,  A61L2/26 ,  G02B6/0023 ,  A61L2/238 ,  G02B6/102 ,  A61L2202/11 ,  G02B6/0043 ,  G02B6/0066 ,  G02B6/003

    Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured is to refract a suitable amount of UV light in response to a particular type of residue or application.

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