Compensation de-interlacing image processing apparatus and associated method
    1.
    发明授权
    Compensation de-interlacing image processing apparatus and associated method 有权
    补偿去隔行图像处理装置及相关方法

    公开(公告)号:US09277167B2

    公开(公告)日:2016-03-01

    申请号:US13337453

    申请日:2011-12-27

    CPC分类号: H04N7/012 H04N7/014

    摘要: A motion compensation de-interlacing image processing apparatus is provided. The apparatus includes a motion compensation module, a still compensation module, a motion detection module, and a de-interlacing blending module. The motion compensation module generates a motion compensation pixel according to at least one of a current field, a previous field, and a next field of a target pixel to be interpolated. The still compensation module generates a still compensation pixel according to the previous field and the next field of the target pixel. The motion detection module determines a motion index according to the previous field and the next field of the target pixel. The de-interlacing blending module generates the target pixel by weighted averaging the motion compensation pixel and the still compensation pixel according to the motion index.

    摘要翻译: 提供一种运动补偿去隔行图像处理装置。 该装置包括运动补偿模块,静止补偿模块,运动检测模块和去隔行混合模块。 运动补偿模块根据要内插的目标像素的当前场,先前场和下一场中的至少一个产生运动补偿像素。 静止补偿模块根据目标像素的前一场和下一场产生静止补偿像素。 运动检测模块根据目标像素的前一场和下一个场来确定运动索引。 去隔行混合模块通过根据运动索引对运动补偿像素和静止补偿像素进行加权平均来生成目标像素。

    COMPENSATION DE-INTERLACING IMAGE PROCESSING APPARATUS AND ASSOCIATED METHOD
    2.
    发明申请
    COMPENSATION DE-INTERLACING IMAGE PROCESSING APPARATUS AND ASSOCIATED METHOD 有权
    补偿去交错图像处理装置和相关方法

    公开(公告)号:US20120170657A1

    公开(公告)日:2012-07-05

    申请号:US13337453

    申请日:2011-12-27

    IPC分类号: H04N7/32 H04N7/26

    CPC分类号: H04N7/012 H04N7/014

    摘要: A motion compensation de-interlacing image processing apparatus is provided. The apparatus includes a motion compensation module, a still compensation module, a motion detection module, and a de-interlacing blending module. The motion compensation module generates a motion compensation pixel according to at least one of a current field, a previous field, and a next field of a target pixel to be interpolated. The still compensation module generates a still compensation pixel according to the previous field and the next field of the target pixel. The motion detection module determines a motion index according to the previous field and the next field of the target pixel. The de-interlacing blending module generates the target pixel by weighted averaging the motion compensation pixel and the still compensation pixel according to the motion index.

    摘要翻译: 提供一种运动补偿去隔行图像处理装置。 该装置包括运动补偿模块,静止补偿模块,运动检测模块和去隔行混合模块。 运动补偿模块根据要内插的目标像素的当前场,先前场和下一场中的至少一个产生运动补偿像素。 静止补偿模块根据目标像素的前一场和下一场产生静止补偿像素。 运动检测模块根据目标像素的前一场和下一个场来确定运动索引。 去隔行混合模块通过根据运动索引对运动补偿像素和静止补偿像素进行加权平均来生成目标像素。

    MTJ element for STT MRAM
    4.
    发明授权
    MTJ element for STT MRAM 有权
    STT MRAM的MTJ元素

    公开(公告)号:US08900884B2

    公开(公告)日:2014-12-02

    申请号:US13525502

    申请日:2012-06-18

    IPC分类号: H01L21/00 H01L29/82

    CPC分类号: H01L43/10 H01L43/08 H01L43/12

    摘要: An all (111) MTJ stack is disclosed in which there are no transitions between different crystalline orientations when going from layer to layer. This is accomplished by providing strongly (111)-textured layers immediately below the MgO tunnel barrier to induce a (111) orientation therein.

    摘要翻译: 公开了所有(111)MTJ堆叠,其中当从层到层不同时,不同结晶取向之间没有转变。 这通过在MgO隧道势垒正下方提供强(111) - 纹理层以在其中诱导(111)取向来实现。

    Engineered magnetic layer with improved perpendicular anisotropy using glassing agents for spintronic applications
    6.
    发明授权
    Engineered magnetic layer with improved perpendicular anisotropy using glassing agents for spintronic applications 有权
    具有改进的垂直各向异性的工程磁性层,使用玻璃化剂进行自旋电子应用

    公开(公告)号:US08698260B2

    公开(公告)日:2014-04-15

    申请号:US13548859

    申请日:2012-07-13

    IPC分类号: H01L29/82

    CPC分类号: H01L43/08 H01L43/10

    摘要: A magnetic element in a spintronic device or serving as a propagation medium in a domain wall motion device is disclosed wherein first and second interfaces of a free layer with a perpendicular Hk enhancing layer and tunnel barrier, respectively, produce enhanced surface perpendicular anisotropy to increase thermal stability in a magnetic tunnel junction. The free layer may be a single layer or a composite and is comprised of a glassing agent that has a first concentration in a middle portion thereof and a second concentration less than the first concentration in regions near first and second interfaces. A CoFeB free layer selectively crystallizes along first and second interfaces but maintains an amorphous character in a middle region containing a glass agent providing the annealing temperature is less than the crystallization temperature of the middle region.

    摘要翻译: 公开了一种自旋电子器件中的磁性元件或用作畴壁运动装置中的传播介质的磁性元件,其中分别具有垂直Hk增强层和隧道势垒的自由层的第一和第二界面产生增强的表面垂直各向异性以增加热量 磁性隧道结中的稳定性。 自由层可以是单层或复合物,并且由在中间部分具有第一浓度并且在第一和第二界面附近的区域中的第二浓度小于第一浓度的玻璃化剂组成。 CoFeB自由层选择性地沿着第一和第二界面结晶,但是在含有玻璃试剂的中间区域保持非晶形特征,提供退火温度小于中间区域的结晶温度。

    MTJ Element for STT MRAM
    7.
    发明申请
    MTJ Element for STT MRAM 有权
    STT MRAM的MTJ元素

    公开(公告)号:US20130334629A1

    公开(公告)日:2013-12-19

    申请号:US13525502

    申请日:2012-06-18

    IPC分类号: H01L43/10 H01L43/12

    CPC分类号: H01L43/10 H01L43/08 H01L43/12

    摘要: An all (111) MTJ stack is disclosed in which there are no transitions between different crystalline orientations when going from layer to layer. This is accomplished by providing strongly (111)-textured layers immediately below the MgO tunnel barrier to induce a (111) orientation therein.

    摘要翻译: 公开了所有(111)MTJ堆叠,其中当从层到层不同时,不同结晶取向之间没有转变。 这通过在MgO隧道势垒正下方提供强(111) - 纹理层以在其中诱导(111)取向来实现。

    Free Layer with High Thermal Stability for Magnetic Device Applications by Insertion of a Boron Dusting Layer
    8.
    发明申请
    Free Layer with High Thermal Stability for Magnetic Device Applications by Insertion of a Boron Dusting Layer 有权
    通过插入硼粉尘层的磁性器件应用具有高热稳定性的自由层

    公开(公告)号:US20130270523A1

    公开(公告)日:2013-10-17

    申请号:US13448557

    申请日:2012-04-17

    IPC分类号: H01L43/10 H01L43/12

    摘要: A boron or boron containing dusting layer such as CoB or FeB is formed along one or both of top and bottom surfaces of a free layer at interfaces with a tunnel barrier layer and capping layer to improve thermal stability while maintaining other magnetic properties of a MTJ stack. Each dusting layer has a thickness from 0.2 to 20 Angstroms and may be used as deposited, or at temperatures up to 400° C. or higher, or following a subsequent anneal at 400° C. or higher. The free layer may be a single layer of CoFe, Co, CoFeB or CoFeNiB, or may include a non-magnetic insertion layer. The resulting MTJ is suitable for STT-MRAM memory elements or spintronic devices. Perpendicular magnetic anisotropy is maintained in the free layer at temperatures up to 400° C. or higher. Ku enhancement is achieved and the retention time of a memory cell for STT-MRAM designs is increased.

    摘要翻译: 在具有隧道势垒层和封盖层的界面处,在自由层的顶表面和底表面中的一个或两个上形成含硼或含硼的除尘层,以改善热稳定性,同时保持MTJ堆叠的其它磁性能 。 每个除尘层的厚度为0.2至20埃,可用于沉积,或在高达400℃或更高的温度下使用,或随后在400℃或更高温度下退火。 自由层可以是CoFe,Co,CoFeB或CoFeNiB的单层,或者可以包括非磁性插入层。 所得MTJ适用于STT-MRAM存储器元件或自旋电子器件。 垂直磁各向异性在高达400℃或更高的温度下保持在自由层中。 实现了Ku增强,并且用于STT-MRAM设计的存储单元的保留时间增加。

    High Thermal Stability Reference Structure with Out-of-Plane Aniotropy for Magnetic Device Applications
    9.
    发明申请
    High Thermal Stability Reference Structure with Out-of-Plane Aniotropy for Magnetic Device Applications 有权
    用于磁性器件应用的具有非平面各向异性的高热稳定性参考结构

    公开(公告)号:US20130224521A1

    公开(公告)日:2013-08-29

    申请号:US13406972

    申请日:2012-02-28

    IPC分类号: G11B5/66 H01F41/22 H01F41/14

    摘要: Enhanced Hc and Hk in addition to higher thermal stability to 400° C. are achieved in magnetic devices by adding dusting layers on top and bottom surfaces of a spacer in a synthetic antiferromagnetic (SAF) structure to give a RL1/DL1/spacer/DL2/RL2 reference layer configuration where RL1 and RL2 layers exhibit perpendicular magnetic anisotropy (PMA), the spacer induces antiferromagnetic coupling between RL1 and RL2, and DL1 and DL2 are dusting layers that enhance PMA. RL1 and RL2 layers are selected from laminates such as (Ni/Co)n, L10 alloys, or rare earth-transition metal alloys. The reference layer may be incorporated in STT-MRAM memory elements or in spintronic devices including a spin transfer oscillator. Dusting layers and a similar SAF design may be employed in a free layer for Ku enhancement and to increase the retention time of a memory cell.

    摘要翻译: 通过在合成反铁磁(SAF)结构中在间隔物的顶表面和底表面上添加除尘层,得到RL1 / DL1 /间隔物/ DL2,在磁性器件中,除了通过在400℃下的更高的热稳定性之外,增强了Hc和Hk / RL2参考层配置,其中RL1和RL2层表现出垂直的磁各向异性(PMA),间隔物引起RL1和RL2之间的反铁磁耦合,DL1和DL2是增强PMA的除尘层。 RL1和RL2层选自诸如(Ni / Co)n,L10合金或稀土 - 过渡金属合金的层压体。 参考层可以并入STT-MRAM存储元件或包括自旋转移振荡器的自旋电子器件中。 可以在用于Ku增强的自由层中使用除尘层和类似的SAF设计,并增加存储器单元的保留时间。

    Reverse connection MTJ cell for STT MRAM
    10.
    发明授权
    Reverse connection MTJ cell for STT MRAM 有权
    用于STT MRAM的反向连接MTJ单元

    公开(公告)号:US08416600B2

    公开(公告)日:2013-04-09

    申请号:US12626092

    申请日:2009-11-25

    IPC分类号: G11C11/00

    摘要: Apparatus and methods are disclosed herein for a reverse-connection STT MTJ element of a MRAM to overcome the source degeneration effect when switching the magnetization of the MTJ element from the parallel to the anti-parallel direction. A memory cell of a MRAM having a reverse-connection MTJ element includes a switching device having a source, a gate, and a drain, and a reverse-connection MTJ device having a free layer, a fixed layer, and an insulator layer interposed between the free layer and the fixed layer. The free layer of the reverse-connection MTJ device is connected to the drain of the switching device and the fixed layer is connected to a bit line (BL). The reverse-connection MTJ device applies the lower IMTJ capability of the memory cell caused by the source degeneration effect to the less stringent IMTJ(AP->P) while preserving the higher IMTJ capability for the more demanding IMTJ(P->AP).

    摘要翻译: 本文公开了用于MRAM的反向连接STT MTJ元件的装置和方法,以在将MTJ元件的磁化从平行方向切换到反平行方向时克服源退化效应。 具有反向连接MTJ元件的MRAM的存储单元包括具有源极,栅极和漏极的开关器件和具有自由层,固定层和绝缘体层的反向连接MTJ器件, 自由层和固定层。 反连接MTJ器件的自由层连接到开关器件的漏极,固定层连接到位线(BL)。 反向连接MTJ设备将由源退化效应引起的存储器单元的较低IMTJ能力应用于较不严格的IMTJ(AP-> P),同时为更苛刻的IMTJ(P-> AP)保持较高的IMTJ能力。