公开(公告)号：US20190189389A1

公开(公告)日：2019-06-20

申请号：US16202514

申请日：2018-11-28

Applicant: NuFlare Technology, Inc.

Inventor： Takuya UEMURA ,  Takashi NAKAMURA ,  Hideki MATSUI ,  Munehiro OGASAWARA ,  Rieko NISHIMURA ,  Tatsuya MUROFUSHI ,  Yoshiaki HATTORI

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/10 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/202 ,  H01J2237/31793

Abstract: In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.