公开(公告)号：US20170203471A1

公开(公告)日：2017-07-20

申请号：US15476446

申请日：2017-03-31

Applicant: TOYAMA PREFECTURE ,  KYORITSU CHEMICAL & CO., LTD. ,  ZEON CORPORATION

Inventor： Tsutomu OBATA ,  Yoshiyuki YOKOYAMA ,  Masaaki NASUNO ,  Mikiharu KUCHIKI ,  Tomoshi AONO ,  Motofumi KASHIWAGI

IPC: B29C33/42 ,  B29C59/00 ,  B29C33/38

CPC classification number: B29C33/424 ,  B29C33/38 ,  B29C33/3842 ,  B29C59/002 ,  B29C2033/426 ,  B29K2845/00 ,  B29K2995/0026 ,  G03F7/0002

Abstract: An imprint template is used for photocuring imprinting, and includes a support plate that is transparent with respect to an exposure wavelength used for photocuring imprinting, and has flexibility; a buffer resin layer that is formed on the support plate, and is formed of an elastic material that is transparent with respect to the exposure wavelength; and a resin film mold that is removably bonded to the buffer resin layer, and is transparent with respect to the exposure wavelength, wherein a concave-convex transfer pattern is formed on a surface of the resin film mold.

公开(公告)号：US20170197355A1

公开(公告)日：2017-07-13

申请号：US15469492

申请日：2017-03-25

Applicant: Hueck Rheinische GmbH

Inventor： Wolfgang Stoffel ,  Martin Marxen

IPC: B29C59/04 ,  B29C33/38 ,  B23P15/24 ,  B44B5/02 ,  B44F9/02 ,  B29C59/02 ,  B29C33/42

CPC classification number: B29C59/04 ,  B23P15/24 ,  B23P15/246 ,  B25B5/12 ,  B25B5/122 ,  B25B5/16 ,  B29C33/3842 ,  B29C33/424 ,  B29C59/022 ,  B29C2033/426 ,  B30B15/062 ,  B44B5/0052 ,  B44B5/026 ,  B44C3/08 ,  B44C5/04 ,  B44F9/02 ,  F16B39/10 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/24545

Abstract: An embossing tool comprised of a pressing plate or endless belt that includes a structured surface, a first gloss level over the full area of the structured surface, and further, different gloss levels in several selected areas of the structured surface. The gloss levels are created by mechanical post-treatment and/or chemical post-treatment. A method for producing the embossing tool is also involved. The structured surface is provided with a first gloss level over the full area and receives further, different gloss levels in several selected areas in further work steps. The gloss levels are created via a mechanical post-treatment and/or chemical post-treatment.

公开(公告)号：US09620921B2

公开(公告)日：2017-04-11

申请号：US14342895

申请日：2012-07-04

Applicant: Atsushi Sugiyama ,  Naota Akikusa ,  Tadataka Edamura

Inventor： Atsushi Sugiyama ,  Naota Akikusa ,  Tadataka Edamura

IPC: H01S5/34 ,  H01S3/08 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y40/00 ,  H01S5/12 ,  B29C33/42 ,  G03F7/00

CPC classification number: H01S3/08009 ,  B29C33/424 ,  B29C2033/426 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01S5/124 ,  H01S5/3401 ,  H01S5/3402

Abstract: A quantum cascade laser manufacturing method includes: a step of pressing a mother stamper against a resin film having flexibility to make a resin stamper 201 having a second groove pattern P2; a step of making a wafer with an active layer formed on a semiconductor substrate; a step of forming a resist film 304 on a surface on the active layer side of the wafer; a step of pressing the resin stamper against the resist film 304 by air pressure to form a third groove pattern P3 on the resist film 304; and a step of etching the wafer with the resist film 304 serving as a mask to form a diffraction grating on a surface of the wafer.

公开(公告)号：US09452574B2

公开(公告)日：2016-09-27

申请号：US13720315

申请日：2012-12-19

Applicant: Molecular Imprints, Inc.

Inventor： Douglas J. Resnick ,  Michael N. Miller ,  Frank Y. Xu

IPC: B29D11/00 ,  B82Y10/00 ,  B82Y40/00 ,  B82Y30/00 ,  G03F7/00 ,  B29C59/02 ,  B29C43/02 ,  B29C43/00 ,  B29C33/38 ,  B29C33/42

CPC classification number: B29D11/0074 ,  B29C33/3842 ,  B29C43/003 ,  B29C43/021 ,  B29C59/022 ,  B29C2033/426 ,  B29C2043/025 ,  B29C2059/023 ,  B29D11/00 ,  B29D11/00769 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  Y10S977/887 ,  Y10S977/888

Abstract: Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.

Abstract translation: 描述了形成用于图案化大面积光学器件的大面积模板的方法，包括例如 线栅偏振器（WGP）。 这种方法提供了这种大面积装置的无缝构图。

公开(公告)号：US09238309B2

公开(公告)日：2016-01-19

申请号：US13201408

申请日：2009-05-08

Applicant: William P. King ,  Andrew H. Cannon

Inventor： William P. King ,  Andrew H. Cannon

IPC: B29C33/38 ,  B29C33/40 ,  B29C33/30 ,  B29C43/02 ,  B29C45/26 ,  B29C33/42 ,  B29C59/02

CPC classification number: B29C33/3857 ,  B29C33/306 ,  B29C33/3878 ,  B29C33/3885 ,  B29C33/3892 ,  B29C33/405 ,  B29C33/42 ,  B29C33/424 ,  B29C45/2673 ,  B29C2033/426 ,  B29C2043/025 ,  B29C2059/023 ,  B29D30/72 ,  B29D2030/0612 ,  B29D2030/0616 ,  B29D2030/726 ,  B29L2030/002 ,  B29L2030/007 ,  B29L2031/756 ,  B60C11/00 ,  B60C13/001

Abstract: Described herein are casting and molding methods useful for making microstructured objects. By including a plurality of microfeatures on the surface of an object, other characteristics may be imparted to the object, such as increased hydrophobicity. Some of the casting and molding methods described herein further allow for manufacture of objects having both microfeatures and macro features, for example microfeatures on or within macro features or selected macro feature regions.

Abstract translation: 这里描述的是用于制造微结构化物体的铸造和模制方法。 通过在物体的表面上包含多个微特征，可以向物体施加其它特征，例如增加的疏水性。 本文描述的一些铸造和模制方法还允许制造具有微特征和宏特征的物体，例如宏观特征或选定的宏观特征区域上或之内的微特征。

公开(公告)号：US20150158330A1

公开(公告)日：2015-06-11

申请号：US14377175

申请日：2013-03-15

Applicant: Hueck Rheinische GmbH

Inventor： Wolfgang Stoffel ,  Martin Marxen

IPC: B44F9/02

CPC classification number: B29C59/04 ,  B23P15/24 ,  B23P15/246 ,  B25B5/12 ,  B25B5/122 ,  B25B5/16 ,  B29C33/3842 ,  B29C33/424 ,  B29C59/022 ,  B29C2033/426 ,  B30B15/062 ,  B44B5/0052 ,  B44B5/026 ,  B44C3/08 ,  B44C5/04 ,  B44F9/02 ,  F16B39/10 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/24545

Abstract: The invention relates to a composite board (1) having at least one structured surface side, in particular a surface (2) with a wood pore, wherein elevated and lowered regions are formed. In order to obtain improved haptics and visual characteristics, it is provided that the embossing of the surface (2) takes place by way of a pressing plate or endless belt, which has a first gloss level over the full surface area and has been given further different gloss levels in a plurality of selected regions in further working steps, wherein the gloss levels can be produced by a metallic coating, a mechanical and/or chemical post-treatment.

Abstract translation: 本发明涉及具有至少一个结构化表面侧的复合板（1），特别是具有木质孔的表面（2），其中形成了升高和降低的区域。 为了获得改进的触觉和视觉特性，提供了通过压板或环形带进行表面（2）的压花，压板或环形带在整个表面积上具有第一光泽度并进一步给予 在另外的工作步骤中在多个选定区域中的不同光泽度水平，其中光泽度可以通过金属涂层，机械和/或化学后处理产生。

公开(公告)号：US20140374380A1

公开(公告)日：2014-12-25

申请号：US14167464

申请日：2014-01-29

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Masahiro KANAMARU ,  Yoshiyuki KAMATA ,  Ryosuke YAMAMOTO ,  Takeshi OKINO ,  Akira KIKITSU ,  Katsuya SUGAWARA ,  Yasuaki OOTERA ,  Tomoyuki MAEDA

IPC: B29C59/02

CPC classification number: G11B5/855 ,  B29C33/00 ,  B29C33/3857 ,  B29C45/372 ,  B29C2033/426 ,  G03F7/0002 ,  G11B5/746 ,  G11B5/82 ,  H01L21/76817

Abstract: A stamper of an embodiment includes: a base portion having a main surface; and a plurality of guides arranged on the main surface in mutually different first and second directions and serving as references of arrangement of a plurality of self-assembled dots. A distance between the guides in a third direction is within a range of an integer m1±0.05 times of a pitch of the plural self-assembled dots. The third direction corresponds to a third vector obtained by combining a first vector corresponding to the arrangement of the guides in the first direction and a second vector corresponding to the arrangement of the guides in the second direction. A distance between the plural guides in the first direction falls out of a range of an integer m2±0.15 times of the pitch of the plural self-assembled dots.

Abstract translation: 实施例的压模包括：具有主表面的基部; 以及在相互不同的第一和第二方向上布置在主表面上的多个引导件，并且用作多个自组装点的布置的参考。 导向件之间的距离在第三方向上在多个自组装点的间距的整数m1±0.05倍的范围内。 第三方向对应于通过组合与第一方向上的引导件的布置相对应的第一矢量和对应于第二方向上的引导件的布置的第二矢量而获得的第三矢量。 第一方向上的多个引导件之间的距离落在多个自组装点的间距的整数m2±0.15倍的范围内。

公开(公告)号：US20120006788A1

公开(公告)日：2012-01-12

申请号：US13256397

申请日：2010-06-23

Applicant: Toru Fujimori ,  Koji Shirakawa ,  Toshihiro USA ,  Kenji Sugiyama ,  Takayuki Ito ,  Hideaki Tsubaki ,  Katsuhiro Nishimaki ,  Shuji Hirano ,  Hidenori Takahashi

Inventor： Toru Fujimori ,  Koji Shirakawa ,  Toshihiro USA ,  Kenji Sugiyama ,  Takayuki Ito ,  Hideaki Tsubaki ,  Katsuhiro Nishimaki ,  Shuji Hirano ,  Hidenori Takahashi

IPC: C23F1/02 ,  G03F7/004 ,  C08F228/02 ,  C08F216/02

CPC classification number: C08F20/50 ,  B29C33/38 ,  B29C2033/426 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.

Abstract translation: 提供了用于制备模具的化学增幅抗蚀剂组合物，以及使用该组合物的模具制备方法和抗蚀剂膜。

公开(公告)号：US07829267B2

公开(公告)日：2010-11-09

申请号：US11653918

申请日：2007-01-17

Applicant: Minoru Fujita ,  Mikiharu Hibi

Inventor： Minoru Fujita ,  Mikiharu Hibi

IPC: B29D17/00 ,  G03C5/00

CPC classification number: B29D17/005 ,  B29C33/424 ,  B29C43/021 ,  B29C43/361 ,  B29C2033/426 ,  B29C2043/025 ,  B29C2043/3655 ,  B29C2043/5858 ,  G11B5/855 ,  G11B7/263

Abstract: A stamper is formed so that a thickness between a concave/convex pattern formation surface, where a concave/convex pattern is formed, and a rear surface gradually decreases in a predetermined area of the stamper. The predetermined area corresponds to an area where pressure is likely to be concentrated when the concave/convex pattern of the stamper is used to form a concave/convex pattern on a substrate. A method of forming a concave/convex pattern uses such stamper, and a method of manufacturing an information recording medium uses a concave/convex pattern formed by such method.

Abstract translation: 形成压模，使得在压模的预定区域中形成凹凸图案的凹凸图案形成表面与后表面之间的厚度逐渐减小。 当使用压模的凹凸图案在基板上形成凹凸图案时，预定区域对应于压力可能集中的区域。 形成凹凸图案的方法使用这种压模，并且制造信息记录介质的方法使用通过这种方法形成的凹凸图案。

公开(公告)号：US20090232928A1

公开(公告)日：2009-09-17

申请号：US12473071

申请日：2009-05-27

Applicant: Shinobu Sugimura ,  Kaori Kimura ,  Takuya Shimada ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

Inventor： Shinobu Sugimura ,  Kaori Kimura ,  Takuya Shimada ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

IPC: B29C43/00 ,  G03F7/20

CPC classification number: G11B7/261 ,  B29C33/424 ,  B29C2033/426 ,  B82Y10/00 ,  B82Y40/00 ,  C25D1/10 ,  G03F7/0002 ,  G11B7/263 ,  H01F41/34

Abstract: According to one embodiment, a method of manufacturing a stamper includes forming a conductive layer on a surface of a master having patterns of protrusions and recesses, forming an electroforming layer on the conductive layer, separating the electroforming layer and the conductive layer from the master to form a stamper to which the patterns of protrusions and recesses of the master are transferred, removing a resist left on the surface of the stamper, and etching the surface of the stamper with an acidic solution having a pH value of less than 3.

Abstract translation: 根据一个实施例，制造压模的方法包括在具有突起和凹槽图案的母版表面上形成导电层，在导电层上形成电铸层，将电铸层和导电层与母模分离成 形成压模，母模的突起和凹部的图案被转印到其上，去除压模表面上的抗蚀剂，并用pH值小于3的酸性溶液蚀刻压模的表面。