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    CALIBRATION CURVE FORMATION METHOD, IMPURITY CONCENTRATION MEASUREMENT METHOD, AND SEMICONDUCTOR WAFER MANUFACTURING METHOD
    1.
    发明申请
    CALIBRATION CURVE FORMATION METHOD, IMPURITY CONCENTRATION MEASUREMENT METHOD, AND SEMICONDUCTOR WAFER MANUFACTURING METHOD 有权
    校准曲线形成方法，强度浓度测量方法和半导体波形制造方法

    公开(公告)号：US20150338276A1

    公开(公告)日：2015-11-26

    申请号：US14719771

    申请日：2015-05-22

    申请人： GlobalWafers Japan Co., Ltd.

    发明人： Satoko NAKAGAWA ,  Kazuhiko KASHIMA

    IPC分类号： G01J3/44 ,  H01L21/265 ,  H01L21/66 ,  H01J37/317

    CPC分类号： G01J3/4406 ,  G01J2003/2873 ,  G01N21/274 ,  G01N21/6489 ,  G01N21/9501 ,  H01J37/3171 ,  H01L21/265 ,  H01L22/10

    摘要： According to an embodiment, a method of forming a calibration curve is provided. The method includes ion-implanting different doses of an impurity into a plurality of first samples, measuring an intensity of photoluminescence deriving from the impurity by a photoluminescence spectroscopy for the first samples and a second sample made of the same semiconductor. Based on the amount of implanted impurity, the intensity of the photoluminescence, and a concentration of the impurity contained in the second sample measured by a method other than the photoluminescence spectroscopy, a calibration curve is formed.

    摘要翻译： 根据实施例，提供了形成校准曲线的方法。 该方法包括将不同剂量的杂质离子注入到多个第一样品中，通过第一样品的光致发光光谱法和由相同半导体制成的第二样品测量从杂质衍生的光致发光强度。 基于通过除了光致发光光谱法之外的方法测量的植入杂质的量，光致发光的强度和包含在第二样品中的杂质的浓度，形成校准曲线。

    DEVICE AND METHOD FOR ANALYZING KERNEL COMPONENT
    2.
    发明申请
    DEVICE AND METHOD FOR ANALYZING KERNEL COMPONENT 有权
    用于分析KERNEL分量的装置和方法

    公开(公告)号：US20130278919A1

    公开(公告)日：2013-10-24

    申请号：US13655591

    申请日：2012-10-19

    申请人： HIROSHIMA UNIVERSITY ,  SATAKE CORPORATION

    发明人： Kensuke Kawamura ,  Hiroki Ishizuki ,  Hideaki Ishizu ,  Shinji Kaya

    IPC分类号： G01J3/42

    CPC分类号： G01N21/3563 ,  G01J3/2823 ,  G01J2003/2873 ,  G01J2003/2879 ,  G01N21/31 ,  G01N21/359 ,  G01N21/85

    摘要： A kernel component analysis device quantitatively analyzing a specific component contained in each of kernels on a kernel-by-kernel basis by spectroscopy includes: a light emitter configured to irradiate a kernel to be analyzed with light; a spectrum detector configured to detect a spectrum of light transmitted through and/or reflected from the kernel irradiated with the light; and a computing unit configured to calculate, on a kernel-by-kernel basis, a content of the specific component in the kernel to be analyzed, based on a spectrum value detected from an effective portion, which is suitable for quantitative analysis, of an image of the kernel by using a calibration curve indicating a relationship between a spectrum value at a specific wavelength and a content of the specific component.

    摘要翻译： 核心成分分析装置通过光谱分析核心分析包含在每个核心中的特定成分的核心部件分析装置包括：配置成用光照射要分析的核的光发射器; 光谱检测器，其被配置为检测透射通过和/或从所述光照射的核的反射光的光谱; 以及计算单元，其被配置为基于从逐个核心基于从要分析的内核中的特定组件的内容，基于从适合于定量分析的有效部分检测到的频谱值，计算 通过使用指示特定波长的光谱值与特定成分的内容之间的关系的校准曲线来确定核的图像。

    TRANSFER OF A CALIBRATION MODEL USING A SPARSE TRANSFER SET
    5.
    发明申请
    TRANSFER OF A CALIBRATION MODEL USING A SPARSE TRANSFER SET 审中-公开

    公开(公告)号：US20180031421A1

    公开(公告)日：2018-02-01

    申请号：US15614110

    申请日：2017-06-05

    申请人： Viavi Solutions Inc.

    发明人： Changmeng HSIUNG ,  Lan SUN ,  Christopher G. PEDERSON

    IPC分类号： G01J3/28 ,  G06F17/50

    CPC分类号： G01J3/28 ,  G01J3/027 ,  G01J3/0297 ,  G01J2003/2866 ,  G01J2003/2873 ,  G01N21/274 ,  G01N2201/127 ,  G06F17/50

    摘要： A device may obtain a master calibration set, associated with a master calibration model of a master instrument, that includes spectra, associated with a set of samples, generated by the master instrument. The device may identify a selected set of master calibrants based on the master calibration set. The device may obtain a selected set of target calibrants that includes spectra, associated with the subset of the set of samples, generated by the target instrument. The device may create a transfer set based on the selected set of master calibrants and the selected set of target calibrants. The device may create a target calibration set, corresponding to the master calibration set, based on the transfer set. The device may generate, using an optimization technique associated with the transfer set and a support vector regression modeling technique, a transferred calibration model, for the target instrument, based on the target calibration set.

    APPARATUS AND METHOD FOR MEASURING REFERENCE SPECTRUM FOR SAMPLE ANALYSIS, AND APPARATUS AND METHOD FOR ANALYZING SAMPLE
    6.
    发明申请
    APPARATUS AND METHOD FOR MEASURING REFERENCE SPECTRUM FOR SAMPLE ANALYSIS, AND APPARATUS AND METHOD FOR ANALYZING SAMPLE 有权
    用于测量样品分析参考光谱的装置和方法，以及分析样品的装置和方法

    公开(公告)号：US20170059409A1

    公开(公告)日：2017-03-02

    申请号：US15241762

    申请日：2016-08-19

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Kun Sun EOM

    IPC分类号： G01J3/42

    CPC分类号： G01J3/42 ,  G01J3/027 ,  G01J3/10 ,  G01J3/28 ,  G01J2003/2873 ,  G01J2003/425

    摘要： An apparatus for measuring a reference spectrum includes a parameter adjuster configured to adjust a parameter of a spectroscope so that an intensity of a reflection spectrum of a sample has a value in a range, a reference material spectrum measurer configured to adjust reflectance of a reference material so an intensity of a reflection spectrum of the reference material is not saturated, and measure the reflection spectrum of the reference material, using the spectroscope having the adjusted parameter, a first reference spectrum calculator configured to, in response to the adjusted reflectance of the reference material not being one hundred percent, calculate a first reference spectrum based on the measured reflection spectrum of the reference material, and a second reference spectrum measurer configured to measure a second reference spectrum of the reference material, using the spectroscope having the adjusted parameter, when a light source of the spectroscope is turned off.

    摘要翻译： 用于测量参考光谱的装置包括：参数调节器，被配置为调节分光镜的参数，使得样品的反射光谱的强度具有在一个范围内的值;参考材料光谱测量器，被配置为调节参考材料的反射率 因此参考物质的反射光谱的强度不饱和，并且使用具有调整参数的分光器测量参考物质的反射光谱，第一参考光谱计算器被配置为响应于参考物质的调整的反射率 材料不是百分之百，基于测量的参考材料的反射光谱计算第一参考光谱;以及第二参考光谱测量器，被配置为使用具有调整参数的分光仪，测量参考物质的第二参考光谱，当时 关闭光谱仪的光源。

    Spectrometry device, liquid chromatograph, and wavelength calibration method of spectrometer
    8.
    发明授权
    Spectrometry device, liquid chromatograph, and wavelength calibration method of spectrometer 有权
    光谱仪器，液相色谱仪和光谱仪的波长校准方法

    公开(公告)号：US09476767B2

    公开(公告)日：2016-10-25

    申请号：US14737758

    申请日：2015-06-12

    申请人： SHIMADZU CORPORATION

    发明人： Shinji Tsuji ,  Hiroyuki Togo

    IPC分类号： G01J3/28 ,  G01J3/18 ,  G01N30/74 ,  G01N21/33

    CPC分类号： G01J3/18 ,  G01J3/28 ,  G01J2003/2866 ,  G01J2003/2873 ,  G01N21/33 ,  G01N30/74

    摘要： The wavelength of a spectrometer is calibrated by using a commercial Ho glass filter. The spectrometer includes a light source including a D2 lamp and not including a mercury lamp, and a reference wavelength input unit for inputting, as a reference wavelength, a wavelength of a specific absorption peak separately measured for an Ho glass filter to be used. To calibrate the wavelength of the spectrometer by using the wavelength of a specific emission line peak of the D2 lamp and the reference wavelength input by the reference wavelength input unit, the wavelength calibration unit holds a conversion table showing a theoretical relationship between the number of control pulses for rotating a diffraction element and the corresponding wavelength of diffracted light, and calibrates the number of control pulses from the conversion table by the wavelength calibration unit.

    摘要翻译： 通过使用商业Ho玻璃过滤器校准光谱仪的波长。 该光谱仪包括一个包括D2灯而不包括汞灯的光源，以及参考波长输入单元，用于输入分别测量的所用Ho玻璃滤光片的特定吸收峰的波长作为基准波长。 为了通过使用D2灯的特定发射线峰值的波长和由参考波长输入单元输入的参考波长来校准光谱仪的波长，波长校准单元保持转换表，其显示控制次数之间的理论关系 用于旋转衍射元件的脉冲和衍射光的相应波长，并且通过波长校准单元校准来自转换表的控制脉冲的数量。