Cleaning solvent compositions exhibiting azeotrope-like behavior and their use

    公开(公告)号:US11713434B2

    公开(公告)日:2023-08-01

    申请号:US17401565

    申请日:2021-08-13

    CPC classification number: C11D1/004 C07C19/08 C11D3/3773 C11D7/50 C11D11/0047

    Abstract: An azeotropic cleaning solvent composition has from about 96 to about 98 weight percent 1,1,1,3,3,3-hexafluoro-2-methoxypropane (“HFMOP”) and from about 2 to about 4 weight percent acetone, for example, about 97 weight percent HFMOP and about 3 weight percent acetone. Another composition of the invention has a weight ratio of HFMOP to acetone of about 24 to about 99, for example, about 24 to 49. Conventional additives such as surfactants, lubricants and co-solvents may be present in an amount not to exceed about 10 weight percent of the composition. A method of the invention comprises contacting an article of manufacture with the solvent composition in order to clean the article of manufacture and then removing the solvent composition from the article of manufacture.

    Nitrogen containing hydrofluoroethers and methods of making same
    4.
    发明授权
    Nitrogen containing hydrofluoroethers and methods of making same 有权
    含氮氢氟醚及其制备方法

    公开(公告)号:US09540316B2

    公开(公告)日:2017-01-10

    申请号:US14904446

    申请日:2014-07-21

    Abstract: Provided are amine-containing hydrofluoroether compounds represented by the following general formula (I), wherein (I) Y is a single bond or CF2 and wherein (i) Rf.1 and Rf2 are independently linear or branched perfluoroalkyl groups having with 1-8 carbon atoms and optionally comprise at least one catenated heteroatom, or (ii) Rf1 and Rf2 are bonded together to form a ring structure having 4-6 carbon atoms and optionally comprise one or more catenated heteroatoms; with the proviso that if Rf1 and Rf2 are bonded together to form a ring structure comprising a nitrogen heteroatom, said nitrogen heteroatom is tertiary and is bonded to a perfluoroalkyl group having 1-3 carbon atoms.

    Abstract translation: 提供由以下通式(I)表示的含胺的氢氟醚化合物,其中(I)Y是单键或CF 2,其中(i)Rf 1和Rf 2独立地是具有1-8的直链或支链全氟烷基 碳原子并且任选地包含至少一个链状杂原子,或(ii)Rf1和Rf2键合在一起形成具有4-6个碳原子的环结构,并且任选地包含一个或多个链状杂原子; 条件是如果Rf1和Rf2键合在一起形成包含氮杂原子的环结构,则所述氮杂原子是叔烷基并且与具有1-3个碳原子的全氟烷基键合。

    Low volatile organic compounds cleaner composition
    7.
    发明授权
    Low volatile organic compounds cleaner composition 有权
    低挥发性有机化合物清洁剂组成

    公开(公告)号:US08951954B2

    公开(公告)日:2015-02-10

    申请号:US12867220

    申请日:2009-02-18

    CPC classification number: C11D1/004 C11D3/2034 C11D3/2068 C11D3/30

    Abstract: Disclosed herein are low volatile organic compound cleaner compositions which include a diethylene glycol monoalkyl ether, benzyl alcohol, and a fluorosurfactant. Also disclosed are low volatile organic compound cleaner compositions which include a diethylene glycol monoalkyl ether, benzyl alcohol, and an ethanolamine. Methods of using the compositions are also provided.

    Abstract translation: 本文公开了低挥发性有机化合物清洁剂组合物,其包括二甘醇单烷基醚,苄醇和含氟表面活性剂。 还公开了低挥发性有机化合物清洁剂组合物,其包括二甘醇单烷基醚,苄醇和乙醇胺。 还提供了使用组合物的方法。

    Mixed fluoroalkyl-alkyl surfactants
    9.
    发明授权
    Mixed fluoroalkyl-alkyl surfactants 有权
    混合氟代烷基 - 烷基表面活性剂

    公开(公告)号:US08242301B2

    公开(公告)日:2012-08-14

    申请号:US12758280

    申请日:2010-04-12

    Abstract: A surfactant of formula 1 (Rf-A)a-Q-([B]k—R)b  Formula 1 wherein a and b are each independently 1 or 2; Rf is a linear or branched perfluoroalkyl radical having from 2 to about 20 carbon atoms, optionally interrupted with at least one oxygen; R is a C1 to C20 linear, branched or cyclic alkyl, or a C6 to C10 aryl; B is —(CH2CHR1O)X—, k is 0 or 1, x is 1 to about 20, A is —(CH2)m[(CHR1CH2O)]S—[(CH2)m(CH)tCHOH(CH2)m]e—, wherein each m is independently 0 to 3, s is 0 to about 30, t is 0 or 1, and e is 0 or 1, R1 is H or CH3, Q is: —OP(O)(O−M+)(O)—, —O—, —S—(CH2)m—C(O)—O—, —SO2—O— —CH2CH2O—C(O)CH2C(OH)(V)CH2C(O)O—; —(CH2CH2O)XCH2CH(OH)—(CH2CH2O)X—(CH2)m—Si[OSi(R2)3]2—, —SO2NR2—, —(CH2CH2O)ZC(O)CH(SO3−M+)CH2C(O)(OCH2CH2)Z— wherein z is 1 to about 15, or a bond when s is a positive integer, V is —C(O)OR3 and R3 is H, CH3 or Rf; R2 is C1 to C4 alkyl, and M+ is a Group 1 metal or an ammonium (NHXR2y)+ cation wherein x+y=4, and R2 is C1 to C4 alkyl, provided that when Q is —OP(O)(O−M+)(O)— or when Q is —(CH2CH2O)Z—C(O)CH(SO3−M+)CH2C(O)(OCH2CH2)Z—, then at least one of s or e is a positive integer.

    Abstract translation: 式1的表面活性剂(Rf-A)a-Q - ([B] k-R)b式1其中a和b各自独立地为1或2; Rf是具有2至约20个碳原子的直链或支链全氟烷基,任选被至少一个氧中断; R为C1至C20直链,支链或环状烷基或C6至C10芳基; B是 - (CH 2 CHRO)X - ,k是0或1,x是1至约20,A是 - (CH 2)m [(CHR 1 CH 2 O)] S - [(CH 2)m(CH)t CHOH(CH 2)m] e-,其中每个m独立地为0至3,s为0至约30,t为0或1,e为0或1,R 1为H或CH 3,Q为:-OP(O)(O-M + )(O) - , - O - , - S-(CH 2)m -C(O)-O-,-SO 2 -O-CH 2 CH 2 O-C(O)CH 2 C(OH) - ; - (CH 2 CH 2 O)XCH 2 CH(OH) - (CH 2 CH 2 O)X(CH 2)m -Si [OSi(R 2)3] 2-,-SO 2 NR 2 - , - (CH 2 CH 2 O) O)(OCH 2 CH 2)Z-,其中z为1至约15,或当s为正整数时为键,V为-C(O)OR 3且R 3为H,CH 3或R f; R2是C1-C4烷基,M +是1族金属或铵(NHXR2y)+阳离子,其中x + y = 4,R2是C1-C4烷基,条件是当Q是-OP(O)(O- M +)(O) - 或Q为 - (CH 2 CH 2 O)Z-C(O)CH(SO 3 -M +)CH 2 C(O)(OCH 2 CH 2)Z - 时,则s或e中的至少一个为正整数。

    PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS
    10.
    发明申请
    PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS 失效
    生产过程和系统,组合物,表面活性剂,单体单元,金属络合物,磷酸酯,甘油,形成泡沫的水性膜和泡沫稳定剂

    公开(公告)号:US20120071689A1

    公开(公告)日:2012-03-22

    申请号:US13024836

    申请日:2011-02-10

    Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.

    Abstract translation: 提供了生产方法和系统,其包括使卤代化合物,脱卤化合物,醇反应,烯烃和饱和化合物反应,使具有至少两个-CF 3基团的反应物与具有环状基团的反应物反应,RF组合物如RF-中间体,RF 表面活性剂,RF单体,RF单体单元,RF-金属配合物,RF-磷酸酯,RF-二醇,RF-聚氨酯和/或RF-泡沫稳定剂。 RF部分可以包括至少两个基团-CF 3基团,至少三个-CF 3基团和/或至少两个-CF 3基团和至少两个-CH 2基团。 提供了洗涤剂,乳化剂,油漆,粘合剂,油墨,润湿剂,起泡剂和消泡剂,包括RF-表面活性剂组合物。 提供了包括RF单体单元的丙烯酸树脂,树脂和聚合物。 提供了包括其上具有RF组成的基底的组合物。 提供了可以包括RF-表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫(“AFFF”)配方。

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