公开(公告)号：US12091636B2

公开(公告)日：2024-09-17

申请号：US17516668

申请日：2021-11-01

Applicant: KCTECH CO., LTD.

Inventor： Kyong Jin Jung ,  Ga Young Jung ,  Young Ho Yun ,  Kun Hee Park ,  Young Gon Kim ,  Yong Ho Jeong

IPC: C11D1/00 ,  C09G1/02 ,  C09K3/14 ,  C11D1/14 ,  H01L21/304

CPC classification number: C11D1/143 ,  C09G1/02 ,  C09K3/1409 ,  C11D1/004 ,  C11D2111/22 ,  H01L21/304

Abstract: A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60° C. for 15 minutes may be in a range of −80 to −99.

公开(公告)号：US11732217B2

公开(公告)日：2023-08-22

申请号：US17381211

申请日：2021-07-21

Applicant: KCTECH CO., LTD.

Inventor： Kun Hee Park ,  Yong Ho Jeong ,  Kyong Jin Jung ,  Young Ho Yun

IPC: C11D7/32 ,  C11D3/24 ,  C11D3/00 ,  C11D1/40 ,  H01L21/304 ,  C11D11/00 ,  H01L21/306 ,  H01L21/321 ,  C11D3/37

CPC classification number: C11D3/245 ,  C11D1/40 ,  C11D3/0047 ,  C11D3/3773 ,  C11D11/0047 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3212

Abstract: A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.