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公开(公告)号：US11655144B2
公开(公告)日：2023-05-23
申请号：US17604444
申请日：2021-04-28
Applicant: Jiangsu University
Inventor： Jian Li , Fanlin Zeng , Lamei Wang , Rao Fu , Gang Liu , Jie Luo
IPC: B81C1/00
CPC classification number: B81C1/00031 , B81C1/00047 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C1/00103 , B81C1/00119 , B81C1/00388 , B81C1/00444 , B81C1/00531 , B81C2201/0102 , B81C2201/0132
Abstract: The present invention provides a method for preparing a micro-cavity array surface with an inclined smooth bottom surface based on an air molding method. The method includes: preparing a micro-cavity array surface; preparing an auxiliary microstructure polymer template, and performing plasma treatment on the auxiliary microstructure polymer template; uniformly spreading a layer of a liquid polymer film to be formed on the auxiliary microstructure polymer template subjected to the plasma treatment; placing a gap bead in an empty position on the micro-cavity array surface; placing the auxiliary microstructure polymer template spread with the liquid polymer film on the gap bead on the micro-cavity array surface, maintaining this state, and feeding the auxiliary microstructure polymer template into a vacuum drying oven; and heating and solidifying the liquid polymer film, and separating the micro-cavity array surface to obtain the micro-cavity array surface with the inclined smooth bottom surface.
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2.发明申请METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES 有权形成面向嵌段共聚物线图案的方法，其形成的嵌段共聚物线图案及其用于形成图案的文章公开(公告)号：US20120301677A1
公开(公告)日：2012-11-29
申请号：US13480506
申请日：2012-05-25
Applicant: Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Abstract translation: 通过包括在基板表面上形成具有平行小面的嵌段共聚物膜，并且使嵌段共聚物膜退火以形成退火的嵌段共聚物膜的方法形成具有高程度的高程度的线图案的嵌段共聚物膜 具有平行于衬底表面并且垂直于衬底的平行面的线性微区域。 线图案化的嵌段共聚物膜可用于制造磁存储介质，偏振装置和纳米线阵列。
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公开(公告)号：US12090687B2
公开(公告)日：2024-09-17
申请号：US17133983
申请日：2020-12-24
Applicant: Purdue Research Foundation
Inventor： Yung C. Shin , Shashank Sarbada
IPC: G03F9/00 , B23K26/0622 , B23K26/352 , B29C33/38 , B29C33/42 , B29C35/02 , B29C41/42 , B81C1/00 , C08L83/04 , C09D183/04 , B23K103/04 , B23K103/10 , B23K103/12 , B29K83/00
CPC classification number: B29C33/42 , B23K26/0624 , B23K26/355 , B29C33/3857 , B29C35/02 , B29C41/42 , B81C1/00031 , B81C1/00055 , B81C1/00119 , C08L83/04 , C09D183/04 , B23K2103/04 , B23K2103/10 , B23K2103/12 , B29K2083/00
Abstract: A method of creating a polymer surface with surface structures is disclosed. The method includes creating a mold, forming a metal sheet into the molds, creating a surface structure on a surface of the metal sheet by exposing the surface to laser pulses, and bringing a curable polymer to be in contact with the surface of the metal sheet containing the surface structure, curing the curable polymer, and separating the cured polymer from the metal sheet, resulting in a polymer surface containing the surface structure. The polymer surfaces with the surface structures can be hydrophobic or superhydrophobic depending on the micro and nano features contained by the surface structures.
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公开(公告)号：US20180354780A1
公开(公告)日：2018-12-13
申请号：US15562726
申请日：2016-04-07
Applicant: Rensselaer Polytechnic Institute
Inventor： Diana-Andra Borca-Tasciuc , Mona Mostafa Hella , John Oxaal
CPC classification number: B81B3/0051 , B81B3/0021 , B81C1/00055 , B81C1/00119 , B81C1/00388 , B81C1/00531 , B81C1/00714
Abstract: A MEMS device and a method of forming the same. A disclosed method includes: providing a silicon substrate layer, a buried oxide layer and a device silicon layer; using a microfabrication process to pattern a set of device features on the device silicon layer including a shuttle mass and an anchor frame; removing the silicon substrate layer and buried oxide below the shuttle mass; placing a shadow mask on a surface of the device silicon layer, wherein the shadow mask has an microscale opening to expose at least one device feature; and forming a nanoscale stopper on a sidewall of the at least one device feature by depositing a deposition material through the opening in a controlled manner.
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公开(公告)号：US20180162131A1
公开(公告)日：2018-06-14
申请号：US15830384
申请日：2017-12-04
Applicant: SEIKO EPSON CORPORATION
Inventor： Tatsuro HOTTA
CPC classification number: B41J2/1607 , B32B9/04 , B32B9/045 , B32B27/42 , B32B37/02 , B32B38/10 , B32B43/006 , B32B2386/00 , B41J2/161 , B41J2/1623 , B41J2/1626 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1642 , B41J2/1646 , B81C1/00047 , B81C1/00055 , B81C2201/053 , B81C2203/0136
Abstract: Disclosed is a peeling method of a cover member including forming a recessed portion that opens one side surface of a substrate, on a region different from a region in which a pattern is formed and forming an opening region including the opening of the recessed portion; attaching the cover member so as to cover the one side surface; adjusting a pressure for increasing a pressure within a space formed by the recessed portion and the cover member by attaching the cover member to the substrate to be higher than a pressure on a side opposite to the space with the cover member interposed therebetween; and peeling off the cover member from the substrate, in a state where the pressure within the space is increased by the adjusting of the pressure.
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Patent Agency Ranking
公开(公告)号：US20240174512A1
公开(公告)日：2024-05-30
申请号：US17994471
申请日：2022-11-28
Applicant: TAIWAN MASK CORPORATION
Inventor： SHANG-KUANG WU , YU-TSUNG FU , MING-WEI HUANG
IPC: B81C1/00
CPC classification number: B81C1/00055 , B81C2201/0133 , B81C2201/0142 , B81C2201/0159
Abstract: A MEMS probe and manufacturing method thereof are provided. The method is mainly to form connected first-level, second-level, and third-level pin grooves on both sides of the silicon substrate through an etching process, followed by two electroplating processes to deposit nickel-cobalt-phosphorus alloy in the first-level pin groove to form the tip of the microprobe, and to deposit nickel-cobalt alloy in the second-level pin groove and the third-level pin to form the pin head and pin arm, thereby forming a three-level microprobe. A circuit substrate made of ceramic material is disposed with at least one window, the surface of the circuit substrate adjacent to the window is provided with a plurality of circuit pads, and the circuit substrate is abutted to the pin arm of the microprobe. The silicon substrate is then removed, to form a plurality of cantilever microprobes made of nickel-cobalt-phosphorus alloy and nickel-cobalt alloy on the circuit substrate.
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7.发明申请公开(公告)号：US20180117797A1
公开(公告)日：2018-05-03
申请号：US15730902
申请日：2017-10-12
Applicant: Purdue Research Foundation
Inventor： Yung C. Shin , Shashank Sarbada
CPC classification number: B29C33/42 , B23K26/0624 , B23K26/355 , B23K2103/04 , B23K2103/10 , B23K2103/12 , B29C33/3857 , B29C35/02 , B29C41/42 , B29K2083/00 , B81C1/00031 , B81C1/00055 , B81C1/00119 , C08L83/04 , C09D183/04
Abstract: A method of creating a polymer surface with surface structures is disclosed. The method includes creating a mold, forming a metal sheet into the molds, creating a surface structure on a surface of the metal sheet by exposing the surface to laser pulses, and bringing a curable polymer to be in contact with the surface of the metal sheet containing the surface structure, curing the curable polymer, and separating the cured polymer from the metal sheet, resulting in a polymer surface containing the surface structure. The polymer surfaces with the surface structures can be hydrophobic or superhydrophobic depending on the micro and nano features contained by the surface structures.
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公开(公告)号：US09718094B2
公开(公告)日：2017-08-01
申请号：US14845488
申请日：2015-09-04
Applicant: Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
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9.发明申请METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES 有权形成面向嵌段共聚物线图案的方法，其形成的嵌段共聚物线图案及其用于形成图案的文章公开(公告)号：US20150375262A1
公开(公告)日：2015-12-31
申请号：US14845488
申请日：2015-09-04
Applicant: Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
IPC: B05D3/04
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Abstract translation: 通过包括在基板表面上形成具有平行小面的嵌段共聚物膜，并且使嵌段共聚物膜退火以形成退火的嵌段共聚物膜的方法形成具有高程度的高程度的线图案的嵌段共聚物膜 具有平行于衬底表面并且垂直于衬底的平行面的线性微区域。 线图案化的嵌段共聚物膜可用于制造磁存储介质，偏振装置和纳米线阵列。
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10.发明授权Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles 有权形成取向嵌段共聚物线图案的方法，由此形成的嵌段共聚物线图案及其用于形成图案制品的用途公开(公告)号：US09156682B2
公开(公告)日：2015-10-13
申请号：US13480506
申请日：2012-05-25
Applicant: Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Abstract translation: 通过包括在基板表面上形成具有平行小面的嵌段共聚物膜，并且使嵌段共聚物膜退火以形成退火的嵌段共聚物膜的方法形成具有高程度的高程度的线图案的嵌段共聚物膜 具有平行于衬底表面并且垂直于衬底的平行面的线性微区域。 线图案化的嵌段共聚物膜可用于制造磁存储介质，偏振装置和纳米线阵列。
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