公开(公告)号：US09188858B2

公开(公告)日：2015-11-17

申请号：US13627208

申请日：2012-09-26

申请人： JSR CORPORATION

发明人： Yusuke Asano

IPC分类号： G03F7/004 ,  C07C309/19 ,  C07C309/12 ,  C07C381/12 ,  G03F7/20 ,  G03F7/039 ,  G03F7/11 ,  C07C309/07 ,  C07C309/16 ,  C07C309/17 ,  C07C309/65 ,  C07C317/12 ,  C07D295/185

CPC分类号： G03F7/0045 ,  C07C309/07 ,  C07C309/12 ,  C07C309/16 ,  C07C309/17 ,  C07C309/19 ,  C07C309/65 ,  C07C317/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D295/185 ,  C07D333/46 ,  C07D333/76 ,  C07D333/78 ,  C07D335/02 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

摘要： A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R1 represents a monovalent organic group having 1 to 20 carbon atoms. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R2 is as defined in the above formula (1). X represents an electron attractive group. R3 represents a monovalent organic group having 1 to 20 carbon atoms.

摘要翻译： 辐射敏感性树脂组合物包括通过放射线照射产生由下式（1）表示的化合物的酸产生剂。 式（1）中，R 1表示碳原子数为1〜20的1价有机基团。 R2表示氢原子或碳原子数1〜20的1价有机基团。 由式（1）表示的化合物优选为由下式（1-1）表示的化合物。 在式（1-1）中，R 2如上述式（1）中所定义。 X表示吸电子基团。 R3表示碳原子数1〜20的1价有机基团。

公开(公告)号：US09046765B2

公开(公告)日：2015-06-02

申请号：US14037659

申请日：2013-09-26

申请人： JSR CORPORATION

发明人： Hiromitsu Nakashima ,  Toru Kimura ,  Yusuke Asano ,  Masafumi Hori ,  Reiko Kimura ,  Kazuki Kasahara ,  Hiromu Miyata ,  Masafumi Yoshida

IPC分类号： G03F7/004 ,  C08F12/20 ,  H01L21/027 ,  C08F220/22 ,  C08F220/24 ,  C08F220/28 ,  G03F7/20 ,  G03F7/039 ,  G03F7/11

CPC分类号： G03F7/0041 ,  C08F220/22 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/027 ,  H01L21/0274

摘要： A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film.

摘要翻译： 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物在基板上提供具有30至40mN / m的表面自由能的抗蚀剂膜。 通过经由掩模施加辐射来曝光抗蚀剂膜。 显影出抗蚀剂膜。 优选的是，抗蚀剂膜的曝光包括通过设置在抗蚀剂膜上的浸渍液体曝光抗蚀剂膜。

公开(公告)号：US20200166840A1

公开(公告)日：2020-05-28

申请号：US16778166

申请日：2020-01-31

申请人： JSR CORPORATION

发明人： Hisashi NAKAGAWA ,  Yusuke Asano ,  Shinya Minegishi

IPC分类号： G03F7/038 ,  G03F7/004 ,  C08G79/00 ,  C08G79/12 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/30

摘要： A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Ar1 represents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.

公开(公告)号：US11079676B2

公开(公告)日：2021-08-03

申请号：US16449701

申请日：2019-06-24

申请人： JSR CORPORATION

发明人： Yusuke Asano ,  Hisashi Nakagawa ,  Shinya Minegishi

IPC分类号： G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/039 ,  C08G79/12 ,  G03F7/004 ,  C08F12/14

摘要： A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.

公开(公告)号：US09523911B2

公开(公告)日：2016-12-20

申请号：US14282270

申请日：2014-05-20

申请人： JSR CORPORATION

发明人： Hiroshi Tomioka ,  Takakazu Kimoto ,  Yusuke Asano

IPC分类号： C07C25/18 ,  C07C381/12 ,  C07C309/04 ,  G03F7/039 ,  G03F7/004 ,  C07C309/17 ,  G03F7/11 ,  G03F7/20

CPC分类号： G03F7/0045 ,  C07C25/18 ,  C07C309/04 ,  C07C309/12 ,  C07C309/13 ,  C07C309/17 ,  C07C309/39 ,  C07C321/28 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/00 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/327 ,  G03F7/40

摘要： The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.

摘要翻译： 本发明提供了含有具有包含酸不稳定基团的结构单元的聚合物的辐射敏感性树脂组合物， 和酸发生剂，其中酸产生剂包括包含具有SO 3 - 的磺酸根阴离子的化合物，其中氢原子或给电子基团相对于SO 3键与α碳原子键合，并且吸电子基团与 一个 碳原子相对于SO3-; 和辐射可降解的鎓阳离子。 该化合物优选具有下式（1-1）或（1-2）表示的基团。 在下式（1-1）和（1-2）中，R 1和R 2各自独立地表示氢原子或一价给电子基团。 R3表示一价吸电子基团。 R4表示氢原子或一价烃基。

公开(公告)号：US09152044B2

公开(公告)日：2015-10-06

申请号：US13627208

申请日：2012-09-26

申请人： JSR CORPORATION

发明人： Yusuke Asano

IPC分类号： G03F7/004 ,  C07C309/19 ,  C07C309/12 ,  C07C381/12 ,  G03F7/20 ,  G03F7/039 ,  G03F7/11 ,  C07C309/07 ,  C07C309/16 ,  C07C309/17 ,  C07C309/65 ,  C07C317/12 ,  C07D295/185

摘要： A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R1 represents a monovalent organic group having 1 to 20 carbon atoms. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R2 is as defined in the above formula (1). X represents an electron attractive group. R3 represents a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US11506976B2

公开(公告)日：2022-11-22

申请号：US16778166

申请日：2020-01-31

申请人： JSR CORPORATION

发明人： Hisashi Nakagawa ,  Yusuke Asano ,  Shinya Minegishi

IPC分类号： G03F7/004 ,  G03F7/038 ,  C08G79/00 ,  C08G79/12 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

摘要： A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Ar1 represents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.

公开(公告)号：US09146466B2

公开(公告)日：2015-09-29

申请号：US14247449

申请日：2014-04-08

申请人： JSR CORPORATION

发明人： Yusuke Asano ,  Shin-ichi Nakamura ,  Tomonori Futai

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/038

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/0397

摘要： A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.

摘要翻译： 抗蚀剂组合物包括含有酸不稳定基团的结构单元，光致酸发生剂和溶剂的聚合物。 溶剂包括包含酮羰基和醇羟基的化合物。 醇羟基优选为叔醇羟基。 溶剂优选还包括亚烷基二醇单烷基醚羧酸酯。