公开(公告)号：US20200273666A1

公开(公告)日：2020-08-27

申请号：US16798551

申请日：2020-02-24

Applicant: NuFlare Technology, Inc.

Inventor： Hideki MATSUI

IPC: H01J37/317 ,  H01J37/20

Abstract: In one embodiment, a charged particle beam writing method is for writing a pattern in a writing area on a substrate by irradiating a charged particle beam onto the substrate while moving the substrate to write stripes sequentially, each of the stripes having a width W and shapes obtained by dividing the writing area by the width W. The method includes performing S times (S is an integer greater than or equal to two) strokes, each of the strokes which is a process writing the stripes in a multiplicity of 2n (n is an integer greater than or equal to one) while shifting a reference point of each of the stripes in the width direction by a preset stripe shift amount and changing a moving direction of the substrate for each of the stripes, and writing while the reference point of the stripes in the each of the strokes in the width direction of the stripes is shifted by a preset stroke shift amount in each of the strokes.

公开(公告)号：US20160343535A1

公开(公告)日：2016-11-24

申请号：US15070679

申请日：2016-03-15

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hideki MATSUI

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a storage unit that stores an approximate formula indicating a correspondence relationship between a settling time for a DAC amplifier that controls the deflector, and a position shift amount, from a design position, of a drawn position of each evaluation pattern drawn on a first substrate while the settling time and an amount of deflection by the deflector are changed, a shot position correction unit that creates a correction formula indicating a relationship between an amount of deflection and a shot position shift amount at the settling time, from the approximate formula and the settling time for the DAC amplifier based on an amount of deflection of a shot, obtains a position correction amount by using the amount of deflection of the shot and the correction formula, and corrects a shot position defined by the shot data based on the position correction amount, and a drawing unit that performs drawing by using the shot data with a corrected shot position.

Abstract translation: 在一个实施例中，带电粒子束描绘装置使带电粒子束偏转导流板以绘制图案。 该装置包括：存储单元，存储表示在控制偏转器的DAC放大器的建立时间之间的对应关系的近似式，以及从设计位置到绘制在每个评估图案的绘制位置的位置偏移量 第一基板，同时改变了偏转器的稳定时间和偏转量;拍摄位置校正单元，从近似公式产生指示偏转量与拍摄位置偏移量之间的关系的校正公式， 并且基于射击偏转量的DAC放大器的建立时间，通过使用镜头的偏转量和校正公式来获得位置校正量，并且基于镜头数据来校正由镜头数据定义的镜头位置 位置校正量，以及通过使用具有校正的拍摄位置的拍摄数据进行绘制的绘图单元。

公开(公告)号：US20190189389A1

公开(公告)日：2019-06-20

申请号：US16202514

申请日：2018-11-28

Applicant: NuFlare Technology, Inc.

Inventor： Takuya UEMURA ,  Takashi NAKAMURA ,  Hideki MATSUI ,  Munehiro OGASAWARA ,  Rieko NISHIMURA ,  Tatsuya MUROFUSHI ,  Yoshiaki HATTORI

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/10 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/202 ,  H01J2237/31793

Abstract: In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.

公开(公告)号：US20150332890A1

公开(公告)日：2015-11-19

申请号：US14614948

申请日：2015-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Hideki MATSUI

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/147 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30472 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: An electron beam writing apparatus includes: a first aperture plate that shapes an electron beam emitted from an electron gun assembly; a second aperture plate onto which an electron beam of an aperture plate image passing through the first aperture plate is projected; and a first shaping deflector and a second shaping deflector which are provided between the first aperture plate and the second aperture plate, respectively, deflect an electron beam, control an irradiation position of the aperture plate image on the second aperture plate, and determine a shot shape and a shot size. The first shaping deflector deflects an electron beam such that the aperture plate image is positioned at a determined position in accordance with a shot shape and a shot size. The second shaping deflector deflects an electron beam deflected by the first shaping deflector and controls formation of a desirable shot size.

Abstract translation: 电子束写入装置包括：形成从电子枪组件发射的电子束的第一孔板; 第二孔板，穿过第一孔板的孔板图像的电子束投射到其上; 以及分别设置在第一孔板和第二孔板之间的第一成形偏转器和第二成形偏转器，偏转电子束，控制孔板图像在第二孔板上的照射位置，并且确定射出 形状和射击大小。 第一成形偏转器偏转电子束，使得孔板图像根据射出形状和射出尺寸位于确定的位置。 第二成形偏转器使由第一成形偏转器偏转的电子束偏转并且控制形成期望的镜头尺寸。