公开(公告)号：US09989852B2

公开(公告)日：2018-06-05

申请号：US14902411

申请日：2014-07-01

申请人： TORAY INDUSTRIES, INC.

发明人： Keiichi Uchida ,  Masao Kamogawa ,  Mitsuhito Suwa ,  Chika Taniguchi

IPC分类号： G03F7/023 ,  G03F7/075 ,  G03F7/039 ,  G03F7/22 ,  H01L21/02 ,  H01L27/146 ,  C08G77/14 ,  C09D183/06 ,  H01L21/311 ,  G03F7/022 ,  H01L21/027 ,  G03F7/004

CPC分类号： G03F7/0757 ,  C08G77/14 ,  C09D183/06 ,  G03F7/0047 ,  G03F7/022 ,  G03F7/023 ,  G03F7/0233 ,  G03F7/039 ,  H01L21/02126 ,  H01L21/02282 ,  H01L21/0274 ,  H01L21/311 ,  H01L27/1462 ,  H01L27/14621 ,  H01L27/14627 ,  C08K5/235 ,  C08K9/06

摘要： A positive photosensitive resin composition including: a polysiloxane synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane that has a carboxyl group and/or a dicarboxylic acid anhydride structure; particles of one or more metal compounds selected from an aluminum compound, a tin compound, a titanium compound, and a zirconium compound, or composite particles of a silicon compound and one or more metal compounds selected from an aluminum compound, a tin compound, a titanium compound, and a zirconium compound; a naphthoquinone diazide compound; and a solvent.

公开(公告)号：US09977329B2

公开(公告)日：2018-05-22

申请号：US15113119

申请日：2015-01-21

申请人： TORAY INDUSTRIES, INC.

发明人： Hirokazu Iimori ,  Toshiyasu Hibino ,  Mitsuhito Suwa

IPC分类号： G03F7/028 ,  G03F7/075 ,  G02B5/20 ,  G03F7/027 ,  G03F7/004 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  H01L27/146

CPC分类号： G03F7/0757 ,  G02B5/20 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/26 ,  H01L27/14609 ,  H01L27/14621 ,  H01L27/1464 ,  H01L27/14643 ,  H01L27/14685

摘要： The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an α,β-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.

公开(公告)号：US09704724B2

公开(公告)日：2017-07-11

申请号：US14352255

申请日：2012-12-21

申请人： TORAY Industries, Inc.

发明人： Takenori Fujiwara ,  Yugo Tanigaki ,  Mitsuhito Suwa

IPC分类号： H01L21/426 ,  G03F7/075 ,  G03F7/038 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03F7/027 ,  G03F7/032

CPC分类号： H01L21/426 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/022 ,  G03F7/0233 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0757

摘要： Disclosed is a photosensitive resin composition which exhibits positive or negative photosensitivity and is used as a mask in an ion implantation step, the photosensitive resin composition including, as a resin, (A) a polysiloxane. The photosensitive resin composition of the present invention has high heat resistance and is capable of controlling a pattern shape, and also has excellent ion implantation mask performance, thus enabling application to a low-cost high-temperature ion implantation process.

公开(公告)号：US09691935B2

公开(公告)日：2017-06-27

申请号：US14902403

申请日：2014-06-30

申请人： TORAY INDUSTRIES, INC.

发明人： Sachio Inaba ,  Seiichiro Murase ,  Hiroji Shimizu ,  Kouichi Dan ,  Mitsuhito Suwa

IPC分类号： H01L31/18 ,  H01L31/068 ,  H01L21/22 ,  H01L21/225 ,  H01L31/103 ,  C09D183/04 ,  C08G77/08 ,  C09D11/03 ,  C09D11/102 ,  C09D11/52 ,  C08G77/00 ,  C08K3/32 ,  C08K3/36

CPC分类号： H01L31/1876 ,  C08G77/08 ,  C08G77/80 ,  C08K3/32 ,  C08K3/36 ,  C08K2003/329 ,  C09D11/03 ,  C09D11/102 ,  C09D11/52 ,  C09D183/04 ,  H01L21/2225 ,  H01L21/2254 ,  H01L31/0682 ,  H01L31/103 ,  H01L31/1804 ,  H01L31/1864 ,  Y02E10/547 ,  Y02P70/521 ,  C08K3/38

摘要： An impurity-diffusing composition including (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component. In the formula, R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1 may be the same or different. R2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R2 may be the same or different. R3 and R4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R3 and a plurality of R4 each may be the same or different. The ratio of n:m is 95:5 to 25:75.

公开(公告)号：US09510444B2

公开(公告)日：2016-11-29

申请号：US14762875

申请日：2014-01-16

申请人： TORAY INDUSTRIES, INC.

发明人： Hitoshi Araki ,  Mitsuhito Suwa

IPC分类号： H05K1/00 ,  H05K1/03 ,  G06F3/041

摘要： The present invention aims to provide a substrate having an ITO with a low ITO pattern visibility, which substrate is formed by a method utilizing a simple technique such as coating, printing or the like, and which method is less burdensome from the viewpoints of cost and process; and to provide a touch panel member using the substrate. The present invention provides a substrate including a region where thin layers are laminated on a transparent ground substrate, which thin layers are, in the order mentioned from the upper surface of the substrate: an ITO (Indium Tin Oxide) thin layer (I); an organic thin layer (II) having a film thickness of from 0.01 to 0.4 μm and a refractive index of from 1.58 to 1.85; and a transparent adhesive thin layer (III) having a refractive index of from 1.46 to 1.52.

公开(公告)号：US11795064B2

公开(公告)日：2023-10-24

申请号：US15772881

申请日：2016-11-17

申请人： TORAY INDUSTRIES, INC.

发明人： Masao Kamogawa ,  Mitsuhito Suwa ,  Hiroko Mitsui ,  Miki Nakamichi

IPC分类号： C01G25/00 ,  H05B33/22 ,  C08L85/00 ,  C08G79/00 ,  C08K3/22 ,  G02B1/11 ,  B32B9/00 ,  H05B33/28 ,  C07F7/08 ,  H10K50/00 ,  G02B5/28 ,  A61K51/04

CPC分类号： C01G25/006 ,  B32B9/00 ,  C07F7/0836 ,  C08G79/00 ,  C08K3/22 ,  C08L85/00 ,  G02B1/11 ,  G02B5/28 ,  H05B33/22 ,  H05B33/28 ,  H10K50/00 ,  A61K51/0478

摘要： Disclosed is a polymetalloxane including a constituent unit represented by the following general formula (1), which stably exists in a transparent and uniform state in a solution and can form a homogeneous cured film:




wherein R1 is an organic group and at least one of R1 is an (R33SiO—) group, R3 is optionally selected from specific groups, R2 is optionally selected from specific groups, when plural R1, R2, and R3 exist, they may be the same or different, M represents a specific metal atom, m is an integer indicating a valence of a metal atom M, and a is an integer of 1 to (m−2).

公开(公告)号：US20220350244A1

公开(公告)日：2022-11-03

申请号：US17640256

申请日：2020-09-03

申请人： Toray Industries, Inc.

发明人： Hideyuki Kobayashi ,  Mitsuhito Suwa ,  Yukinori Togo

IPC分类号： G03F7/022 ,  G03F7/023 ,  G03F7/075

摘要： A photosensitive resin composition includes a siloxane resin (A), particles (B) having a median diameter of 0.2 to 0.6 μm, and a naphthoquinone diazide compound (C), wherein the siloxane resin (A) contains at least 20 to 60 mol % in total of a repeating unit represented by general formula (1): wherein R1 represents an aryl group having 6 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms in which all or part of hydrogen is substituted.

公开(公告)号：US20210095124A1

公开(公告)日：2021-04-01

申请号：US16634369

申请日：2018-06-21

申请人： Toray Industries, Inc.

发明人： Eisuke Iizuka ,  Michiko Yamaguchi ,  Mitsuhito Suwa ,  Masao Kamogawa

IPC分类号： C08L83/04 ,  C08G77/12 ,  C08G77/16 ,  C08G77/20 ,  C08F220/18 ,  C08K5/132 ,  C08K5/06

摘要： Provided is a siloxane resin composition having excellent adhesion and fine patterning properties. The siloxane resin composition contains: a siloxane resin (A) including a structure represented by general formula (1), a structure represented by general formula (2), and a structure represented by general formula (3); a compound (B) having an unsaturated double bond; a photopolymerization initiator (C); and a solvent (D).

公开(公告)号：US20180016399A1

公开(公告)日：2018-01-18

申请号：US15546873

申请日：2016-01-20

申请人： TORAY INDUSTRIES, INC.

发明人： Toshiyasu Hibino ,  Manami Fujii ,  Mitsuhito Suwa

IPC分类号： C08G77/14 ,  H01L27/14 ,  C08L83/04 ,  C08K5/17 ,  C08K5/10 ,  C08K5/07 ,  C08K3/36 ,  H04N5/369 ,  C08G77/24

CPC分类号： C08G77/14 ,  C08G77/24 ,  C08J3/095 ,  C08J2383/04 ,  C08K3/36 ,  C08K5/07 ,  C08K5/10 ,  C08K5/17 ,  C08L83/04 ,  C09D183/04 ,  G02B1/111 ,  H01L27/14 ,  H01L31/0203 ,  H04N5/369 ,  C08K5/09

摘要： A resin composition which includes (a) a solvent, (b) silica particles, (c) a polysiloxane, and (d) a secondary or tertiary amine compound, wherein the solvent (a) includes an organic acid. From the resin composition, an even film is easily formed even on bases having protrusions and recesses, such as lens shapes. The resin composition has satisfactory storage stability.

公开(公告)号：US20170038682A1

公开(公告)日：2017-02-09

申请号：US15303816

申请日：2015-03-24

申请人： Toray Industries, Inc.

发明人： Mitsuhito Suwa ,  Yuka Yamashiki

IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/40 ,  G03F7/20 ,  G03F7/26 ,  G03F7/027 ,  G03F7/16

CPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40 ,  G06F3/041

摘要： A photosensitive resin composition can achieve both resolution of a fine pattern and conductivity after a heat treatment. The photosensitive resin composition includes: (A) conductive fine particles whose surfaces are coated with an elemental carbon and/or a carbon compound, and (B) an alkali-soluble resin having an acid dissociating group.

摘要翻译： 光敏树脂组合物可以在热处理后实现精细图案的分辨率和导电性。 感光性树脂组合物包括：（A）表面用元素碳和/或碳化合物涂覆的导电性微粒，（B）具有酸解离基团的碱溶性树脂。