公开(公告)号：US20120242996A1

公开(公告)日：2012-09-27

申请号：US13493747

申请日：2012-06-11

申请人： Ulrich WEGMANN

发明人： Ulrich WEGMANN

IPC分类号： G02B5/02 ,  G01B9/02

CPC分类号： G02B5/0278 ,  G01J1/04 ,  G01J1/0474 ,  G01J9/0215 ,  G02B5/0242 ,  G02B5/0294 ,  G03F7/70341 ,  G03F7/706

摘要： Immersion objective arrangement including an objective, an immersion medium and an optical scattering disk, and associated method. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.

摘要翻译： 包括物镜，浸没介质和光散射盘的浸没物镜布置及相关方法。 光散射盘包括透明基板（1）和邻接基板表面并具有光散射活性颗粒（3）的光散射层（2）。 光散射层具有比空气更光密的直接邻接衬底的相对表面的嵌入介质（4），而没有中间空气间隙，并且光散射活性颗粒被围绕。 这种光学散射盘可以用于例如使用横向剪切干涉测量法的用于波长测量高孔径微光刻投影物镜的装置中。

公开(公告)号：US20120113429A1

公开(公告)日：2012-05-10

申请号：US13351710

申请日：2012-01-17

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US08134716B2

公开(公告)日：2012-03-13

申请号：US11908911

申请日：2006-03-17

申请人： Wolfgang Emer ,  Helmut Haidner ,  Ulrich Wegmann

发明人： Wolfgang Emer ,  Helmut Haidner ,  Ulrich Wegmann

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215 ,  G03F7/70941

摘要： A method and apparatus for spatially resolved wavefront measurement on a test specimen, a method and apparatus for spatially resolved scattered light determination, a diffraction structure support and a coherent structure support therefor, and also an objective or other radiation exposure device manufactured using such a method, and an associated manufacturing method. An embodiment involves carrying out, for the wavefront measurement, a first shearing measuring operation, which includes a plurality of individual measurements with at least two first shearing directions and spatially resolved detection of shearing interferograms generated, and an analogous second shearing measuring operation with at least one second shearing direction, the at least one second shearing direction being non-parallel to at least one first shearing direction. From the shearing interferograms detected, it is possible e.g. to determine a wavefront spatial frequency spectrum and/or a point response of the test specimen and to carry out a spatially resolved scattered light determination with a point spread function. The embodiment may be used, e.g., for spatially resolved scattered light determination of projection objectives for microlithography.

摘要翻译： 用于空间分辨波长测量的测试样本的方法和装置，用于空间分辨散射光测定的方法和装置，衍射结构支撑和相干结构支撑，以及使用这种方法制造的物镜或其它辐射曝光装置 ，以及相关的制造方法。 一个实施例涉及对于波前测量执行第一剪切测量操作，该测量操作包括具有至少两个第一剪切方向的多个单独测量和产生的剪切干涉图的空间分辨检测，以及至少具有类似的第二剪切测量操作 一个第二剪切方向，所述至少一个第二剪切方向不平行于至少一个第一剪切方向。 从所检测的剪切干涉图可以看出， 以确定测试样本的波前空间频谱和/或点响应，并执行具有点扩散函数的空间分辨散射光确定。 该实施例可以用于例如用于微光刻的投影物镜的空间分辨散射光确定。

公开(公告)号：US20090051927A1

公开(公告)日：2009-02-26

申请号：US11915705

申请日：2006-05-23

申请人： Ulrich Wegmann

发明人： Ulrich Wegmann

IPC分类号： G01B9/02 ,  G02B27/42 ,  G03B27/54

CPC分类号： G02B5/0278 ,  G01J1/04 ,  G01J1/0474 ,  G01J9/0215 ,  G02B5/0242 ,  G02B5/0294 ,  G03F7/70341 ,  G03F7/706

摘要： Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.

摘要翻译： 光散射盘，使用和波前测量装置。 光散射盘包括透明基板（1）和邻接基板表面并具有光散射活性颗粒（3）的光散射层（2）。 光散射层具有比空气更光密的直接邻接衬底的相对表面的嵌入介质（4），而没有中间空气间隙，并且光散射活性颗粒被围绕。 这种光学散射盘可以用于例如使用横向剪切干涉测量法的用于波长测量高孔径微光刻投影物镜的装置中。

公开(公告)号：US20090021726A1

公开(公告)日：2009-01-22

申请号：US12147034

申请日：2008-06-26

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

公开(公告)号：US07456933B2

公开(公告)日：2008-11-25

申请号：US11220643

申请日：2005-09-08

申请人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

发明人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/706 ,  G03F7/701 ,  G03F7/70566 ,  G03F7/70591

摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.

摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当的照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。

公开(公告)号：US07336371B1

公开(公告)日：2008-02-26

申请号：US10766014

申请日：2004-01-29

申请人： Helmut Haidner ,  Markus Goeppert ,  Martin Schriever ,  Ulrich Wegmann

发明人： Helmut Haidner ,  Markus Goeppert ,  Martin Schriever ,  Ulrich Wegmann

IPC分类号： G01B9/02

CPC分类号： G01M11/0271 ,  G03F7/706

摘要： A device and a method for wavefront measurement of an optical system (7), in particular by an interferometric measurement technique. A dynamic range correction element (12, 12a) is arranged in the beam path upstream of the detector arrangement (11) and is designed such that the variation in the spatially dependent characteristic of a phase of the wavefront forming the interference pattern is kept below a prescribed limit value throughout a detection area. In addition or as an alternative, a set of several diffraction structures of different period length can be used with a shearing interferometry technique and/or a set of several pairs of a reference pinhole and a signal passage opening with different hole spacings can be used with a point diffraction interferometry technique for different sub-areas of the detection area. A remaining distortion error can be taken into account by determining a corresponding distortion transformation and applying the inverse distortion transformation.

摘要翻译： 一种用于光学系统（7）的波前测量的装置和方法，特别是通过干涉测量技术。 动态范围校正元件（12,12a）被布置在检测器装置（11）的上游的光束路径中，并且被设计成使得形成干涉图案的波阵面的相位的空间相关特性的变化保持在 在整个检测区域的规定的极限值。 另外或作为替代，可以使用剪切干涉测量技术的一组不同周期长度的几种衍射结构，和/或一组几对参考针孔和具有不同孔间距的信号通道开口可以与 用于检测区域的不同子区域的点衍射干涉测量技术。 可以通过确定相应的失真变换并应用逆失真变换来考虑剩余的失真误差。

公开(公告)号：US07333216B2

公开(公告)日：2008-02-19

申请号：US09792607

申请日：2001-02-23

申请人： Ulrich Wegmann ,  Helmut Haidner ,  Martin Schriever

发明人： Ulrich Wegmann ,  Helmut Haidner ,  Martin Schriever

IPC分类号： G01B9/00

CPC分类号： G03F7/706 ,  G01J9/02

摘要： An apparatus for wavefront detection includes a wavefront source for the production of a wavefront, an optical system transforming the wavefront, a diffraction grating through which the transformed wavefront passes, and a spatially resolving detector following the diffraction grating. The wavefront source has a two-dimensional structure.

摘要翻译： 用于波前检测的装置包括用于产生波前的波阵面源，变换波前的光学系统，经变换的波阵面经过的衍射光栅以及衍射光栅之后的空间分辨检测器。 波前源具有二维结构。

公开(公告)号：US07158237B2

公开(公告)日：2007-01-02

申请号：US10964868

申请日：2004-10-15

申请人： Martin Schriever ,  Ulrich Wegmann ,  Helmut Haidner

发明人： Martin Schriever ,  Ulrich Wegmann ,  Helmut Haidner

IPC分类号： G01B9/02

CPC分类号： G02B5/0221 ,  G02B5/0252 ,  G03F7/70075 ,  G03F7/706

摘要： A measuring device for interferometric measurement of an optical imaging system that is provided for projecting a useful pattern, provided on a mask, into the image plane of the imaging system, includes a wavefront source for generating at least one wavefront traversing the imaging system; a diffraction grating, arrangeable downstream of the imaging system, for interacting with the wavefront reshaped by the imaging system; and a spatially resolving detector, assigned to the diffraction grating, for acquiring interferometric information. The wavefront source has at least one measuring pattern that is formed on the mask in addition to the useful pattern. The useful pattern may represent the structure of a layer of a semiconductor component in a specific fabrication step. The measuring pattern may be formed as a coherence-forming structure periodic in one or two dimensions.

摘要翻译： 一种用于光学成像系统的干涉测量的测量装置，其被设置用于将设置在掩模上的有用图案投影到成像系统的图像平面中，包括用于产生穿过成像系统的至少一个波前的波前源; 衍射光栅，其可配置在成像系统的下游，用于与由成像系统重新形成的波前相互作用; 以及分配给衍射光栅的空间分辨检测器，用于获取干涉信息。 除了有用的图案之外，波前源具有形成在掩模上的至少一个测量图案。 有用的图案可以表示特定制造步骤中的半导体部件的层的结构。 测量图案可以形成为一维或二维周期性的相干形成结构。

公开(公告)号：US07075633B2

公开(公告)日：2006-07-11

申请号：US10280090

申请日：2002-10-25

申请人： Ulrich Wegmann

发明人： Ulrich Wegmann

IPC分类号： G01B9/00 ,  G06K9/40

CPC分类号： G01M11/0285

摘要： An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the imaging fidelity of an optical imaging system, for example, an eyeglass lens, a photographic lens, or a projection lens, for use in the visible spectral range. The resultant, two-dimensional, superposition pattern is detected in a spatially resolved manner in order to determine imaging parameters therefrom. The object pattern is generated with the aid of at least one electronically controllable pattern generator that serves as a self-luminous, electronically configurable, incoherent light source and may, for example, have a color monitor. The measuring system allows rapidly, flexibly, checking optical imaging systems with minimal time and effort spent on the mechanical setup required.