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    Optical imaging device
    1.
    发明申请
    Optical imaging device 审中-公开
    光学成像装置

    公开(公告)号：US20080013063A1

    公开(公告)日：2008-01-17

    申请号：US11804632

    申请日：2007-05-18

    申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler

    发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler

    IPC分类号： G02B7/04 ,  G03B27/68

    CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70883

    摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

    摘要翻译： 提供了一种光学成像装置，特别是用于微光刻，包括至少一个光学元件和与光学元件（109）相关联的至少一个保持装置，其中保持装置保持光学元件和第一部分（109.1） 光学元件接触第一大气，并且光学元件的第二部分（109.2）至少临时接触第二气氛。 提供一种还原装置，至少减少第一大气和第二气氛之间的压差的动态波动。

    Optical arrangement in a microlithographic projection exposure apparatus
    2.
    发明授权
    Optical arrangement in a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置中的光学布置

    公开(公告)号：US09250417B2

    公开(公告)日：2016-02-02

    申请号：US13467760

    申请日：2012-05-09

    申请人： Dirk Schaffer ,  Stefan Hembacher ,  Jens Kugler

    发明人： Dirk Schaffer ,  Stefan Hembacher ,  Jens Kugler

    IPC分类号： G03B27/54 ,  G02B7/182 ,  G03F7/20

    CPC分类号： G02B7/182 ,  G02B7/1827 ,  G03F7/70316

    摘要： The disclosure relates to optical arrangements in a microlithographic projection exposure apparatus. In accordance with one aspect, an optical arrangement has at least one mirror segment arrangement including a plurality of separate mirror segments. The mirror segments are connected to a carrying structure of the projection exposure apparatus via mounting elements. At least one of the mounting elements, which is assigned to a first one of the mirror segments, extends, on the opposite side to the optically active surface of the mirror segment arrangement, at least partly into the region of a second mirror segment of the mirror segment arrangement. The second mirror segment is adjacent to the first mirror segment.

    摘要翻译： 本公开涉及微光刻投影曝光装置中的光学装置。 根据一个方面，一种光学装置具有至少一个包括多个分离镜片段的镜片段布置。 镜片段通过安装元件连接到投影曝光设备的承载结构。 分配给第一反射镜段的安装元件中的至少一个在反射镜分段装置的与光学有效表面相反的一侧上至少部分地延伸到第二反射镜段的区域中 镜片段布置。 第二镜片段与第一镜片段相邻。

    ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME
    7.
    发明申请
    ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME 审中-公开
    执行器和微观投影曝光系统及其使用方法

    公开(公告)号：US20110128521A1

    公开(公告)日：2011-06-02

    申请号：US13009438

    申请日：2011-01-19

    申请人： Ulrich Weber ,  Stefan Hembacher ,  Armin Schoeppach

    发明人： Ulrich Weber ,  Stefan Hembacher ,  Armin Schoeppach

    IPC分类号： G03B27/54 ,  F16H21/44

    CPC分类号： G03F7/70141 ,  F16H21/44 ,  G03F7/70258 ,  G03F7/70825 ,  H02N1/002 ,  H02N2/023 ,  Y10T74/18992

    摘要： An actuator includes a housing and a rotor that can be moved in relation to the housing in the effective direction of the actuator, wherein the actuator includes an advancing unit that is connected to the rotor at least part of the time. The advancing unit includes at least one deformation unit and at least one deformer for deforming the deformation unit. The at least one deformer is suited to deform the deformation unit perpendicular to the effective direction of the actuator such that the total length of the deformation unit changes in the effective direction as a result of the deformation. The actuator can be used in a projection exposure system for semiconductor lithography.

    摘要翻译： 致动器包括壳体和可以在致动器的有效方向上相对于壳体移动的转子，其中致动器包括至少部分时间连接到转子的前进单元。 前进单元包括至少一个变形单元和用于使变形单元变形的至少一个变形器。 至少一个变形器适于使变形单元垂直于致动器的有效方向变形，使得变形单元的总长度由于变形而在有效方向上变化。 致动器可用于半导体光刻的投影曝光系统。