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公开(公告)号：US20120320353A1
公开(公告)日：2012-12-20
申请号：US13589313
申请日：2012-08-20
Applicant: Sascha Bleidistel , Bernhard Geuppert
Inventor： Sascha Bleidistel , Bernhard Geuppert
IPC: G03B27/34
CPC classification number: G03F7/70833 , G02B7/023 , G03F7/70258 , G03F7/70825 , H01L41/0913 , H02N2/0095 , H02N2/021 , H02N2/028
Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
Abstract translation: 本发明涉及投影曝光装置和光学系统，例如用于微光刻的投影曝光装置中的投影物镜或照明系统，其包括至少一个光学元件和至少一个具有用于光学元件的驱动装置的操纵器 。 驱动装置可以具有至少一个可移动部分元件和至少一个可在至少一个运动方向上相对于彼此移动的固定部分元件。
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公开(公告)号：US08269948B2
公开(公告)日：2012-09-18
申请号：US12390685
申请日：2009-02-23
Applicant: Sascha Bleidistel , Bernhard Geuppert
Inventor： Sascha Bleidistel , Bernhard Geuppert
CPC classification number: G03F7/70833 , G02B7/023 , G03F7/70258 , G03F7/70825 , H01L41/0913 , H02N2/0095 , H02N2/021 , H02N2/028
Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
Abstract translation: 本发明涉及投影曝光装置和光学系统，例如用于微光刻的投影曝光装置中的投影物镜或照明系统，其包括至少一个光学元件和至少一个具有用于光学元件的驱动装置的操纵器 。 驱动装置可以具有至少一个可移动部分元件和至少一个可在至少一个运动方向上相对于彼此移动的固定部分元件。
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3.发明授权Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related method 有权具有多组压电元件的投影曝光装置可以在不同方向上移动并进行相关的方法公开(公告)号：US09110388B2
公开(公告)日：2015-08-18
申请号：US13589313
申请日：2012-08-20
Applicant: Sascha Bleidistel , Bernhard Geuppert
Inventor： Sascha Bleidistel , Bernhard Geuppert
CPC classification number: G03F7/70833 , G02B7/023 , G03F7/70258 , G03F7/70825 , H01L41/0913 , H02N2/0095 , H02N2/021 , H02N2/028
Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
Abstract translation: 本发明涉及投影曝光装置和光学系统，例如用于微光刻的投影曝光装置中的投影物镜或照明系统，其包括至少一个光学元件和至少一个具有用于光学元件的驱动装置的操纵器 。 驱动装置可以具有至少一个可移动部分元件和至少一个可在至少一个运动方向上相对于彼此移动的固定部分元件。
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公开(公告)号：US20090225297A1
公开(公告)日：2009-09-10
申请号：US12390685
申请日：2009-02-23
Applicant: Sascha Bleidistel , Bernhard Geuppert
Inventor： Sascha Bleidistel , Bernhard Geuppert
CPC classification number: G03F7/70833 , G02B7/023 , G03F7/70258 , G03F7/70825 , H01L41/0913 , H02N2/0095 , H02N2/021 , H02N2/028
Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
Abstract translation: 本发明涉及投影曝光装置和光学系统，例如用于微光刻的投影曝光装置中的投影物镜或照明系统，其包括至少一个光学元件和至少一个具有用于光学元件的驱动装置的操纵器 。 驱动装置可以具有至少一个可移动部分元件和至少一个可在至少一个运动方向上相对于彼此移动的固定部分元件。
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5.发明授权Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations 有权光学系统，具有可更换的可操作的校正装置，用于减少图像像差公开(公告)号：US08542346B2
公开(公告)日：2013-09-24
申请号：US12409961
申请日：2009-03-24
Applicant: Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
Inventor： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC: G03B27/52
CPC classification number: G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
Abstract translation: 本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。 在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。 操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。 操纵器可以与致动器一起以可变的方式形成。
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Patent Agency Ranking
公开(公告)号：US08330935B2
公开(公告)日：2012-12-11
申请号：US12703068
申请日：2010-02-09
Applicant: Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
Inventor： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
CPC classification number: G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
Abstract translation: 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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7.发明申请MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 审中-公开投影镜头的微观投影曝光装置和测量装置公开(公告)号：US20080309894A1
公开(公告)日：2008-12-18
申请号：US12195566
申请日：2008-08-21
Applicant: Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
Inventor： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
CPC classification number: G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
Abstract translation: 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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8.发明申请Lithographic apparatus, device manufacturing method and exchangeable optical element 有权光刻设备，器件制造方法和可交换光学元件公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
Applicant: Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
Inventor： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC: G03B27/54
CPC classification number: G03F7/70308 , G03F7/70825 , G03F7/70933
Abstract: A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
Abstract translation: 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。
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公开(公告)号：US08705185B2
公开(公告)日：2014-04-22
申请号：US13431378
申请日：2012-03-27
Applicant: Johannes Rau , Armin Schoeppach , Bernhard Geuppert
Inventor： Johannes Rau , Armin Schoeppach , Bernhard Geuppert
CPC classification number: G02B7/001 , F16F7/01 , F16F7/108 , G02B7/02 , G02B27/646 , G03F7/70825 , G03F7/709
Abstract: An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.
Abstract translation: 光学元件具有安装在其上的至少一个附加元件，其通过摩擦消散光学元件的振动能。
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公开(公告)号：US08300210B2
公开(公告)日：2012-10-30
申请号：US11664896
申请日：2005-10-01
Applicant: Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
Inventor： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
CPC classification number: G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
Abstract: An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
Abstract translation: 提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。 第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。 所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。 第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。 第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。 此外，第一壳体轴线与第二光轴基本共线。
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