- 专利标题: Radiation-sensitive composition and resist pattern-forming method
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申请号: US16778166申请日: 2020-01-31
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公开(公告)号: US11506976B2公开(公告)日: 2022-11-22
- 发明人: Hisashi Nakagawa , Yusuke Asano , Shinya Minegishi
- 申请人: JSR CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: JSR CORPORATION
- 当前专利权人: JSR CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JPJP2017-156126 20170810
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/038 ; C08G79/00 ; C08G79/12 ; G03F7/16 ; G03F7/20 ; G03F7/30 ; G03F7/38
摘要:
A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Ar1 represents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.
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