MEMS image forming element with built-in voltage generator

    公开(公告)号:US12030772B2

    公开(公告)日:2024-07-09

    申请号:US16841044

    申请日:2020-04-06

    IPC分类号: B81B7/00 B81B3/00

    摘要: The present disclosure describes an image forming element having a semiconductor chip with micro-electro-mechanical-system (MEMS) devices and voltage generators, each voltage generator being configured to generate a voltage used by one or more of the MEMS devices. A floating ground may be used to add a voltage to the voltage generated by the voltage generators. The semiconductor chip may include electrical connections, where each voltage generator is configured to provide the voltage to the one or more MEMS devices through the electrical connections. The MEMS devices may define a boundary in the semiconductor chip within which the MEMS devices, the voltage generators, and the electrical connections are located. Each MEMS device may generate an electrostatic field to manipulate an electron beamlet of a multi-beam charged particle microscope. The MEMS devices may be organized into groups based on a distance to a reference location (e.g., optical axis) in the semiconductor chip.

    Devices, systems, and methods for obtaining sensor measurements

    公开(公告)号:US12024421B2

    公开(公告)日:2024-07-02

    申请号:US18348268

    申请日:2023-07-06

    IPC分类号: B81B7/00 B41J11/00 B81B7/04

    摘要: Some embodiments of a device comprise an image-forming medium and one or more sensors that are attached to the image-forming medium. Also, in some embodiments, the image-forming medium is paper or a medium that has paper-like characteristics, at least some of the one or more sensors are microelectromechanical systems (MEMS), or the one or more sensors are configured to be powered by wireless power transfer. And some embodiments of the device further comprise a system-on-a-chip that is in communication with the one or more sensors, a transceiver that is in communication with the system-on-a-chip, or a radio-frequency identification (RFID) tag.

    Methods for vibration immunity to suppress bias errors in sensor devices

    公开(公告)号:US12012327B2

    公开(公告)日:2024-06-18

    申请号:US17189745

    申请日:2021-03-02

    IPC分类号: B81B7/00

    摘要: A method for tuning one or more sensor devices is provided, wherein each sensor device comprises one or more proof masses configured to move in response to an external stimulus of interest, and the one or more proof masses are also susceptible to move in response to one or more stimuli other than the external stimulus of interest. Each sensor device also comprises one or more pick-off mechanisms respectively associated with each of the one or more proof masses. The one or more pick-off mechanisms is proportionally responsive to a motion of the sensor device. The method for tuning includes adjusting gain of one or more of the pick-off mechanisms to reduce an output of each sensor device when the one or more proof masses move in response to the one or more stimuli other than the external stimulus of interest.

    ELECTROMECHANICAL SYSTEM AND METHOD FOR OPERATING AN ELECTROMECHANICAL SYSTEM

    公开(公告)号:US20240140784A1

    公开(公告)日:2024-05-02

    申请号:US18548266

    申请日:2022-07-06

    申请人: Robert Bosch GmbH

    IPC分类号: B81B7/00 G01C19/5776

    CPC分类号: B81B7/008 G01C19/5776

    摘要: An electromechanical system. The electromechanical system includes: a microelectromechanical (MEMS) apparatus which has a component which can oscillate; a signal processing apparatus which is designed to receive and process a signal output by the MEMS apparatus; a voltage provision apparatus which is designed to provide at least one supply voltage for the signal processing apparatus, wherein the voltage provision apparatus includes at least one switching regulator. The voltage provision apparatus can be operated in a synchronous operating state and in an asynchronous operating state.

    Process for manufacturing microelectromechanical devices, in particular electroacoustic modules

    公开(公告)号:US11891298B2

    公开(公告)日:2024-02-06

    申请号:US17839131

    申请日:2022-06-13

    IPC分类号: B81B7/00 B81C1/00 H01L29/66

    摘要: A process for manufacturing MEMS devices, includes forming a first assembly, which comprises: a dielectric region; a redistribution region; and a plurality of unit portions. Each unit portion of the first assembly includes: a die arranged in the dielectric region; and a plurality of first and second connection elements, which extend to opposite faces of the redistribution region and are connected together by paths that extend in the redistribution region, the first connection elements being coupled to the die. The process further includes: forming a second assembly which comprises a plurality of respective unit portions, each of which includes a semiconductor portion and third connection elements; mechanically coupling the first and second assemblies so as to connect the third connection elements to corresponding second connection elements; and then removing at least part of the semiconductor portion of each unit portion of the second assembly, thus forming corresponding membranes.