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    HYBRID MANUFACTURE OF THREE-DIMENSIONAL COMPONENTS
    1.
    发明公开
    HYBRID MANUFACTURE OF THREE-DIMENSIONAL COMPONENTS 审中-公开

    公开(公告)号：US20240351252A1

    公开(公告)日：2024-10-24

    申请号：US18294229

    申请日：2022-07-08

    申请人： Robert Bosch GmbH

    发明人： Hendrik Jahnle ,  Mario Joost ,  Tim Eidenpencz

    IPC分类号： B29C39/02 ,  B29C39/26 ,  B29C39/38 ,  B29C39/44 ,  B33Y80/00

    CPC分类号： B29C39/02 ,  B29C39/26 ,  B29C39/38 ,  B29C39/44 ,  B33Y80/00

    摘要： A method (100) for manufacturing a three-dimensional object (1), said method comprising the following steps:



    a three-dimensional mold (2) defining an interior space (21) is provided (110);
    a filling material (3) comprising at least one liquid or past-like monomer is introduced (120) into the interior space (21);
    the monomer is polymerized (130) to produce a polymer, the temperature (3a) of the filling material (3) and/or the temperature (2a) of an outer surface of the three-dimensional mold (2) being monitored (140); and
    on the basis of the results (2a, 3a) of this monitoring operation, the quality (1a) of the object (1) is assessed (150) and/or at least one measure (4) is taken (160) in order to direct the temperature (2a, 3a) in a desired direction.

    METHOD OF MAKING LOW SPECIFIC GRAVITY POLISHING PADS
    7.
    发明公开
    METHOD OF MAKING LOW SPECIFIC GRAVITY POLISHING PADS 审中-公开

    公开(公告)号：US20230390970A1

    公开(公告)日：2023-12-07

    申请号：US17805040

    申请日：2022-06-02

    申请人： Rohm and Haas Electronic Materials CMP Holdings, Inc.

    发明人： Nan-Rong Chiou

    IPC分类号： B29C39/00 ,  B24B37/22 ,  B24B37/24 ,  B29C39/12 ,  B29C39/38 ,  B29C69/00

    CPC分类号： B29C39/003 ,  B24B37/22 ,  B24B37/24 ,  B29L2009/00 ,  B29C39/38 ,  B29C69/001 ,  B29C39/123

    摘要： A polishing pad for chemical mechanical polishing comprises a polishing layer which comprises a polymer matrix which is the reaction product of an isocyanate terminated oligomer or polymer, with a curative blend comprising two or more polyamine curatives wherein pores are present in the polymer matrix, such pores being formed by expansion of pre-expanded fluid filled polymeric microspheres such expansion occurring during reaction of the isocyanate terminated oligomer or polymer with the two or more curatives, wherein the polishing layer is characterized by one or more of a ratio of viscous modulus (G″) at 104° C. to shear loss modulus (G″) at 150° C. of at least 5:1; and a specific gravity of the polishing layer is less than or equal to 95% of a calculated specific gravity for the isocyanate terminated oligomer or polymer, the curative blend and the pre-expanded fluid filled polymeric microspheres.