Abstract:
The present invention relates to an article comprising a substrate having a main surface coated with a mesoporous antistatic coating, said coating having a refractive index lower than or equal to 1.5, and a silica based matrix functionalized by ammonium groups, said matrix having a hydrophobic character. Under certain conditions, the mesoporous antistatic coating is a single-layer anti-reflection coating or is part of a multi-layer anti-reflection coating. This invention further relates to a method for manufacturing said article, and to the use of a mesoporous coating having a silica based matrix functionalized by ammonium groups, as an antistatic coating.
Abstract:
This invention relates to coatings for substrates, in particular antireflective coatings (ARCs) and self-cleaning coatings (SCCs). A coating for a substrate comprises a mesoporous inorganic skeleton having photocatalytic particles provided therein and/or thereon, the coating having a porosity in excess of 50 v/v %, for example, greater than 55%, 60%, 65%, 70 v/v %.
Abstract:
The invention relates to a method for obtaining a calcium fluoride (CaF2) sol solution, comprising the steps of providing a calcium precursor in a first volume in a non-aqueous solvent, and adding, in a second volume, 1.85 to 2.05 molar equivalents of anhydrous hydrogen fluoride (nHF) per mole calcium precursor to said first volume, and/or a magnesium additive is added before or after said fluorination with hydrogen fluoride with additional 1.85 to 2.05 molar equivalents of anhydrous hydrogen fluoride (nHF) per mole magnesium additive. Additionally or alternatively at least one metal additive precursor is added before or after the fluorination with hydrogen fluoride wherein an additional amount of hydrogen fluoride (nadHF) is present in the fluorination step. The invention further relates to sol solutions, method of applying the sol solutions of the invention to surfaces as a coating, and to antireflective coatings obtained thereby.
Abstract:
A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the porogen to provide the porous film with pores and a dielectric constant less than 2.6.
Abstract:
A semi-transparent coating material for coating glass or glass ceramics includes at least one sol-gel hybrid-polymer coating system having a hybrid-polymer or inorganic sol-gel-based matrix, and nanoparticles and nanoscale pigments and/or dyes are added to the hybrid-polymer or inorganic sol-gel-based matrix.
Abstract:
The present invention provides a method for producing a porous glass layer easily, wherein a ripple is suppressed.A method for manufacturing an optical member provided with a porous glass layer on a base member includes the steps of forming an intermediate layer containing at least one of silicon, potassium, and aluminum on the base member, forming a phase-separable glass layer on the intermediate layer, forming a phase-separated glass layer on the base member by heating the intermediate layer and the phase-separable glass layer at a temperature higher than or equal to the glass transition temperature of the phase-separable glass layer, and forming a porous glass layer on the base member by subjecting the phase-separated glass layer to an etching treatment.
Abstract:
A module, for example a photovoltaic module, includes among other things a glass plate (11) as a front cover facing the direction of light incidence, a component (photovoltaic element) (15), and a plastic layer (14) provided as an embedding material, wherein the surface of the glass plate (11) on the side facing the plastic layer (14) is treated such that the index of refraction of the layer produced by the surface treatment has a value between the index of refraction of the glass of the cover (11) and the index of refraction of the plastic material of the layer (14).
Abstract:
An optical member including an oxide layer that has a stable fine textured structure and is excellent in durability is provided. The optical member includes a base material and an antireflection coating on a surface of the base material. The antireflection coating includes at least an oxide layer having a fine textured structure on the surface, and the oxide layer contains a phosphate compound. Furthermore, a method of manufacturing the optical member is provided.
Abstract:
This invention relates to a dipping solution used in a process for producing a siliceous film. The present invention provides a dipping solution and a siliceous film-production process employing the solution. The dipping solution enables to form a homogeneous siliceous film even in concave portions of a substrate having concave portions and convex portions. The substrate is coated with a polysilazane composition, and then dipped in the solution before fire. The dipping solution comprises hydrogen peroxide, a foam-deposit inhibitor, and a solvent.
Abstract:
The present invention provides an antifog-film-coated article including an antifog film having high hardness while maintaining sufficient antifog performance, which article can be employed in various applications, including antifog mirrors, windowpanes for automobiles, and windowpanes for buildings. The antifog-film-coated article of the present invention includes a hard substrate, and a water-absorbing composite film formed on the substrate, wherein the water-absorbing composite film contains a polyvinyl acetal resin; colloidal silica in an amount of 30 to 80 parts by mass on the basis of 100 parts by mass of the resin; and silica-equivalent particles derived from a hydrolysis product or partial hydrolysis product of a silicon alkoxide compound in an amount of 5 to 55 parts by mass on the basis of 100 parts by mass of the resin.