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公开(公告)号：US11655144B2
公开(公告)日：2023-05-23
申请号：US17604444
申请日：2021-04-28
Applicant: Jiangsu University
Inventor： Jian Li , Fanlin Zeng , Lamei Wang , Rao Fu , Gang Liu , Jie Luo
IPC: B81C1/00
CPC classification number: B81C1/00031 , B81C1/00047 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C1/00103 , B81C1/00119 , B81C1/00388 , B81C1/00444 , B81C1/00531 , B81C2201/0102 , B81C2201/0132
Abstract: The present invention provides a method for preparing a micro-cavity array surface with an inclined smooth bottom surface based on an air molding method. The method includes: preparing a micro-cavity array surface; preparing an auxiliary microstructure polymer template, and performing plasma treatment on the auxiliary microstructure polymer template; uniformly spreading a layer of a liquid polymer film to be formed on the auxiliary microstructure polymer template subjected to the plasma treatment; placing a gap bead in an empty position on the micro-cavity array surface; placing the auxiliary microstructure polymer template spread with the liquid polymer film on the gap bead on the micro-cavity array surface, maintaining this state, and feeding the auxiliary microstructure polymer template into a vacuum drying oven; and heating and solidifying the liquid polymer film, and separating the micro-cavity array surface to obtain the micro-cavity array surface with the inclined smooth bottom surface.
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2.发明申请METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES 有权形成面向嵌段共聚物线图案的方法，其形成的嵌段共聚物线图案及其用于形成图案的文章公开(公告)号：US20120301677A1
公开(公告)日：2012-11-29
申请号：US13480506
申请日：2012-05-25
Applicant: Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Abstract translation: 通过包括在基板表面上形成具有平行小面的嵌段共聚物膜，并且使嵌段共聚物膜退火以形成退火的嵌段共聚物膜的方法形成具有高程度的高程度的线图案的嵌段共聚物膜 具有平行于衬底表面并且垂直于衬底的平行面的线性微区域。 线图案化的嵌段共聚物膜可用于制造磁存储介质，偏振装置和纳米线阵列。
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Patent Agency Ranking
3.发明申请公开(公告)号：US20180086631A1
公开(公告)日：2018-03-29
申请号：US15559407
申请日：2015-12-15
Applicant: Goertek, Inc.
Inventor： Mengjin Cai , Qinglin Song
IPC: B81C1/00
CPC classification number: B81C1/00047 , B81B2201/0264 , B81C1/00079 , B81C1/00158 , B81C1/00269 , B81C1/00555
Abstract: A method for forming a cavity of a sensor chip. The method comprises forming a first groove (a2) on a substrate (a1); bonding a covering layer (a4) onto the substrate (a1) to cover the first groove (a2), thereby forming a cavity; and etching the covering layer (a4) to decrease a thickness of the covering layer. The method can implement a thinner thickness of a film, thereby improving the sensitivity of a sensor.
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公开(公告)号：US20070075035A1
公开(公告)日：2007-04-05
申请号：US11541019
申请日：2006-09-29
Applicant: Gernot Repphun , Martin Voss , Frank Wrona
Inventor： Gernot Repphun , Martin Voss , Frank Wrona
IPC: B44C1/22
CPC classification number: B81C1/00079 , B23K26/1224 , B23K26/356
Abstract: A method for microstructuring surfaces of a workpiece includes the following steps: a) placing a workpiece to be structured into a liquid medium; b) providing a light source for producing a cavitation bubble in the liquid medium; and c) producing a cavitation bubble using the light source in such a way that the subsequent collapse of the cavitation bubble structures the surface of the workpiece, in particular material is removed from the surface.
Abstract translation: 用于微结构化工件表面的方法包括以下步骤：a）将待构造的工件放置在液体介质中; b）提供用于在液体介质中产生气泡的光源; 以及c）使用光源产生空化气泡，使空穴气泡随后的破裂构成工件的表面，特别是从表面去除材料。
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公开(公告)号：US09718094B2
公开(公告)日：2017-08-01
申请号：US14845488
申请日：2015-09-04
Applicant: Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
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6.发明申请METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES 有权形成面向嵌段共聚物线图案的方法，其形成的嵌段共聚物线图案及其用于形成图案的文章公开(公告)号：US20150375262A1
公开(公告)日：2015-12-31
申请号：US14845488
申请日：2015-09-04
Applicant: Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Dong Hyun Lee , Soojin Park , Ting Xu
IPC: B05D3/04
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Abstract translation: 通过包括在基板表面上形成具有平行小面的嵌段共聚物膜，并且使嵌段共聚物膜退火以形成退火的嵌段共聚物膜的方法形成具有高程度的高程度的线图案的嵌段共聚物膜 具有平行于衬底表面并且垂直于衬底的平行面的线性微区域。 线图案化的嵌段共聚物膜可用于制造磁存储介质，偏振装置和纳米线阵列。
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7.发明授权Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles 有权形成取向嵌段共聚物线图案的方法，由此形成的嵌段共聚物线图案及其用于形成图案制品的用途公开(公告)号：US09156682B2
公开(公告)日：2015-10-13
申请号：US13480506
申请日：2012-05-25
Applicant: Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
Inventor： Thomas P. Russell , Sung Woo Hong , Doug Hyun Lee , Soojin Park , Ting Xu
CPC classification number: B05D3/0466 , B05D3/0254 , B05D3/10 , B05D3/107 , B05D5/02 , B81C1/00031 , B81C1/00055 , B81C1/00063 , B81C1/00071 , B81C1/00079 , B81C2201/0149 , G03F7/0002 , Y10T428/24521
Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Abstract translation: 通过包括在基板表面上形成具有平行小面的嵌段共聚物膜，并且使嵌段共聚物膜退火以形成退火的嵌段共聚物膜的方法形成具有高程度的高程度的线图案的嵌段共聚物膜 具有平行于衬底表面并且垂直于衬底的平行面的线性微区域。 线图案化的嵌段共聚物膜可用于制造磁存储介质，偏振装置和纳米线阵列。
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